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Citation - WoS: 3
Citation - Scopus: 3
Enhancement of the Performance of the Cu₂se Band Filters Via Yb Nanosandwiching
(Wiley, 2019) Khusayfan, Najla M.; Qasrawı, Atef Fayez Hasan; Qasrawi, A. F.; Khanfar, Hazem K.; Qasrawı, Atef Fayez Hasan; Department of Electrical & Electronics Engineering; Department of Electrical & Electronics Engineering
In this article, we report the experimental and theoretical modeling on the band pass filters that are made of two thin film layers of Cu2Se coated onto aluminum substrates and nanosandwiched with 50 nm ytterbium layers. The nanosandwiching of Yb between two layers of Cu2Se is found to decrease the lattice constant, the defect density, and the strain and increase the grain size in the Cu2Se. Electrically, it is observed that, Al/Cu2Se/Al structure exhibits wave trap characteristics with notch frequency of 1.31 GHz. The Yb-layers improved the performance of the band pass filters by increasing the amplitude of the reflection coefficients, increasing the return loss values and decreasing the voltage standing wave ratios. The calculated conduction and wave trapping parameters nominate the Yb-nanosandwiched Cu2Se films for use in communication technology as they exhibit negative capacitance effect and narrow band pass range.
Citation - WoS: 21
Citation - Scopus: 21
Design and Applications of Yb/Ga_{2< Schottky Barriers}
(Ieee-inst Electrical Electronics Engineers inc, 2017) Khanfar, Hazem K.; Qasrawı, Atef Fayez Hasan; Qasrawi, Atef F.; Zakarneh, Yasmeen A.; Gasanly, N. M.; Qasrawı, Atef Fayez Hasan; Department of Electrical & Electronics Engineering; Department of Electrical & Electronics Engineering
In this paper, the Ga2Se3 crystals are used to design a Yb/Ga2Se3/C Schottky barrier. The device structure is investigated by the X-ray diffraction technique, which reveals a monoclinic-face-centered cubic interfacing type of structure. The barrier is studied by means of current (I)-voltage (V) characteristics in the dark and under light through photoexcitation from tungsten lamp and from the He-Ne laser. In addition, the impedance spectroscopy of these devices is studied in the frequency range of 10-1400 MHz. The photoexcited I-V curve analysis allowed investigating the biasing voltage, illumination power, and energy effects on the diode physical parameters, which are presented by the rectification ratio, the Schottky barrier height, the ideality factor, the series resistance, the photosensitivity, the responsivity, and the external quantum efficiency (EQE). While a maximum photosensitivity of 42 was observed for laser excitation with a wavelength of 632 nm at a reverse bias of 4.4 V, the EQE reached value of 1652% at 19.0 V. On the other hand, the ac current conduction analysis of the electrical conductivity, which was determined from the impedance spectral analysis, indicated that the ac signal processing through the Yb/Ga2Se3/C samples is due to the correlated hopping conduction through localized states of Fermi density of 3.98 x 10(19) eV(-1) cm(-3). The high-and biasing-dependent EQE% nominates the Yb/Ga2Se3/C as a tunable optoelectronic device.
Citation - WoS: 28
Citation - Scopus: 10
Electrical Conductivity and Hall Mobility in P-Type Tlgase₂ Crystals
(Pergamon-elsevier Science Ltd, 2004) Qasrawi, AF; Qasrawı, Atef Fayez Hasan; Gasanly, NM; Qasrawı, Atef Fayez Hasan; Department of Electrical & Electronics Engineering; Department of Electrical & Electronics Engineering
Systematic dark electrical conductivity and Hall mobility measurements have been carried out in the temperature range of 200-350 K on p-type TlGaSe2 crystals. The analysis of the temperature-dependent electrical conductivity and carrier concentration reveals the extrinsic type of conduction with an acceptor impurity level located at 0.33 eV, and donor and acceptor concentrations of 9.0 x 10(15) and 1.3 x 10(16) cm(-3), respectively. A hole and electron effective masses of 0.520m(0) and 0.325m(0), respectively, with a donor to acceptor compensating ratio of 0.69 are also being identified. The Hall mobility is found to be limited by the hole-phonon short-range interactions scattering with a hole-phonon coupling constant of 0.17. (C) 2004 Elsevier Ltd. All rights reserved.
Citation - WoS: 8
Citation - Scopus: 10
Thickness Effects on the Dielectric Dispersion and Optical Conductivity Parameters of Cuo Thin Films
(Wiley, 2020) Qasrawi, Atef F.; Qasrawı, Atef Fayez Hasan; Hamamdah, Alaa A.; Qasrawı, Atef Fayez Hasan; Department of Electrical & Electronics Engineering; Department of Electrical & Electronics Engineering
In this article, the effect of film thickness on the structural, optical, dielectric, and optical conductivity parameters of CuO thin films are reported. CuO thin films which are prepared by the physical vapor deposition technique under vacuum pressure of 10(-5) mbar with various thicknesses in the range of 50 to 1000 nm are observed to exhibit amorphous nature of growth. The values of the energy bands gaps, the spectral response of the dielectric constant and of the optical conductivity parameters are highly sensitive to the film thickness. Particularly, while the 50 nm thick CuO films exhibits quantum confinement which forces the material to have wide band gap (2.70 eV), the thicker films display an energy band gap in the infrared range of spectrum. It was also observed that the thicker the films, the more pronounced the nonlinear dielectric response. In addition, analysis of the optical conductivity parameters using Drude-Lorentz approach for optical conduction has shown that the 50 nm thick films can display drift mobility value of 4.65 cm(2)/Vs accompanied with plasmon frequency of 1.20 GHz and free carrier density of 7.5x10(17) cm(3). The Drude-Lorentz analysis has also shown that the free carrier density and the plasmon frequency of CuO decreases with increasing film thickness. This decrement is accompanied with enhancement in the drift mobility values which reaches 12.56 cm(2)/V s as the film thickness exceeds 250 nm. Such features of the thin layer of CuO make them suitable for the production of nano/microthin film transistors.
Citation - WoS: 2
Citation - Scopus: 2
Effect of Insertion of Aluminum Nanosheets on the Structural, Optical and Dielectric Properties of Stacked Layers of Selenium
(Natl inst R&d Materials Physics, 2019) Qasrawi, A. F.; Qasrawı, Atef Fayez Hasan; Abu Al Rob, O. H.; Qasrawı, Atef Fayez Hasan; Department of Electrical & Electronics Engineering; Department of Electrical & Electronics Engineering; Department of Electrical & Electronics Engineering
In this work, the time dependent metal induced crystallization process in stacked layers of selenium that are sandwiched with aluminum nanosheets of thicknesses of 50 nm are investigated by means of X-ray diffraction and optical spectrophotometry techniques. The Al nanosheets motivated the growth of orthorhombic phases of selenium and lowered the energy bang gap of the amorphous films from 2.26 to 1.82 eV when the orthorhombic phase is achieved. The time dependent monitoring of the structural and optical properties over eighteen months have shown that both of the orthorhombic and amorphous phases exhibit a second transformation to hexagonal and stabilize at that phase within ten days of the growth time. The presence of the aluminum nanosheets enhanced the light absorbability by 15 and 5 times in the orthorhombic and hexagonal phases, respectively. In addition, the dielectric spectra of the studied films display similar characteristics in the hexagonal phase with slight differences that results from Al nanosheets. The dielectric spectra for both of the amorphous and orthorhombic phases displayed resonance peaks in the visible and infrared ranges of light. The structural and optical analysis that are carried out through this study represent a guide for using the selenium films in optoelectronic technology.
Citation - WoS: 2
Citation - Scopus: 2
Post Annealing Effects on the Structural and Optical Properties of Moo₃ Sandwiched With Indium Slabs
(Iop Publishing Ltd, 2019) Qasrawi, A. F.; Qasrawı, Atef Fayez Hasan; Kmail, Haifaa K.; AbuSaa, M.; Khanfar, Hazem K.; Qasrawı, Atef Fayez Hasan; Department of Electrical & Electronics Engineering; Department of Electrical & Electronics Engineering
Molybdenum trioxide thin films are prepared by the thermal evaporation technique under vacuum pressure of 10(-5) mbar through insertion of indium slabs of thickness of 200 nm between layers of MoO3 and annealing the produced films in the air atmosphere at 250 degrees C for one hour. The films are studied by means of x-ray diffraction, scanning electron microscopy, energy dispersive x-ray spectroscopy, and optical spectrophotometry techniques. The structure of the films is found to be composed monoclinic MoO3, tetragonal indium and cubic In2O3. The phase percentage of In2O3 in the films increased to 26.3% upon annealing at 250 degrees C. The annealing process increased the microstrain, the defect density, the oxygen atomic content and lowered the crystallites and grains sizes in the films. Optically, two energy band gaps of values of 3.20 and 1.70 eV were detected for the MoO3/In/MoO3 system. In addition, nonlinear dielectric response associated with wide range of tunability in the dielectric constant value, in the optical conductivity and in the terahertz cutoff frequency was observed in the near IR spectral range. The annealing of the samples improved the nonlinearity in these parameters and make MoO3/In/MoO3 system more appropriates for optoelectronic technology applications as terahertz cavities and frequency convertors.
Citation - WoS: 1
Citation - Scopus: 1
Pseudodielectric Dispersion in As₂se_{3< Thin Films}
(Wiley-v C H verlag Gmbh, 2020) Kayed, Tarek S.; Kayed, Tarek Said; Qasrawi, Atef F.; Qasrawı, Atef Fayez Hasan; Kayed, Tarek Said; Qasrawı, Atef Fayez Hasan; Department of Electrical & Electronics Engineering; Department of Electrical & Electronics Engineering
Herein, X-ray diffraction, energy dispersive X-ray spectroscopy, and spectral ellipsometry techniques are used to investigate the structural, pseudo-optical, and pseudodielectric properties of arsenic selenide thin films. The stoichiometric films which are prepared by the thermal evaporation technique are found to prefer the amorphous nature of growth. While the pseudoabsorption coefficient spectra display strong absorption bands at 1.84, 1.81, 1.41, and 1.13 eV, the preferred pseudo-optical transitions happen within a direct forbidden energy bandgap of 1.80 eV. In addition, the real part of the pseudodielectric spectra displays three strong resonance peaks at critical energy values of 2.33, 1.90, and 1.29 eV. Modeling of the imaginary part of the pseudodielectric constant spectra in accordance with the Drude-Lorentz approach results in the existence of six linear oscillators. The response of arsenic selenide to elliptically polarized light signals shows that the films exhibit drift mobility, free electron concentration, and plasmon frequency values in the ranges of 0.21-43.96 cm(2) V(-1)s(-1), 1.90-58.0 x 10(19) cm(-3), and 5.8-32.0 GHz, respectively. The optical conductivity parameters for As2Se3 film nominate it as a promising candidate for the fabrication of tunneling diodes suitable for microwaves filtering up to 32.0 GHz and as thin-film transistors.
Citation - WoS: 2
Citation - Scopus: 2
Performance of Ge-Sandwiched Gase Layers
(Springer, 2018) Qasrawi, A. F.; Qasrawı, Atef Fayez Hasan; Abdallah, Maisam M. A.; Qasrawı, Atef Fayez Hasan; Department of Electrical & Electronics Engineering; Department of Electrical & Electronics Engineering
In the current work, we report the effect of sandwiching Ge between two stacked layers of GaSe. The GaSe and Ge-sandwiched GaSe were subjected to x-ray diffraction, optical spectrophotometry and impedance spectroscopy measurement and analysis. The presence of a Ge layer between two layers of GaSe was observed to cause uniform deformation and increase the absorption of light by GaSe. The response of the dielectric constant to incident light was also significantly enhanced by Ge sandwiching. In addition, Drude-Lorentz modeling of the imaginary part of the dielectric constant revealed that the layer of Ge layer between GaSe layers increased the drift mobility from 30.76 cm(2)/Vs to 52.49 cm(2)/Vs. It also enhanced the plasmon frequency without altering the free carrier density. Moreover, Ge improved the band filtering features of GaSe. In particular, it enhanced the sensitivity of the impedance response to the incident signal and increased the return loss factor of GaSe when it was used as a high band pass filter.
Citation - WoS: 9
Citation - Scopus: 9
Yb/Inse Straddling-Type Tunneling Devices Designed as Photosensors, Mos Capacitors, and Gigahertz Bandstop Filters
(Ieee-inst Electrical Electronics Engineers inc, 2021) Alfhaid, Latifah Hamad Khalid; Qasrawı, Atef Fayez Hasan; Qasrawi, A. F.; AlGarni, Sabah E.; Qasrawı, Atef Fayez Hasan; Department of Electrical & Electronics Engineering; Department of Electrical & Electronics Engineering
In this work, amorphous InSe thin films coated with 30-160-nm-thick SiO2 are used as an active material to fabricate multifunctional devices. The n-InSe/p-SiO2 layers that are deposited onto ytterbium substrates are optically and electrically characterized. It was observed that the coating of SiO2 nanosheets onto the surface of InSe enhances the light absorbability in the near-infrared range without remarkable altering of the bandgap. Significant increase in the steady-state photocurrent values accompanied by faster photocurrent responses resulted from the coating of SiO2 nanosheets. Electrically, while the Yb/InSe/Au channels display tunneling Schottky barrier characteristics, the Yb/InSe/SiO2/Au channels show pn junction features. Both channels displayed metal-oxide-semiconductors (MOS) capacitance-voltage characteristics. In addition, the analyses of the current-voltage characteristics have shown that the currents in the Yb/InSe/Au and Yb/InSe/SiO2 (30 nm)/Au channel are dominated by electric field-assisted thermionic emission (tunneling) of charge carriers through barriers of widths of 18/14 and 30/16 nm under reverse-/forward-biasing conditions, respectively. Further increase in the oxide layer thickness lowered the barrier height of the devices. On the other hand, when an ac signal of low amplitude is imposed through the device channels, the conductance, capacitance, and reflection coefficient spectra displayed bandstop filter characteristics near 1.6 GHz. The microwave cutoff frequency spectra show a remarkable increase in the cutoff frequency values as a result of the coating of InSe with SiO2 nanosheets. The features of the device assure its applicability as rectifying diodes, fast photosensors, MOS capacitors, and microwave bandstop filters.
Citation - WoS: 28
Citation - Scopus: 29
Annealing Effects on the Structural and Optical Properties of Agin₅s_{8< Thin Films}
(Elsevier Science Sa, 2008) Qasrawi, A. F.; Qasrawı, Atef Fayez Hasan; Qasrawı, Atef Fayez Hasan; Department of Electrical & Electronics Engineering; Department of Electrical & Electronics Engineering
Due to its importance as a perspective material for application in optoelectronic semiconductor devices, the thermal annealing effects on the structural and optical properties of the as-grown vacuum evaporated AgIn5S8 thin films have been investigated. The X-ray data analysis have shown that these films are polycrystalline in nature and exhibit better crystallization with increasing crystallite size and slightly, decreasing unit cell lattice parameter as annealing temperature is raised from 450 to 600 K. The optical energy band gap for the as-grown and thermally annealed films is found to be of direct allowed transitions type. The energy band gap exhibited values of 1.78, 1.74 and 1.62 eV as the samples were annealed at, 450 and 600 K, respectively. This indicates the ability of altering the band gap values of this material by the thermal annealing process. The structural and optical features seem to be suitable for semiconductor device production such as solar cell converters, which has successfully been fabricated by others, metal-insulator-semiconductor (MIS) and metal - oxide - semiconductor (MOS) devices, as well. (c) 2007 Elsevier B.V. All rights reserved.

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