Pseudodielectric Dispersion in As<sub>2</Sub>se<sub>3< Thin Films

Abstract

Herein, X-ray diffraction, energy dispersive X-ray spectroscopy, and spectral ellipsometry techniques are used to investigate the structural, pseudo-optical, and pseudodielectric properties of arsenic selenide thin films. The stoichiometric films which are prepared by the thermal evaporation technique are found to prefer the amorphous nature of growth. While the pseudoabsorption coefficient spectra display strong absorption bands at 1.84, 1.81, 1.41, and 1.13 eV, the preferred pseudo-optical transitions happen within a direct forbidden energy bandgap of 1.80 eV. In addition, the real part of the pseudodielectric spectra displays three strong resonance peaks at critical energy values of 2.33, 1.90, and 1.29 eV. Modeling of the imaginary part of the pseudodielectric constant spectra in accordance with the Drude-Lorentz approach results in the existence of six linear oscillators. The response of arsenic selenide to elliptically polarized light signals shows that the films exhibit drift mobility, free electron concentration, and plasmon frequency values in the ranges of 0.21-43.96 cm(2) V(-1)s(-1), 1.90-58.0 x 10(19) cm(-3), and 5.8-32.0 GHz, respectively. The optical conductivity parameters for As2Se3 film nominate it as a promising candidate for the fabrication of tunneling diodes suitable for microwaves filtering up to 32.0 GHz and as thin-film transistors.