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Article Citation - WoS: 9Citation - Scopus: 8Exploring the Optical Dynamics in the Ito/As2< Interfaces(Springer, 2019) Al Garni, S. E.; Qasrawi, A. F.In this work, the effects of indium tin oxide (ITO) substrates on the structural, compositional, optical dielectric and optical conduction properties of arsenic selenide thin films are investigated. The As2Se3 films which are prepared by the thermal deposition technique under vacuum pressure of 10(-5) mbar exhibit an induced crystallization process, improved stoichiometry, increased optical transmittance in the visible range of light and increased dielectric response in the infrared range of light upon replacement of glass substrates by ITO. The ITO/As2Se3 interfaces exhibit conduction and valence band offset values of 0.46 eV and 0.91 eV, respectively. The experimental optical conductivity spectra are theoretically reproduced with the help of the Drude-Lorentz approach for optical conduction. In accordance with this approach, owing to the improved crystallinity of the arsenic selenide, the deposition of As2Se3 onto ITO substrates increases the drift mobility value from similar to 17.6 cm(2)/Vs to 34.6 cm(2)/Vs. It also reduces the density of free carriers by one order of magnitude. The ITO/As2Se3/C heterojunction devices which are tested as band filters which may operate in the frequency domain of 0.01-3.0 GHz revealed low pass filter characteristics below 0.35 GHz and band pass filter characteristics in the remaining spectral range.Article Citation - WoS: 11Citation - Scopus: 12Effect of Au Nanosandwiching on the Structural, Optical and Dielectric Properties of the as Grown and Annealed Inse Thin Films(Elsevier Science Bv, 2017) Omareya, Olfat A.; Qasrawi, A. F.; Al Garni, S. E.In the current work, the structural, optical and dielectric properties of the InSe/Au/InSe nanosandwiched structures are investigated by means of X-ray diffraction and UV-visible light spectrophotometry techniques. The insertion of a 20 and 100 nm thick Au metal slabs between two InSe layers did not alter the amorphous nature of the as grown InSe films but decreased the energy band gap and the free carrier density. It also increased; the absorption ratio and the values of dielectric constant by similar to 3 times. The insertion of 100 nm Au layers as a nanosandwich enhanced the drift mobility (31.3 cm(2)/V s) and plasmon frequency (1.53 GHz) of the InSe films. On the other hand, upon annealing, a metal induced crystallization process is observed for the InSe/Au (100 nm)/InSe sandwiches. Particularly, while the samples sandwiched with a layer of 20 nm thickness hardly revealed hexagonal gamma -In2Se3 when annealed at 300 degrees C, those sandwiched with 100 nm Au slab, displayed well crystalline phase of hexagonal gamma -In2Se3 at annealing temperature of 200 degrees C. The further annealing at 300 degrees C, forced the appearing of the orthorhombic In4Se3 phase. Optically, the annealing of the InSe/Au(100 nm)/InSe at 200 degrees C improved the absorption ratio by similar to 9 times and decreased the energy band gap. The nanosandwiching technique of InSe seems to be promising for the engineering of the optical properties of the InSe photovoltaic material.Article Citation - WoS: 10Citation - Scopus: 10Fabrication and Characterization of Yb/Moo3< Devices(Elsevier Science Bv, 2019) Al Garni, S. E.; Qasrawi, A. F.In this study we have explored some of the properties of Yb/MoO3/(C, Yb) thin films as a multifunctional optoelectronic device. While the MoO3 films which are deposited onto glass substrate are found to be of amorphous nature, the Yb metal induced the growth of orthorhombic phase of MoO3. The films are high transparent and exhibit energy band gap value of 3.0 eV which make it sensitive to light signals in the near ultraviolet range of light. In addition, the frequency dependent capacitance-voltage characteristics of Yb/MoO3/(C,Yb) structure display pronounced accumulation, depletion and inversion regions that nominate it for use as tunable metal-oxide-semiconductor MOS device. The physical parameters including the built in voltage, barrier height, flat band and threshold voltages of the MOS capacitors are also determined. Furthermore, the current-voltage characteristics displayed high rectification ratio that could reach 1.26 x 10(4) at biasing voltage of 0.5 V nominating the Yb/MoO3/C device for use as electronic switches. On the other hand, the impedance spectroscopy analysis in the frequency domain of 0.01-1.80 GHz, have shown that the Yb/MoO3/Yb structures are more appropriate for microwave applications than Yb/MoO3/C device. The microwave cutoff frequency for the Yb sandwiched MoO3 exceeds 140 GHz. The return loss for the Yb/MoO3/Yb reaches 26 dB at 1.8 GHz. These values are attractive as they suit microwave low/high pass band fillers.Article Citation - WoS: 3Citation - Scopus: 3Optical Analysis of Ge/Mgo and Ge/Bn Thin Layers Designed for Terahertz Applications(Elsevier Sci Ltd, 2015) Al Garni, S. E.; Qasrawi, A. F.In this work, a 200 nm Ge thin film is used as a substrate to design Ge/MgO and Ge/BN layers. The optical dynamics in these devices are investigated by means of the reflectivity and the transmissivity measurements. Particularly, the details of the dielectric spectra and the values of the energy band gaps (E-g) are investigated. Below 350 THz, the construction of Ge/MgO and Ge/BN interfaces decreased the effective dielectric constant of Ge by 39% and by 76%, respectively. It also increased the quality factor of the Ge optical device from 150 to 1400 and to 940 at 300 THz. All the dispersive optical parameters are also evaluated. In addition, the direct/indirect E-g value of Ge which was determined as 1.15/0.72 eV is observed to shift down by a 0.13/0.42 and by a 023/0.54 eV for the Ge/MgO and Ge/BN devices, respectively. The sharp increase in the dielectric constant with decreasing frequency in the range of 353 273 THz, the dispersive optical parameters and the energy band gap attenuations of the optical structures are promising as they indicate the applicability of the Ge, Ge/MgO and Gel BN layers in terahertz sensing. The latter technology has a wide range of applications like medical and telecommunication devices. (C) 2014 Elsevier Ltd. All rights reserved.Article Citation - WoS: 16Citation - Scopus: 15Design and Characterization of the Ge/Ga2< Heterojunction(Springer, 2017) Al Garni, S. E.; Qasrawi, A. F.In this work, the formation and properties of Ga2S3 thin films deposited onto polycrystalline Ge substrates are studied by means of scanning electron microscopy, energy dispersive x-ray analyzer, Raman spectroscopy, x-ray diffraction techniques, ultraviolet-visible light spectrophotometry in the range of 300-1100 nm and by ac signal power spectroscopy in the range of 0.2-3.0 GHz. The first four techniques allowed the determining of the stoichiometry, the vibrational frequencies, the lattice parameters, the plane orientations, the strain and the defect density for the interface. In addition, it was observed that the Ge/Ga2S3 interface exhibited conduction and valence band offsets of 0.83 eV and 0.82 eV, respectively, and the real part of the dielectric spectra experimentally exhibited four resonance peaks centered at frequencies above 357 THz. Moreover, the computational analysis of the imaginary part of the dielectric constant via the Drude-Lorentz model has shown that the interface wave filtering properties are controlled by the electron-plasmon coupling with plasma frequencies in the range of 1.33-2.30 GHz. The drift mobility of electrons in this range was found to be 15.61 cm(2)/Vs. The real ability of the interface to control wave propagation was confirmed with ac signals propagating tests. The plasmonic features of the interface nominate it for use in microwave cavities and as wireless terahertz receivers.Article Citation - WoS: 9Citation - Scopus: 10Growth and Characterization of Inse/Ge Interfaces(Elsevier Gmbh, Urban & Fischer verlag, 2017) Al Garni, S. E.; Omareye, Olfat A.; Qasrawi, A. F.In the current study, we report the effect of insertion of a 200 nm thick Ge film between two layers of InSe. The Ge sandwiched InSe films are studied by means of X-ray diffraction technique, energy dispersion X-ray spectroscopy attached to a scanning electron microscope, optical spectrophotometry and light power dependent photoconductivity. It was observed that, The InSe prefers the growth of InSe monophase when deposited onto glass and the growth of gamma-In2Se3 when deposited onto InSe/Ge substrate. The three layers interface (InSe/Ge/gamma-In2Se3) exhibits a Ge induced crystallization process at annealing temperature of 200 degrees C. The optical analysis has shown that the InSe films exhibit a redshift upon Ge sandwiching. In addition, the conduction and valence bands offsets at the first interface (InSe/Ge) and at the second (Ge/gamma-In2Se3) interface are found to be 0.55 eV and 1.0 eV, and 0.40eVand 1.38 eV, respectively. Moreover, the photocurrent of the Ge sandwiched InSe exhibited higher photocurrent values as compared to those of InSe. On the other hand, the dielectric spectral analysis and modeling which lead to the identifying of the optical conduction parameters presented by the plasmon frequency, electron scattering time, free electron density and drift mobility have shown that the Ge sandwiching increased the drift mobility values from 10 cm(2)/Vs to 42 cm(2)/Vs. The main plasmon frequency also increased from 1.08 to 1.68 GHz. (C) 2017 Elsevier GmbH. All rights reserved.Article Citation - WoS: 8Citation - Scopus: 8Effect of Lithium Nanosandwiching on the Structural, Optical and Dielectric Performance of Moo3(Elsevier, 2019) Al Garni, S. E.; Qasrawi, A. F.In this article, we discuss the effects of lithium nanosheets on the structural, optical, dielectric and optical conductivity parameters of the MoO3 films. The nanosandwiching of Li layers between two layers of MoO3 of thicknesses larger than 20 nm induced the crystallization process of the amorphous MoO3. Namely, MoO3 thin films that are nanosandwiched with Li sheets of thicknesses larger than 50 nm, exhibit structural phase transitions from hexagonal to monoclinic and reveals larger crystallite sizes. The possible formation of Li2O at the MoO3/Li/MoO3 interfaces is simulated and discussed. Optically, the Li nanosandwiching is observed to enhance the light absorbability by 11.0 times at 2.0 eV and successfully engineered the energy bands gap in the range of 3.05-0.45 eV. It also enhances the dielectric performance. In addition, relatively thick layers of lithium (200 nm) succeeds in converting the conductivity type from n-to p-type. The modeling of the dielectric spectra in accordance with the Drude- Lorentz approach have shown that the presence of Li in the structure of MoO(3 )significantly increases the drift mobility values of electrons from 5.86 to 11.40 cm(2)/V. The plasmon frequency range for this system varies in the frequency domain of 0.32-5.94 GHz. The features of MoO3/Li/MoO3 interfaces make them attractive for thin film transistor technology as optical receivers being promising for use in optical communications.Article Citation - WoS: 8Citation - Scopus: 8Design and performance of Yb/ZnS/C Schottky barriers(Elsevier Science Bv, 2017) Khusayfan, Najla M.; Al Garni, S. E.; Qasrawi, A. F.In this work, ZnS thin films are deposited onto glass and transparent ytterbium substrates under vacuum pressure of 10(-5) mbar. The effects of the Yb substrate on the structural, mechanical, optical, dielectric and electrical performance of the ZnS are explored by means of the energy dispersion X-ray analyzer, X-ray diffraction, UVeVIS spectroscopy, current-voltage characteristics and impedance spectroscopy techniques. The techniques allowed determining the lattice parameters, the grain size, the degree of orientation, the microstrain, the dislocation density, the optical and the excitonic gaps, the energy band offsets and the dielectric resonance and dispersion. The (111) oriented planes of glass/ZnS and Yb/ZnS exhibited 2.06% lattice mismatch between Yb and ZnS and degree of orientation values of 63% and 51.6%, respectively. The interfacing of the ZnS with Yb shrunk the energy band gap of ZnS by 0.50 eV. On the other hand, the electrical analysis on the Yb/ZnS/C Schottky device has revealed a rectification ratio of 3.48 x 10(4) at a biasing voltage of 0.30 V. The barrier height and ideality factor was also determined. Moreover, the impedance spectroscopy analysis have shown that the Yb/ZnS/C device is very attractive for use as varactor devices of wide tunability. The device could also be employed as microwave resonator above 1337 MHz. (C) 2016 Elsevier B. V. All rights reserved.Article Citation - WoS: 21Citation - Scopus: 21Design and Characterization of Moo3 Heterojunctions(Elsevier Science Bv, 2019) Al Garni, S. E.; Qasrawi, A. F.In this work, the morphological, compositional, structural, optical and dielectric properties of CdSe which are deposited onto glass and onto MoO3 thin film substrates are investigated. The use of MoO3 as substrate for the growth of CdSe is observed to increase the lattice parameters of the hexagonal unit cell of CdSe and decreases the values of grain size and strain. It also forms band tails of width of 0.20 eV in the band gap of CdSe. The optical analysis has shown that the MoO3/CdSe interfacing results in blue shift in the energy band gap of CdSe and also result in large conduction and valence band of sets of values of 2.12 and 0.94 eV, respectively. The dielectric spectral analysis with the help of Prude-Lorentz approaches for optical conduction, revealed an enhancement in the drift mobility of charge carriers from 15.69 to 39.30 cm(2)/V as a response to the incident electromagnetic field. The free carrier density of the MoO3/CdSe being of the order of 10(17) cm(-3) with the large valence and conduction band offsets and the sufficiently large drift mobility nominates the MoO3/CdSe heterojunctions as an effective component of optoelectronic technology including thin film transistors.Article Citation - WoS: 9Citation - Scopus: 8Plasmon Interactions at the (ag, Al)/Inse Thin-Film Interfaces Designed for Dual Terahertz/Gigahertz Applications(Springer, 2017) Al Garni, S. E.; Omar, A.; Qasrawi, A. F.In this article, we investigate the plasmon-dielectric spectral interaction in the Ag/InSe and Al/InSe thin-film interfaces. The mechanism is explored by means of optical absorbance and reflectance at terahertz frequencies and by the impedance spectroscopy at gigahertz frequencies. It was observed that the interfacing of the InSe with Ag and Al metals with a film thickness of 250 nm causes an energy band gap shift that suits the production of thin-film optoelectronic devices. The reflectance and dielectric constant and optical conductivity spectral analysis of these devices displayed the properties of wireless band stop filters at 390 THz. The physical parameters which are computed from the conductivity spectra revealed higher mobility of charge carriers at the Al/InSe interface over that of Ag/InSe. The respective electron-bounded plasmon frequencies are found to be 2.61 and 2.13 GHz. On the other hand, the impedance spectral analysis displayed a microwave resonator feature with series resonance peak position at 1.68 GHz for the Al/InSe/Ag interface. In addition, the temperature-dependent impedance spectra, which were recorded in the temperature range of 300-420 K, revealed no significant effect of temperature on the wave trapping properties of the Al/InSe/Ag interface. The sensitivity of the interfaces to terahertz and gigahertz frequencies nominates it as laser light/microwave traps, which are used in fibers and communications.
