Fabrication and Characterization of Yb/Moo<sub>3< Devices

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Date

2019

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Elsevier Science Bv

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Department of Electrical & Electronics Engineering
Department of Electrical and Electronics Engineering (EE) offers solid graduate education and research program. Our Department is known for its student-centered and practice-oriented education. We are devoted to provide an exceptional educational experience to our students and prepare them for the highest personal and professional accomplishments. The advanced teaching and research laboratories are designed to educate the future workforce and meet the challenges of current technologies. The faculty's research activities are high voltage, electrical machinery, power systems, signal and image processing and photonics. Our students have exciting opportunities to participate in our department's research projects as well as in various activities sponsored by TUBİTAK, and other professional societies. European Remote Radio Laboratory project, which provides internet-access to our laboratories, has been accomplished under the leadership of our department with contributions from several European institutions.

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Abstract

In this study we have explored some of the properties of Yb/MoO3/(C, Yb) thin films as a multifunctional optoelectronic device. While the MoO3 films which are deposited onto glass substrate are found to be of amorphous nature, the Yb metal induced the growth of orthorhombic phase of MoO3. The films are high transparent and exhibit energy band gap value of 3.0 eV which make it sensitive to light signals in the near ultraviolet range of light. In addition, the frequency dependent capacitance-voltage characteristics of Yb/MoO3/(C,Yb) structure display pronounced accumulation, depletion and inversion regions that nominate it for use as tunable metal-oxide-semiconductor MOS device. The physical parameters including the built in voltage, barrier height, flat band and threshold voltages of the MOS capacitors are also determined. Furthermore, the current-voltage characteristics displayed high rectification ratio that could reach 1.26 x 10(4) at biasing voltage of 0.5 V nominating the Yb/MoO3/C device for use as electronic switches. On the other hand, the impedance spectroscopy analysis in the frequency domain of 0.01-1.80 GHz, have shown that the Yb/MoO3/Yb structures are more appropriate for microwave applications than Yb/MoO3/C device. The microwave cutoff frequency for the Yb sandwiched MoO3 exceeds 140 GHz. The return loss for the Yb/MoO3/Yb reaches 26 dB at 1.8 GHz. These values are attractive as they suit microwave low/high pass band fillers.

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Qasrawi, Atef Fayez/0000-0001-8193-6975; Al Garni, Sabah/0000-0002-4995-8231

Keywords

MoO3, X-ray diffraction, MOS, Microwave

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Volume

19

Issue

5

Start Page

639

End Page

645

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