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Conference Object Citation - WoS: 10Citation - Scopus: 11Improving the Laser Damage Resistance of Oxide Thin Films and Multilayers Via Tailoring Ion Beam Sputtering Parameters(Elsevier Science Bv, 2015) Cosar, M. B.; Coşar, Batuhan Mustafa; Ozhan, A. E. S.; Aydogdu, G. H.; Coşar, Batuhan Mustafa; Computer Engineering; Computer EngineeringIon beam sputtering is one of the widely used methods for manufacturing laser optical components due to its advantages such as uniformity, reproducibility, suitability for multilayer coatings and growth of dielectric materials with high packing densities. In this study, single Ta2O5 layers and Ta2O5/SiO2 heterostructures were deposited on optical quality glass substrates by dual ion beam sputtering. We focused on the effect of deposition conditions like substrate cleaning, assistance by 12 cm diameter ion beam source and oxygen partial pressure on the laser-induced damage threshold of Ta2O5 single layers. After-wards, the obtained information is employed to a sample design and produces a Ta2O5/SiO2 multilayer structure demonstrating low laser-induced damage without a post treatment procedure. (C) 2014 Elsevier B.V. All rights reserved.Article Citation - WoS: 16Citation - Scopus: 17Dielectric Dispersion in Ga2s3< Thin Films(Springer, 2017) Alharbi, S. R.; Qasrawi, A. F.In this work, the structural, compositional, optical, and dielectric properties of Ga2S3 thin films are investigated by means of X-ray diffraction, scanning electron microscopy, energy dispersion X-ray analysis, and ultraviolet-visible light spectrophotometry. The Ga2S3 thin films which exhibited amorphous nature in its as grown form are observed to be generally composed of 40.7 % Ga and 59.3 % S atomic content. The direct allowed transitions optical energy bandgap is found to be 2.96 eV. On the other hand, the modeling of the dielectric spectra in the frequency range of 270-1,000 THz, using the modified Drude-Lorentz model for electron-plasmon interactions revealed the electrons scattering time as 1.8 (fs), the electron bounded plasma frequency as similar to 0.76-0.94 (GHz) and the reduced resonant frequency as 2.20-4.60 x10(15) (Hz) in the range of 270-753 THz. The corresponding drift mobility of electrons to the terahertz oscillating incident electric field is found to be 7.91 (cm (2)/Vs). The values are promising as they nominate the Ga2S3 thin films as effective candidates in thin-film transistor and gas sensing technologies.Article Citation - WoS: 9Citation - Scopus: 9Effect of Ytterbium, Gold and Aluminum Transparent Metallic Substrates on the Performance of the Ga2s3< Thin Film Devices(Elsevier Science Bv, 2017) Alharbi, S. R.; Qasrawi, A. F.In the current work, the structural, optical, dielectric and electrical properties of the Ga2S3 thin films which are deposited onto transparent thin Al, Yb and Au metal substrates are characterized by means of transmittance electron microscopy, X-ray diffraction, ultraviolet visible light spectroscopy and impedance spectroscopy techniques. The effects of the metallic substrates on the crystalline nature, energy band gap and dielectric spectra are also investigated. The modeling of the dielectric spectra allowed determining the effect of the Al, Yb and Au thin layers on the electron scattering time, the plasmon frequency, free electron density and drift mobility. In addition, a Yb/Ga2S3/Au Schottky barrier and All Ga2S3/Au back to back Schottky barrier devices (metal-semiconductor-metal (MSM) device) are fabricated and characterized by means of capacitance-voltage characteristics and capacitance and conductance spectra in the frequency range of 10-1800 MHz. While the Schottky barrier device displayed three distinct positions of resonance-antiresonance phenomena, the MSM device displayed one peak with narrow bandwidth of 10 MHz. The MSM devices exhibited an inversion, depletion and accumulation modes within a voltage range of 0.25 V width at 250 MHz. The study indicates the applicability of these device as smart capacitive switches, as Plasmon devices and as wavetraps. (C) 2017 Elsevier B.V. All rights reserved.Article Citation - WoS: 7Citation - Scopus: 7Design of the Zns/Ge pn Interfaces as Plasmonic, Photovoltaic and Microwave Band Stop Filters(Elsevier Science Bv, 2017) Alharbi, S. R.; Qasrawi, A. F.In the current work, we report and discuss the features of the design of a ZnS (300 nm)/Ge (300 nm)/GaSe (300 nm) thin film device. The device is characterized by the X-ray diffraction, electron microscopy, energy dispersive X-ray spectroscopy (EDS), optical spectroscopy, microwave power spectroscopy and light power dependent photoconductivity. While the X-ray diffraction technique revealed a polycrystalline ZnS coated with two amorphous layers of Ge and GaSe, the hot probe tests revealed the formation of pn interface. The optical spectra which were employed to reveal the conduction and valence band offsets at the ZnS/Ge and Ge/GaSe interface indicated information about the dielectric dispersion at the interface. The dielectric spectra of the ZnS/Ge/GaSe heterojunction which was modeled assuming the domination of surface plasmon interactions through the films revealed a pronounced increase in the drift mobility of free carriers in the three layers compared to the single and double layers. In the scope of the fitting parameters, a wave trap that exhibit filtering properties at notch frequency of 2.30 GHz was designed and tested. The ac signals power spectrum absorption reached similar to 99%. In addition, the photocurrent analysis on the ZnS/Ge/GaSe interface has shown it is suitability for photovoltaic and photosensing applications. (C) 2017 The Authors. Published by Elsevier B.V. This is an open access article under the CC BY-NC-ND licenseArticle Citation - WoS: 2Citation - Scopus: 2Mgo/Gase0.5< Heterojunction as Photodiodes and Microwave Resonators(Ieee-inst Electrical Electronics Engineers inc, 2016) Qasrawi, Atef F.; Khanfar, Hazem K.; Gasanly, N. M.In this paper, a multifunctional operating optoelectronic device that suits visible light (VLC) and microwave communication systems is designed and characterized. The device which is composed of p-type MgO and n-type GaSe0.5S0.5 heterojunction is characterized by means of optical absorbance in the incident light energy (E) region of 3.5-1.1 eV, dark and illuminated current (I)-voltage (V) characteristics, and impedance spectra in the frequency range of 1M-1.8 GHz. Four types of lasers which generate light of wavelengths 406, 632, 850, and 1550 nm are used to excite the active region of the device. The device was also illuminated by non-monochromatic light. The incident light power was varied in the range of 1.12-10.17 mu W. It was observed that the heterojunction exhibits an optical energy bandgap (E-g) of 1.85 eV. For laser excitation with E > Eg, the photosensitivity (S) exceeds 67 while it is less than unity for excitations with E < Eg. These behaviors are assigned to the intrinsic and extrinsic nature of absorption, respectively. In addition, S increases as a result of energy barrier height lowering with increasing light power. On the other hand, when the device was excited with ac signal, the capacitance and impedance of the device displayed a resonance-antiresonance property associated with negative differential resistance and very high signal quality factor (10(3)) above 1.37 GHz. The bandwidth of the two resonance-antiresonance peaks is 319 and 12.6 MHz at 1.475 and 1.649 GHz, respectively. These results are attractive for using the heterojunction in VLC and microwave communication technologies.Article Citation - WoS: 11Citation - Scopus: 11Optical and Electrical Performance of Yb/Inse Interface(Elsevier Sci Ltd, 2016) Alharbi, S. R.; Qasrawi, A. F.In this study a 300 nm ytterbium transparent thin film is used as substrate to a 300 nm thick InSe thin film. The optical transmittance, reflectance and absorbance of the glass/InSe and Yb/InSe films are measured and analyzed. The optical data allowed determining the effects of the Yb layer on the energy band gap, on the dielectric and on optical conductivity spectra. The band gap of the InSe films shrunk from 2.38/139 to 1.90/1.12 eV upon Yb layer interfacing leading to a band offset of 0.48/0.27 eV. On the other hand, the modeling of the optical conductivity in accordance with the Lorentz theory revealed a free carrier scattering time, carrier density and mobility of 0.225 (fs), 3.0 x 10(19)(cm(-3)) and 2.53 cm(2)/Vs for the Yb/InSe interface, respectively. As these values seem to be promising for employing the Yb/InSe interface in thin film transistor technology, the current voltage characteristics of Yb/InSe/C Schottky diode were recorded and analyzed. The electrical analysis revealed the removal of the tunneling channels by using Yb in place of Al. In addition, the "on/off' current ratios, the Schottky barrier height and the switching voltage of the Yb/InSe/C device are found to be 18.8, 0.76/0.60 eV and 0.53 V, respectively. (C) 2015 Elsevier Ltd. All rights reserved.Article Citation - WoS: 9Citation - Scopus: 8Dielectric dispersion in InSe/CdS bilayers(Elsevier Science Bv, 2018) Qasrawi, A. F.; Shehada, Sufyan R.In the current study, the effect of the amorphous InSe thin film substrate on the structural, optical and dielectric properties of CdS are investigated. The structural analysis of the bilayers indicated a strained growth of CdS onto InSe leading to decrease in grain size and increase in the dislocation density. The optical measurements have shown that the InSe/CdS exhibits two direct allowed transitions energy band gap values of 2.04 and 1.38 eV, in the high and low absorption regions, respectively. On the other hand, the detailed analysis of the dielectric spectra for the InSe, CdS and InSe/CdS layers has shown that the presence of the InSe substrate significantly improves the optical conduction parameters. Particularly, the Drude-Lorentz modeling for these dielectric systems revealed a drift mobility value of 329 cm(2)/V for the InSe/CdS bilayer. The deposition of the CdS onto InSe is also observed to shift the plasmon frequency of CdS from 2.49 to 0.77 GHz. The general features of the InSe/ CdS as plasmon cavities are promising as it shows its usability for production of optoelectronic devices that exhibit high performance at very high frequencies.Article Citation - WoS: 6Citation - Scopus: 6Optical Characterization of Cuin5s8< Crystals by Ellipsometry Measurements(Pergamon-elsevier Science Ltd, 2016) Isik, Mehmet; Gasanly, NizamiOptical properties of CuIn5S8 crystals grown by Bridgman method were investigated by ellipsometry measurements. Spectral dependence of optical parameters; real and imaginary parts of the pseudodielectric function, pseudorefractive index, pseudoextinction coefficient, reflectivity and absorption coefficients were obtained from the analysis of ellipsometry experiments performed in the 1.2-6.2 eV spectral region. Analysis of spectral dependence of the absorption coefficient revealed the existence of direct band gap transitions with energy 1.53 eV. Wemple-DiDomenico and Spitzer-Fan models were used to find the oscillator energy, dispersion energy, zero-frequency refractive index and high-frequency dielectric constant values. Structural properties of the CuIn5S8 crystals were investigated using X-ray diffraction and energy dispersive spectroscopy analysis. (C) 2015 Elsevier Ltd. All rights reserved.Article Citation - WoS: 4Citation - Scopus: 4Effect of Au/Ge Substrate on the Properties of Gase(Elsevier Gmbh, 2018) Qasrawi, A. F.; Abdallah, Maisam M. A.In this work, the effect of glass/Ge and Au/Ge substrate on the structural, optical and electrical properties of the GaSe thin films is investigated by means of X-ray diffraction, ultraviolet-visible light spectrophotometry and impedance spectroscopy techniques, respectively. While the glass/Ge, glass/GaSe and glass/Ge/GaSe are observed to exhibit amorphous nature of structure, the Au/Ge, and Au/Ge/GaSe are of polycrystalline nature. The formation of the Ge/GaSe interface exhibited high conduction band offset of value of 0.90 eV and enhanced the light absorbability of GaSe at 1.47 eV by 80 times. In addition, the modeling of the dielectric spectra for the Ge/GaSe interface revealed optical conductivity parameters presented by scattering time at femtosecond level and improvement of the drift mobility. Moreover, the impedance spectroscopy measurements have shown that with the increasing frequency, the Au/Ge/GaSe/Yb interface exhibit increasing trend of variation in the resistance causing high impedance mode associated with negative capacitance values below 1300 MHz. The effect is completely reversed in the higher range of frequency. These features of the Ge/GaSe interface nominate it as plasmonic interface, microwave cavities and as voltage amplifiers in low power nanoscale devices. (C) 2018 Elsevier GmbH. All rights reserved.Article Citation - WoS: 11Citation - Scopus: 11Post Annealing Effects on the Structural, Compositional, Optical and Dielectric Properties of Cd Doped Gase Thin Films(Elsevier Science Sa, 2015) Al Garni, S. E.; Qasrawi, A. F.In this work, the heat treatment effects at temperatures (T-a) of 200, 300 and 400 degrees C on the compositional, structural, optical and dielectric properties of Cd doped GaSe are explored by means of energy dispersive X-ray spectroscopy, X-ray diffraction and UV-VIS spectrophotometry. The annealing process of the Cd doped GaSe thin films revealed a highly oriented orthorhombic structure type that exhibit a systematic increase in the grain size. While the strain, degree of orientation and dislocation density of the annealed films are weakly affected by the annealing process. The optical energy band gap of the doped films decreased from 1.23 to 0.90 eV and the exponential energy band tails rose from 0.16 to 0.23 eV when the annealing temperature is raised from 300 to 400 degrees C. In addition, the analysis of the dielectric spectral curves which were studied in the frequency range of 270-1500 THz, allowed to investigate the oscillator and dispersion energies and the static (epsilon(s)) and lattice (epsilon(l)) dielectric constants. The annealing process on the doped samples decreased the dispersion and oscillator energies as well as es. Oppositely, el values increased from 12.52 to 24.45 as a result of larger grain size and less defect density associated with annealing process when T-a is raised from 200 to 400 degrees C, respectively. (C) 2015 Elsevier B.V. All rights reserved.
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