Improving the Laser Damage Resistance of Oxide Thin Films and Multilayers Via Tailoring Ion Beam Sputtering Parameters

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2015

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Elsevier Science Bv

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Computer Engineering
(1998)
The Atılım University Department of Computer Engineering was founded in 1998. The department curriculum is prepared in a way that meets the demands for knowledge and skills after graduation, and is subject to periodical reviews and updates in line with international standards. Our Department offers education in many fields of expertise, such as software development, hardware systems, data structures, computer networks, artificial intelligence, machine learning, image processing, natural language processing, object based design, information security, and cloud computing. The education offered by our department is based on practical approaches, with modern laboratories, projects and internship programs. The undergraduate program at our department was accredited in 2014 by the Association of Evaluation and Accreditation of Engineering Programs (MÜDEK) and was granted the label EUR-ACE, valid through Europe. In addition to the undergraduate program, our department offers thesis or non-thesis graduate degree programs (MS).

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Ion beam sputtering is one of the widely used methods for manufacturing laser optical components due to its advantages such as uniformity, reproducibility, suitability for multilayer coatings and growth of dielectric materials with high packing densities. In this study, single Ta2O5 layers and Ta2O5/SiO2 heterostructures were deposited on optical quality glass substrates by dual ion beam sputtering. We focused on the effect of deposition conditions like substrate cleaning, assistance by 12 cm diameter ion beam source and oxygen partial pressure on the laser-induced damage threshold of Ta2O5 single layers. After-wards, the obtained information is employed to a sample design and produces a Ta2O5/SiO2 multilayer structure demonstrating low laser-induced damage without a post treatment procedure. (C) 2014 Elsevier B.V. All rights reserved.

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Dual ion beam sputtering, Tantalum compounds, Laser-induced damage, Optical materials

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Symposium on Laser Interaction with Advaned Materials: Fundamentals and Applications -- 2014 -- Lille, FRANCE

Volume

336

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Start Page

34

End Page

38

URI

https://doi.org/10.1016/j.apsusc.2014.09.048
 https://hdl.handle.net/20.500.14411/839

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