Improving the Laser Damage Resistance of Oxide Thin Films and Multilayers Via Tailoring Ion Beam Sputtering Parameters
| dc.contributor.author | Cosar, M. B. | |
| dc.contributor.author | Coşar, Batuhan Mustafa | |
| dc.contributor.author | Ozhan, A. E. S. | |
| dc.contributor.author | Aydogdu, G. H. | |
| dc.contributor.author | Coşar, Batuhan Mustafa | |
| dc.contributor.other | Computer Engineering | |
| dc.contributor.other | Computer Engineering | |
| dc.date.accessioned | 2024-07-05T14:32:41Z | |
| dc.date.available | 2024-07-05T14:32:41Z | |
| dc.date.issued | 2015 | |
| dc.description.abstract | Ion beam sputtering is one of the widely used methods for manufacturing laser optical components due to its advantages such as uniformity, reproducibility, suitability for multilayer coatings and growth of dielectric materials with high packing densities. In this study, single Ta2O5 layers and Ta2O5/SiO2 heterostructures were deposited on optical quality glass substrates by dual ion beam sputtering. We focused on the effect of deposition conditions like substrate cleaning, assistance by 12 cm diameter ion beam source and oxygen partial pressure on the laser-induced damage threshold of Ta2O5 single layers. After-wards, the obtained information is employed to a sample design and produces a Ta2O5/SiO2 multilayer structure demonstrating low laser-induced damage without a post treatment procedure. (C) 2014 Elsevier B.V. All rights reserved. | en_US |
| dc.description.sponsorship | TUBITAK/TEYDEB [3110107]; TTGV [01/ITEP2] | en_US |
| dc.description.sponsorship | The authors gratefully acknowledge VLOC and QUANTEL Laser testing laboratories for laser damage measurements. Many thanks also to co-workers Dr. Kuthan Yelen, Levent Yaka, Haci Batman and Emrah Atmaca. This work was supported by TUBITAK/TEYDEB (grant number 3110107) and TTGV (grant number 01/ITEP2). | en_US |
| dc.description.sponsorship | TEYDEB, (01/İTEP2, 3110107); TUBİTAK | |
| dc.identifier.doi | 10.1016/j.apsusc.2014.09.048 | |
| dc.identifier.issn | 0169-4332 | |
| dc.identifier.issn | 1873-5584 | |
| dc.identifier.scopus | 2-s2.0-84925453766 | |
| dc.identifier.uri | https://doi.org/10.1016/j.apsusc.2014.09.048 | |
| dc.identifier.uri | https://hdl.handle.net/20.500.14411/839 | |
| dc.language.iso | en | en_US |
| dc.publisher | Elsevier Science Bv | en_US |
| dc.relation.ispartof | Symposium on Laser Interaction with Advaned Materials: Fundamentals and Applications -- 2014 -- Lille, FRANCE | en_US |
| dc.rights | info:eu-repo/semantics/closedAccess | en_US |
| dc.subject | Dual ion beam sputtering | en_US |
| dc.subject | Tantalum compounds | en_US |
| dc.subject | Laser-induced damage | en_US |
| dc.subject | Optical materials | en_US |
| dc.title | Improving the Laser Damage Resistance of Oxide Thin Films and Multilayers Via Tailoring Ion Beam Sputtering Parameters | en_US |
| dc.type | Conference Object | en_US |
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| gdc.description.department | Atılım University | en_US |
| gdc.description.departmenttemp | [Cosar, M. B.; Ozhan, A. E. S.; Aydogdu, G. H.] Aselsan Inc Microelect, Guidance & Electroopt Div, TR-06750 Ankara, Turkey; [Cosar, M. B.] Middle E Tech Univ, Dept Met & Mat Engn, TR-06800 Ankara, Turkey; [Ozhan, A. E. S.] Atilim Univ, Grad Sch Nat & Appl Sci, TR-06836 Ankara, Turkey | en_US |
| gdc.description.endpage | 38 | en_US |
| gdc.description.publicationcategory | Konferans Öğesi - Uluslararası - Kurum Öğretim Elemanı | en_US |
| gdc.description.startpage | 34 | en_US |
| gdc.description.volume | 336 | en_US |
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