Browsing by Author "Yildiz, D. E."
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Article Citation Count: 6Analysis of Double Gaussian Distribution on Barrier Inhomogeneity in a Au/n-4H SiC Schottky Diode(Springer, 2021) Güllü, Hasan Hüseyin; Sirin, D. Seme; Yildiz, D. E.; Department of Electrical & Electronics EngineeringA n-4H SiC based diode is fabricated by an Au front metal contact to provide rectification at the metal-semiconductor (MS) junction, and a back ohmic contact is also obtained using Au metal with post-thermal heating. MS diode characteristics are investigated by current-voltage (I - V) measurements with a wide range of temperature from 80 K to 300 K. At each temperature, rectifying behavior is achieved and it is improved with an increase in temperature. Barrier height and ideality factor are calculated according to the thermionic emission (TE) model from linearity in the forward bias region of the ln(I) versus V plot. The experimental zero-bias barrier height (Phi(b0)) values are in a good agreement with literature, and at around room temperature the ideality factor (n) reaches unity. At saturation regions in I - V curves, parasitic resistance values are derived by Ohm's law and the series resistance values are also reevaluated by Cheung's relation. Detailed I - V analysis is performed by modifying the TE model with an approximation of low barrier patches embedded in the main barrier height. Two linear relations in the characteristic plots of Phi(b0) and n indicate that double Gaussian distribution is a suitable current conduction model via localized barrier patches at low temperatures. Additionally, reverse bias current flow is analyzed under the dominant effect of Poole-Frenkel emission associated with the interfacial traps. According to the characteristic electric field-dependent current density plot, emission barrier height and relative dielectric constant for n-4H SiC are calculated.Article Citation Count: 32Analysis of forward and reverse biased current-voltage characteristics of Al/Al2O3/n-Si Schottky diode with atomic layer deposited Al2O3 thin film interlayer(Springer, 2019) Güllü, Hasan Hüseyin; Yildiz, D. E.; Department of Electrical & Electronics EngineeringThe dark current-voltage (I-V) characteristics of Al/Al2O3/n-Si Schottky diode are investigated in a wide temperature range of 260-360 K. The diode shows four orders of magnitude rectification. In forward and reverse bias regions, the temperature-dependent I-Vcharacteristics are detailed in terms of diode parameters and dominant conduction mechanisms. Due to the existence of Al2O3 film layer and series resistance in the diode structure, current flow under the forward bias is observed in a deviation from pure exponential characteristics. The diode parameters are estimated from thermionic emission model with non-unity ideality factor, and this non-ideal behavior is resulted in the ideality factors greater than two. In addition to these values, zero-bias barrier height is found to be strongly temperature dependent, and this variation indicates a presence of inhomogeneties in the barrier according to Gaussian distribution (GD) approximation. This fact is investigated plotting characteristic plot of this model and by extracting mean barrier height with its standard deviation. In order to complete the work on the forward I-V region, the carrier transport characteristics of the diode are explained on the basis of thermionic emission mechanism with a GD of the harrier heights. In accordance with this approximation, the conventional Richardson plot exhibits non-linearity behavior and modified current relation based on GD model is used to calculate mean barrier height and Richardson constant. In addition, the values of parasitic resistances are determined using Ohm's law as a function of temperature for all bias voltage spectra. In the reverse bias region, Poole-Frenkel effect is found to be dominant on the conduction associated with the barrier lowering, and barrier height in the emission process from the trapped states, and high-frequency dielectric constant of Al2O3 film layer is calculated.Article Citation Count: 9Analysis of temperature-dependent forward and leakage conduction mechanisms in organic thin film heterojunction diode with fluorine-based PCBM blend(Springer, 2020) Güllü, Hasan Hüseyin; Gullu, H. H.; Toppare, L.; Cirpan, A.; Department of Electrical & Electronics EngineeringThe forward and reversed biased current-voltage behaviors of the organic diode were detailed in a wide range of temperatures. In this diode, a donor-acceptor-conjugated copolymer system was constructed with poly((9,9-dioctylfluorene)-2,7-diyl-(2-dodecyl-benzo[1,2,3]triazole)) as a partner of [6,6]-phenyl-C61-butyric acid methyl ester (PCBM). Two-order of magnitude rectification ratio was achieved, and the temperature-dependent values of saturation current, zero-bias barrier height, and ideality factor were extracted according to the thermionic emission model. The temperature responses of these diode parameters showed an existence of inhomogeneity in the barrier height formation. As a result, the observed non-ideal behavior was explained by Gaussian distribution of barrier height where low-barrier regions are effective in the forward biased conduction mechanism at low temperatures. Together with this analysis, series resistances were evaluated using Cheung's functions and also density of interface states were investigated. On the other hand, reverse biased current flow was found under the dominant effect of Poole-Frenkel effects associated with these interfacial traps. The reverse current conduction mechanism was detailed by calculating characteristic field-lowering coefficients and barrier height values in the emission process from the trapped state in the range of temperatures of interest.Article Citation Count: 26Capacitance, conductance, and dielectric characteristics of Al/TiO2/Si diode(Springer, 2021) Güllü, Hasan Hüseyin; Yildiz, D. E.; Department of Electrical & Electronics EngineeringIn this study, electrical properties of the Al/TiO2/p-Si diode structure with an atomic layer deposited TiO2 interface layer are investigated by current-voltage (I-V), capacitance-voltage (C - V), and conductance-voltage (G - V) measurements. It shows a rectifying behavior with about four order of rectification factor, and barrier height and ideality factor are calculated from the rectification curve. Dielectric parameters are determined from frequency-dependent C - V and G - V relations. The experimental results show that both of these curves are in a strong response to the frequency and bias voltage. They are found in decreasing behavior with increasing frequency, and both of them increase with increase in bias voltage although there are different increasing trends. At reversed bias voltage region, barrier potential, Fermi level energy, and interface charge carrier contribution are evaluated by using 1/C-2 - V plot. Series resistance values are also calculated under the variation of frequency and voltage. Thus, the capacitive characteristics of the diode are corrected by eliminating series resistance contribution together with the possible effect on interface charge carriers. Detailed information is obtained by determining electronic parameters affected by interface states over a wide frequency range (1 kHz to 1 MHz). At this point, strong response to the frequency is observed for the dielectric constant. Under the effect of interfacial polarization at low-frequency region, interface charge contribution to the capacitive response of the diode is obtained. Further analysis is performed on electrical modulus and impedance values derived from experimental dielectric data. Existence of interfacial layer capacitance is detailed by extracting distribution of interface charges from capacitance and conductance profiles of the diode under the effect of frequency.Article Citation Count: 28Dark and illuminated electrical characteristics of Si-based photodiode interlayered with CuCo5S8 nanocrystals(Springer, 2020) Güllü, Hasan Hüseyin; Gullu, H. H.; Sarilmaz, A.; Ozel, F.; Kocyigit, A.; Yildirim, M.; Department of Electrical & Electronics EngineeringDerived from the traditional dichalcogenide CuS structure, ternary transition metal chalcogenide nanoparticles in the form of CuCo5S8 are investigated under the aim of photodiode application. In addition to the detailed analysis on material characteristics of CuCo5S8 thin-film layer, the work is focused on the electrical characteristics of Au/CuCo5S8/Si diode to investigate its current-voltage, capacitance-voltage, and conductance-voltage characteristics under dark and illuminated conditions. CuCo5S8 nanocrystals with an average size of 5 nm are obtained using hot-injection method, and they are used to form thin-film interfacial layer between metal (Au) and semiconductor (Si). Under dark conditions, the diodes show about four orders in magnitude rectification rate and diode illumination results in efficient rectification with increase in intensity. The analysis of current-voltage curve results in non-ideal diode characteristics according to the thermionic emission model due to the existence of series resistances and interface states with interface layer. The measured current-voltage values are used to extract the main diode parameters under dark and illumination conditions. Under illumination, photogenerated carriers contribute to the current flow and linear photoconductivity behavior in photocurrent measurements with illumination shows the possible use of CuCo5S8 layer in Si-based photodiodes. This characteristic is also observed from the typical on/off illumination switching behavior for the photodiodes in transient photocurrent, photocapacitance, and photoconductance measurements with a quick response to the illumination. The deviations from ideality are also discussed by means of distribution of interface states and series resistance depending on the applied frequency and bias voltage.Article Citation Count: 21Determination of current transport characteristics in Au-Cu/CuO/n-Si Schottky diodes(Elsevier, 2019) Sürücü, Özge; Gullu, H. H.; Güllü, Hasan Hüseyin; Yildiz, D. E.; Parlak, M.; Electrical-Electronics Engineering; Department of Electrical & Electronics EngineeringIn this study, the material properties of CuO thin films fabricated by sputtering technique and electrical properties of CuO/n-Si structure were reported. Temperature-dependent current-voltage (I-V) measurement was carried out to determine the detail electrical characteristics of this structure. The anomaly in thermionic emission (TE) model related to barrier height inhomogeneity at the interface was obtained from the forward bias I-V analysis. The current transport mechanism at the junction was determined under the assumption of TE with Gaussian distribution of barrier height. In this analysis, standard deviation and mean zero bias barrier height were evaluated as 0.176 and 1.48 eV, respectively. Depending on the change in the diode parameters with temperature, Richardson constant was recalculated as 110.20 Acm(-2)K(-2) with the help of modified Richardson plot. In addition, density of states at the interface were determined by using the forward bias I-V results.Article Citation Count: 5Effect of TiO2 Thin Film with Different Dopants in Bringing Au-Metal into a Contact with n-Si(Springer, 2022) Güllü, Hasan Hüseyin; Gullu, H. H.; Cavus, H. Kanbur; Department of Electrical & Electronics EngineeringIn this work, effects of TiO2 contribution together with two different doping as graphene oxide (GO) and rubidium fluoride (RbF) are investigated at the interface of Au/n-Si metal-semiconductor (MS) diode. Diode characteristics are mainly evaluated from current-voltage measurements and values of barrier height and ideality factor are compared to the diodes with and without doping in interface layer. Although existence of interface layer increases these values, there is a decrease with adapting GO and RbF to the TiO2 structure. In addition, series and shunt resistance values are calculated with interface layer, and resistance effect is also discussed by Norde's and Cheung's functions. Forward biased carrier transport mechanism is evaluated under the presence of interface states by thermionic emission model and density of interface trap states is also discussed. At the reverse biased region, field effected thermionic emission model is found to be dominant flow mechanism, and leakage current behavior is explained by Schottky effect. Solar simulator with different illumination intensities is used to investigate photo-generated carrier contribution and photo-response of the diodes.Article Citation Count: 14Electrical characteristics of organic heterojunction with an alternating benzotriazole and fluorene containing copolymer(Springer, 2020) Güllü, Hasan Hüseyin; Yildiz, D. E.; Toppare, L.; Cirpan, A.; Department of Electrical & Electronics EngineeringThe current-voltage (I - V) and capacitance-voltage (C - V) characteristics of the organic heterojunction diode were investigated in a wide temperature range from 80 to 320 K and frequency range from 10 kHz to 1 MHz, respectively. Alternative to the copolymer partner poly(3-hexylthiophene) (P3HT) to [6,6]phenyl-C61-butyric acid methyl ester (PCBM), poly((9,9-dioctylfluorene)-2,7diyl-(4,7-bis(thien-2-yl)-2-dodecyl-benzo[1,2,3]triazole)) (named as copolymer in this work) was adapted to the bulk-heterojunction layer in the organic diode. Together with the use of Lif/Al bilayer electrode, the diode was fabricated as in the form of Al/LiF/copolymer:PCBM/PEDOT:PSS/ITO/glass. Under the applied bias voltage, this organic-based diode shows two- orders of magnitude rectifying behavior. According to thermionic emission (TE) model, the diode parameters such as saturation current, barrier height and ideality factor were determined and parasitic resistances were also extracted from the conventional ohmic relation. As to the temperature dependency of the diode parameters and their response to the temperature variation, barrier inhomogeneity, surface state and series resistance effects were found in dominant behavior on the current flow. The conduction mechanism was modeled by assuming low-barrier patches around the main barrier that supports TE at low temperatures and their distribution was expressed by a Gaussian function. In addition, series resistance values were detailed depending on temperature using Cheung's model. C - V analysis was performed to evaluate the distribution of surface states at the interface as a function of frequency. Based on the C - V plots, the effects of charges at these traps were observed especially at low frequencies. Additionally, from these results, Fermi level, surface potential and donor concentration values were evaluated in a wide frequency range.Article Citation Count: 10Electrical characterization of CdZnTe/Si diode structure(Springer Heidelberg, 2020) Güllü, Hasan Hüseyin; Terlemezoglu, M.; Gullu, H. H.; Yildiz, D. E.; Parlak, M.; Department of Electrical & Electronics EngineeringTemperature-dependent current-voltage (I - V), and frequency dependent capacitance-voltage (C - V) and conductance-voltage (G - V) measurements were performed in order to analyze characteristics of CdZnTe/Si structure. Obtained profiles enable us to understand the different characteristics of the diode structure such as the carrier conduction mechanism and the nature of the interfacial layer. Over the temperature range between 220 and 340 K, taking consideration of the disparity in the forward-biased current, the diode parameters such as saturation current (I-0), zero-bias barrier height (Phi(B0)) and ideality factor (n) have been obtained. The barrier height increased (0.53 to 0.80 eV) while the ideality factor decreased (4.63 to 2.79) with increasing temperature from 220 to 340 K, indicating an improvement in the junction characteristics at high temperatures. Due to the inhomogeneity in barrier height, the conduction mechanism was investigated by Gaussian distribution analysis. Hence, the mean zero-bias barrier height ((Phi) over bar (B0)) and zero-bias standard deviation (sigma(0)) were calculated as 1.31 eV and 0.18, respectively. Moreover, for holes in p-type Si, Richardson constant was found to be 32.09 A cm(-2) K-2 via modified Richardson plot. Using the capacitance-voltage (C - V) and conductance-voltage (G - V) characteristics, series resistance (R-s) and density of interfacial traps (D-it) have been also investigated in detail. A decreasing trend for R-s and D-it profiles with increasing frequency was observed due to the impurities at the CdZnTe/Si interface and interfacial layer between the front metal contact and CdZnTe film.Article Citation Count: 62Electrical properties of Al/PCBM:ZnO/p-Si heterojunction for photodiode application(Elsevier Science Sa, 2020) Güllü, Hasan Hüseyin; Yildiz, D. E.; Kocyigit, A.; Yildirim, M.; Department of Electrical & Electronics EngineeringIn this paper, the electrical characteristics of spin-coated PCBM:ZnO interlayered Al/PCBM:ZnO/Si diode are investigated under the aim of photodiode application. Under dark condition, the diode shows about four orders in magnitude rectification rate and diode illumination results in efficient rectification with increase in intensity. The analysis of current-voltage curve results a non-ideal diode characteristics according to the thermionic emission model due to the existence of parasitic resistances and interface states. The measured current-voltage values are used to extract the barrier height and ideality factor under dark and illumination conditions. Under illumination, photo-generated carriers contribute to the current flow and linear photo-conductivity behavior in photo-current measurements with illumination shows the possible use of hybrid PCBM:ZnO layer in Si-based photodiodes. In addition, change in the series and shunt resistance values under illumination is found to be effective in this light-sensing behavior of the diode. This characteristic is also observed from the typical on/off illumination switching behavior for the photodiodes in transient photo-current, photo-capacitance and photo-conductance measurements with the quick response to the illumination. The deviations from ideality are also discussed by means of distribution of interface states and series resistance depending on the applied frequency and bias voltage. (C) 2020 Elsevier B.V. All rights reserved.Article Citation Count: 22Frequency effect on electrical and dielectric characteristics of HfO2-interlayered Si-based Schottky barrier diode(Springer, 2020) Sürücü, Özge; Yildiz, D. E.; Güllü, Hasan Hüseyin; Parlak, M.; Electrical-Electronics Engineering; Department of Electrical & Electronics EngineeringThis study reveals the electrical properties of In/HfO2/n-Si structure with atomic layer-deposited interfacial oxide layer, HfO2 thin film between In top metal contact and monocrystalline Si wafer substrate. From the dark current-voltage measurements, the diode structure showed good rectifying behavior and low saturation current of about two order of magnitude and 1.2 x 10(- 9) A, respectively. According to the conventional thermionic emission model, zero-bias barrier height and ideality factor were calculated from the forward bias current-voltage curve at room temperature under dark conditions as 0.79 eV and 4.22 eV, respectively. In order to get detailed information about density of interface states and series resistance of this structure, capacitance-voltage and conductance-voltage measurements in the frequency range of 10-1000 kHz were performed. As a result, a decreasing capacitance profile with increasing frequency was obtained. In addition, peak-like behavior in the capacitance profiles was observed and these were found to be the indication of density of states. Further analysis was performed on the evaluation of density of interface states values and these values were calculated by using two different methods: Hill-Coleman and high-low frequency capacitance. These profiles were also analyzed by eliminating the effect of series resistance values on the measured capacitance and conductance; then the values of corrected capacitance and conductance as a function of applied voltage were discussed. Based on these analyses on the capacitive characteristics of the diode, dielectric constant, dielectric loss, loss tangent, electrical conductivity, and the real and imaginary part of electric modulus were investigated for complete understanding on the diode characteristics.Article Citation Count: 14Frequency effect on electrical and dielectric characteristics of In/Cu2ZnSnTe4/Si/Ag diode structure(Springer, 2019) Sürücü, Özge; Surucu, O. Bayrakli; Güllü, Hasan Hüseyin; Yildiz, D. E.; Parlak, M.; Electrical-Electronics Engineering; Department of Electrical & Electronics EngineeringIn/Cu2ZnSnTe4/Si/Ag diode structure was fabricated by sputtering Cu2ZnSnTe4 (CZTTe) thin film layer on the Si layer with In front contact. The frequency dependent room temperature capacitance and conductance measurements were carried out to obtain detailed information of its electrical characteristics. Admittance spectra of the diode exhibited strong frequency dependence and the obtained values showed decreasing behavior with the increase in the applied frequency. The effect of interfacial film layer with series resistance values and density of interface states were investigated by taking into consideration of non-ideal electrical characteristics of the diode. The distribution profile of the interface states was extracted by Hill-Coleman and high-low frequency capacitance methods. As a function of frequency, they were in proportionality with the inverse of applied frequency. Dielectric constant and dielectric loss parameters were calculated from the maximum value of the diode capacitance at the strong accumulation region. The loss tangent showed a characteristic peak behavior at each frequency. Based on the time-dependent response of the interfacial charges to the applied ac field, the values of ac electrical conductivity and complex electric modulus were calculated and discussed as a function of frequency and bias voltage.Conference Object Citation Count: 10Investigation of carrier transport mechanisms in the Cu-Zn-Se based hetero-structure grown by sputtering technique(Canadian Science Publishing, 2018) Sürücü, Özge; Terlemezoglu, M.; Güllü, Hasan Hüseyin; Yildiz, D. E.; Parlak, M.; Electrical-Electronics Engineering; Department of Electrical & Electronics EngineeringIn this paper, we present results of the electrical characterization of n-Si/p-Cu-Zn-Se hetero-structure. Sputtered film was found in Se-rich behavior with tetragonal polycrystalline nature along with (112) preferred orientation. The band gap energy for direct optical transitions was obtained as 2.65 eV. The results of the conductivity measurements indicated p-type behavior and carrier transport mechanism was modelled according to thermionic emission theory. Detailed electrical characterization of this structure was carried out with the help of temperature-dependent current-voltage measurements in the temperature range of 220-360 K, room temperature, and frequency-dependent capacitance-voltage and conductance-voltage measurements. The anomaly in current-voltage characteristics was related to barrier height inhomogeneity at the interface and modified by the assumption of Gaussian distribution of barrier height, in which mean barrier height and standard deviation at zero bias were found as 2.11 and 0.24 eV, respectively. Moreover, Richardson constant value was determined as 141.95 Acm(-2)K(-2) by means of modified Richardson plot.Article Citation Count: 11Investigation of electrical characteristics of Ag/ZnO/Si sandwich structure(Springer, 2019) Sürücü, Özge; Surucu, O. Bayrakli; Güllü, Hasan Hüseyin; Yildiz, D. E.; Parlak, M.; Electrical-Electronics Engineering; Department of Electrical & Electronics EngineeringIn this study, temperature-dependent current-voltage (I-V), frequency-dependent capacitance-voltage (C-V) and conductance-voltage (G/omega-V) measurements are carried out for the electrical characterization of a zinc oxide (ZnO) thin film-based diode. The sandwich structure in the form of Ag/ZnO/Si/Al is investigated at temperatures between 220 and 360 K and in the frequency region of 1 kHz-1 MHz. ZnO thin film layer is deposited on a p-Si wafer substrate as a transparent conductive oxide layer by taking into consideration possible electronic applications with intrinsic attractive material properties. At each temperature step, the I-V curves showed about two orders of magnitude rectifying behavior and, according to the Schottky diode relation, the saturation current, zero-bias barrier height and ideality factor were extracted as a function of the temperature. In the case of non-ideal diode characteristics due to the inhomogeneties in the diode as observed from the characteristics of the calculated parameters, effective barrier height values are evaluated. In addition, based on the existence of the interface layer, density of interface states in the band gap region and parasitic resistances were determined by the capacitance measurements.Article Citation Count: 0Performance enhancement of silicon photodiodes through the integration of green synthesized reduced graphene oxide variants(Iop Publishing Ltd, 2024) Sürücü, Özge; Surucu, O.; Balaban, H. Mert; Bilici, I; Yildirim, M.; Electrical-Electronics EngineeringThis study examines the potential of enhancing the optoelectronic properties of silicon photodiodes by producing and analyzing heterostructures that incorporate reduced graphene oxide (rGO) synthesized with silicon using different reduction methods. Graphene oxide (GO) was manufactured utilizing an enhanced Hummers' method. Subsequently, reduced graphene oxides (rGOs) were made by chemical and thermal reduction processes, which are considered ecologically friendly. The use of ascorbic acid to produce ascorbic acid-reduced graphene oxide (ArGO) and thermal processing to produce thermally reduced graphene oxide (TrGO) have significantly contributed to the development of high-performance photodiode technology. The electrical properties were carefully assessed under different levels of light, revealing the substantial impact of integrating reduced graphene oxides (rGOs) on the performance of the diodes. Comparing ArGO/Si, TrGO/Si, and GO/Si heterostructures shows that customized rGO has the potential to greatly influence the responsivity and efficiency of Si-based optoelectronic devices, making a significant contribution to photodiode technology.Article Citation Count: 9A study on electrical properties of Au/4H-SiC Schottky diode under illumination(Springer, 2021) Karadeniz, Seda; Karadeniz, S.; Güllü, Hasan Hüseyin; Department of Basic English (Prep School); Department of Electrical & Electronics EngineeringY In this work, a metal-semiconductor diode in the form of Au/4H-SiC is fabricated, and the electrical properties of this device are systematically examined under dark and different illumination intensities. To perform this, the currentvoltage (I-V) characteristics of the Schottky-type diode are analyzed at room temperature. The performance parameters such as saturation current (I-0), barrier height (Phi(B)), ideality factor (n) and series resistance (R-s) are found to be illumination dependent. The reverse biased I - V characteristics under incident light indicate high photo-sensitivity as compared to the response at forward bias. Thus, this result is investigated in detail according to both Schottky and Poole-Frenkel effects. It is found that the Poole-Frenkel mechanism is dominant in the reverse biased region. The Au/4H-SiC Schottky junction has a strong photo-current response to the different illumination intensities and transient photocurrent characteristics of the fabricated device are studied at the illumination intensities of 50 and 100 mW/cm(2). All experimental results indicate that the Au/4H-SiC Schottky diode, with a valuable response to the illumination together with change in illumination intensity, can be used for optoelectronic applications.Article Citation Count: 28Temperature and frequency effects on electrical and dielectric properties of n-4H SiC based metal-insulator-semiconductor (MIS) diode interlayered with Si3N4 thin film(Springer, 2020) Güllü, Hasan Hüseyin; Yildiz, D. E.; Department of Electrical & Electronics EngineeringEffects of frequency and temperature variations on the electrical properties of Au/Si3N4/n-4H SiC diode were investigated. The diode responses to the change in frequency with applied AC signal of varying frequencies and to the change in temperature controlled by cryogenic control system were discussed with considering possible deviation from ideality and effects of interface states at the junction. Depending on its capacitive and conductive characteristics, internal parasitic resistances were associated with the observed dielectric behaviors of the diode. With the use of Si3N4 layer, the values of complex dielectric constant were extracted and this parameter was found to be in a strong dependence of interface changes in low frequency region whereas this variation was very low at higher frequencies. In addition, there is a slight decrease in the dielectric constant with increasing temperature whereas the values of dielectric loss give a remarkable response to the temperature at forward bias region. Depending on these profiles, AC conductivity values were found in decreasing behavior with both frequency and temperature. From the temperature dependent behaviors, activation energies were calculated from the corresponding Arrhenius plots. Together with the series resistance of the diode and density of interface states, interface polarization was found in a dominant role in both complex dielectric and electric modulus characteristics of the diode.Article Citation Count: 14Temperature dependence of electrical properties in In/Cu2ZnSnTe4/Si/Ag diodes(indian Acad Sciences, 2019) Sürücü, Özge; Yildiz, D. E.; Güllü, Hasan Hüseyin; Terlemezoglu, M.; Parlak, M.; Electrical-Electronics Engineering; Department of Electrical & Electronics EngineeringCu2ZnSnTe4 (CZTTe) thin films with In metal contact were deposited by thermal evaporation on monocrystalline n-type Si wafers with Ag ohmic contact to investigate the device characteristics of an In/CZTTe/Si/Ag diode. The variation in electrical characteristics of the diode was analysed by carrying out current-voltage (I-V) measurements in the temperature range of 220-360 K. The forward bias I-V behaviour was modelled according to the thermionic emission (TE) theory to obtain main diode parameters. In addition, the experimental data were detailed by taking into account the presence of an interfacial layer and possible dominant current transport mechanisms were studied under analysis of ideality factor, n. Strong effects of temperature were observed on zero-bias barrier height (Phi(B0)) and n values due to barrier height inhomogeneity at the interface. The anomaly observed in the analysis of TE was modelled by Gaussian distribution (GD) of barrier heights with 0.844 eV mean barrier height and 0.132 V standard deviation. According to the Tung's theoretical approach, a linear correlation between Phi(B0) and n cannot be satisfied, and thus the modified Richardson plot was used to determine Richardson constant (A*). As a result, A* was calculated approximately as 120.6 A cm(-2) K-2 very close to the theoretical value for n-Si. In addition, the effects of series resistance (R-s) by estimating from Cheng's function and density of surface states (N-ss) by taking the bias dependence of effective barrier height, were discussed.