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Review Citation - WoS: 65Citation - Scopus: 73Micro Tool Design and Fabrication: a Review(Elsevier Sci Ltd, 2018) Oliaei, S. N. B.; Karpat, Y.; Paulo Davim, J.; Perveen, A.Mechanical micromachining is considered as a cost-effective and efficient fabrication technique to produce three dimensional features and free-form surfaces from various engineering materials. Micro cutting tools are an essential part of mechanical micromachining and they are exposed to harsh conditions which reduces tool life and adversely affect the economics of the process. The challenge is therefore to maintain the tool rigidity and cutting edge sharpness for extended period of time. Thus, the design, fabrication and durability of micro cutting tools are of significant importance for successful micromachining operations. This review paper aims to provide a comprehensive understanding about the capabilities, characteristics, and limitations of different fabrication techniques used in the manufacturing of micro cutting tools. State-of-the-art micro cutting tool design and coating technology has been presented for various micromachining applications. Possible future research direction and development in the field of micro tool design and fabrication has also been discussed.Article Citation - WoS: 7Citation - Scopus: 7Design of the Zns/Ge pn Interfaces as Plasmonic, Photovoltaic and Microwave Band Stop Filters(Elsevier Science Bv, 2017) Alharbi, S. R.; Qasrawi, A. F.In the current work, we report and discuss the features of the design of a ZnS (300 nm)/Ge (300 nm)/GaSe (300 nm) thin film device. The device is characterized by the X-ray diffraction, electron microscopy, energy dispersive X-ray spectroscopy (EDS), optical spectroscopy, microwave power spectroscopy and light power dependent photoconductivity. While the X-ray diffraction technique revealed a polycrystalline ZnS coated with two amorphous layers of Ge and GaSe, the hot probe tests revealed the formation of pn interface. The optical spectra which were employed to reveal the conduction and valence band offsets at the ZnS/Ge and Ge/GaSe interface indicated information about the dielectric dispersion at the interface. The dielectric spectra of the ZnS/Ge/GaSe heterojunction which was modeled assuming the domination of surface plasmon interactions through the films revealed a pronounced increase in the drift mobility of free carriers in the three layers compared to the single and double layers. In the scope of the fitting parameters, a wave trap that exhibit filtering properties at notch frequency of 2.30 GHz was designed and tested. The ac signals power spectrum absorption reached similar to 99%. In addition, the photocurrent analysis on the ZnS/Ge/GaSe interface has shown it is suitability for photovoltaic and photosensing applications. (C) 2017 The Authors. Published by Elsevier B.V. This is an open access article under the CC BY-NC-ND licenseArticle Citation - WoS: 3Citation - Scopus: 3Optical Analysis of Ge/Mgo and Ge/Bn Thin Layers Designed for Terahertz Applications(Elsevier Sci Ltd, 2015) Al Garni, S. E.; Qasrawi, A. F.In this work, a 200 nm Ge thin film is used as a substrate to design Ge/MgO and Ge/BN layers. The optical dynamics in these devices are investigated by means of the reflectivity and the transmissivity measurements. Particularly, the details of the dielectric spectra and the values of the energy band gaps (E-g) are investigated. Below 350 THz, the construction of Ge/MgO and Ge/BN interfaces decreased the effective dielectric constant of Ge by 39% and by 76%, respectively. It also increased the quality factor of the Ge optical device from 150 to 1400 and to 940 at 300 THz. All the dispersive optical parameters are also evaluated. In addition, the direct/indirect E-g value of Ge which was determined as 1.15/0.72 eV is observed to shift down by a 0.13/0.42 and by a 023/0.54 eV for the Ge/MgO and Ge/BN devices, respectively. The sharp increase in the dielectric constant with decreasing frequency in the range of 353 273 THz, the dispersive optical parameters and the energy band gap attenuations of the optical structures are promising as they indicate the applicability of the Ge, Ge/MgO and Gel BN layers in terahertz sensing. The latter technology has a wide range of applications like medical and telecommunication devices. (C) 2014 Elsevier Ltd. All rights reserved.Article Citation - WoS: 6Citation - Scopus: 6Al/Cdse Resonant Tunneling Thin Film Transistors(Elsevier Science Bv, 2017) Qasrawi, A. F.; Kayed, T. S.; Elsayed, Khaled A.An Al/CdSe/GaSe/C thin film transistor device was prepared by the physical vapor deposition technique at a vacuum pressure of 10(-5) mbar. The x-ray diffraction measurements demonstrated the polycrystalline nature of the surface of the device. The de current-voltage characteristics recorded for the Al/CdSe/C and Al/CdSe/GaSe/C channels displayed a resonant tunneling diode features during the forward and reverse voltage biasing, respectively. In addition, the switching current ratio of the Al/CdSe/C increased from 18.6 to 9.62x10(3) as a result of the GaSe deposition on the CdSe surface. Moreover, the alternating electrical signal analyses in the frequency range of 1.0 MHz to 1.8 GHz, showed some remarkable properties of negative resistance and negative capacitance spectra of the AVCdSe/GaSe/C thin film transistors. Two distinct resonance-antiresonance phenomena in the resistance spectra and one in the capacitance spectra were observed at 0.53, 1.04 and 1.40 GHz for the Al/CdSe/C channel, respectively. The respective resonating peak positions of the resistance spectra shift to 0.38 and 0.95 GHz when GaSe is interfaced with CdSe. These features of the thin film transistors are promising for use in high quality microwave filtering circuits and also for use as ultrafast switches.Article Citation - WoS: 9Citation - Scopus: 8Dielectric dispersion in InSe/CdS bilayers(Elsevier Science Bv, 2018) Qasrawi, A. F.; Shehada, Sufyan R.In the current study, the effect of the amorphous InSe thin film substrate on the structural, optical and dielectric properties of CdS are investigated. The structural analysis of the bilayers indicated a strained growth of CdS onto InSe leading to decrease in grain size and increase in the dislocation density. The optical measurements have shown that the InSe/CdS exhibits two direct allowed transitions energy band gap values of 2.04 and 1.38 eV, in the high and low absorption regions, respectively. On the other hand, the detailed analysis of the dielectric spectra for the InSe, CdS and InSe/CdS layers has shown that the presence of the InSe substrate significantly improves the optical conduction parameters. Particularly, the Drude-Lorentz modeling for these dielectric systems revealed a drift mobility value of 329 cm(2)/V for the InSe/CdS bilayer. The deposition of the CdS onto InSe is also observed to shift the plasmon frequency of CdS from 2.49 to 0.77 GHz. The general features of the InSe/ CdS as plasmon cavities are promising as it shows its usability for production of optoelectronic devices that exhibit high performance at very high frequencies.Article Citation - WoS: 11Citation - Scopus: 11Optical and Electrical Performance of Yb/Inse Interface(Elsevier Sci Ltd, 2016) Alharbi, S. R.; Qasrawi, A. F.In this study a 300 nm ytterbium transparent thin film is used as substrate to a 300 nm thick InSe thin film. The optical transmittance, reflectance and absorbance of the glass/InSe and Yb/InSe films are measured and analyzed. The optical data allowed determining the effects of the Yb layer on the energy band gap, on the dielectric and on optical conductivity spectra. The band gap of the InSe films shrunk from 2.38/139 to 1.90/1.12 eV upon Yb layer interfacing leading to a band offset of 0.48/0.27 eV. On the other hand, the modeling of the optical conductivity in accordance with the Lorentz theory revealed a free carrier scattering time, carrier density and mobility of 0.225 (fs), 3.0 x 10(19)(cm(-3)) and 2.53 cm(2)/Vs for the Yb/InSe interface, respectively. As these values seem to be promising for employing the Yb/InSe interface in thin film transistor technology, the current voltage characteristics of Yb/InSe/C Schottky diode were recorded and analyzed. The electrical analysis revealed the removal of the tunneling channels by using Yb in place of Al. In addition, the "on/off' current ratios, the Schottky barrier height and the switching voltage of the Yb/InSe/C device are found to be 18.8, 0.76/0.60 eV and 0.53 V, respectively. (C) 2015 Elsevier Ltd. All rights reserved.
