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Article Citation - WoS: 2Citation - Scopus: 2Characterization of the Mgo/Gase0.5< Heterojunction Designed for Visible Light Communications(Elsevier Sci Ltd, 2015) Qasrawi, A. F.; AlGarni, S. E.; Gasanly, N. M.In this study an optoelectronic design is reported and characterized. The device is made of p-type MgO solved in sodium silicate binder and n-type GaSe0.5S0.5 heterojunction. It is described by means of X-ray diffraction, optical absorption and reflection in the incident light wavelength range of 190-1100 nm and by means of dark and 406 nm laser excited current (I)-voltage (V) characteristics. The optical reflectance was also measured as a function of angle of incidence of light in the range of 35-80. The structural analysis revealed no change in the existing phases of the device composers. In addition, it was observed that for pure sodium silicate and for a 67% content of MgO solved in sodium silicate binder (33%), the heterojunction exhibits a valence band shift of 0.40 and 0.70 eV, respectively. The painting of MgO improved the light absorbability significantly. On the other hand, the angle-dependent reflectance measurements on the crystal displayed a Brewster condition at 70. The MgO/ GaSe0.5S0.5 heterojunction exhibited no Brewster condition when irradiated from the MgO side. Moreover, for the crystal and the MgO/ GaSe0.5S0.5 heterojunction, the dielectric spectral analysis revealed a pronounced increase in the quality factor of the device. The I-V characteristics of the device revealed typical optoelectronic properties with high photo-response that could amplify the dark current 24 times when irradiated with 5 mW power laser light. The structural, optical, dielectric and electrical features of the MgO/GaSe0.5S0.5 heterojunction nominate it for use in visible light communication technology. (C) 2015 Elsevier Ltd. All rights reserved.Article Citation - WoS: 3Citation - Scopus: 3Optical Analysis of Ge/Mgo and Ge/Bn Thin Layers Designed for Terahertz Applications(Elsevier Sci Ltd, 2015) Al Garni, S. E.; Qasrawi, A. F.In this work, a 200 nm Ge thin film is used as a substrate to design Ge/MgO and Ge/BN layers. The optical dynamics in these devices are investigated by means of the reflectivity and the transmissivity measurements. Particularly, the details of the dielectric spectra and the values of the energy band gaps (E-g) are investigated. Below 350 THz, the construction of Ge/MgO and Ge/BN interfaces decreased the effective dielectric constant of Ge by 39% and by 76%, respectively. It also increased the quality factor of the Ge optical device from 150 to 1400 and to 940 at 300 THz. All the dispersive optical parameters are also evaluated. In addition, the direct/indirect E-g value of Ge which was determined as 1.15/0.72 eV is observed to shift down by a 0.13/0.42 and by a 023/0.54 eV for the Ge/MgO and Ge/BN devices, respectively. The sharp increase in the dielectric constant with decreasing frequency in the range of 353 273 THz, the dispersive optical parameters and the energy band gap attenuations of the optical structures are promising as they indicate the applicability of the Ge, Ge/MgO and Gel BN layers in terahertz sensing. The latter technology has a wide range of applications like medical and telecommunication devices. (C) 2014 Elsevier Ltd. All rights reserved.Article Citation - WoS: 11Citation - Scopus: 11Optical and Electrical Performance of Yb/Inse Interface(Elsevier Sci Ltd, 2016) Alharbi, S. R.; Qasrawi, A. F.In this study a 300 nm ytterbium transparent thin film is used as substrate to a 300 nm thick InSe thin film. The optical transmittance, reflectance and absorbance of the glass/InSe and Yb/InSe films are measured and analyzed. The optical data allowed determining the effects of the Yb layer on the energy band gap, on the dielectric and on optical conductivity spectra. The band gap of the InSe films shrunk from 2.38/139 to 1.90/1.12 eV upon Yb layer interfacing leading to a band offset of 0.48/0.27 eV. On the other hand, the modeling of the optical conductivity in accordance with the Lorentz theory revealed a free carrier scattering time, carrier density and mobility of 0.225 (fs), 3.0 x 10(19)(cm(-3)) and 2.53 cm(2)/Vs for the Yb/InSe interface, respectively. As these values seem to be promising for employing the Yb/InSe interface in thin film transistor technology, the current voltage characteristics of Yb/InSe/C Schottky diode were recorded and analyzed. The electrical analysis revealed the removal of the tunneling channels by using Yb in place of Al. In addition, the "on/off' current ratios, the Schottky barrier height and the switching voltage of the Yb/InSe/C device are found to be 18.8, 0.76/0.60 eV and 0.53 V, respectively. (C) 2015 Elsevier Ltd. All rights reserved.
