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Article Citation - WoS: 7Citation - Scopus: 7Plasmon-Electron Dynamics at the Au/Inse and Y/Inse Interfaces Designed as Dual Gigahertz-Terahertz Filters(Elsevier Gmbh, Urban & Fischer verlag, 2017) Alharbi, S. R.; Qasrawi, A. F.In this work, the X-ray diffraction, the Scanning electron microscopy, the energy dispersive X-ray, the Raman, The UV-vis light and the impedance spectral techniques are employed to explore the structural, vibrational, optical and electrical properties of the Au/InSe and Y/InSe thin film interfaces. It was shown that with its amorphous nature of crystallization, the InSe thin films exhibited n-type conductivity due to the 3% excess selenium. For this form of InSe, the only active Raman spectral line is 121 (cm(-1)). In addition to the design of the energy band diagram, the analysis the dielectric spectra and the optical conductivities were possible in the frequency range of 270-1000 THz. The modeling of the optical conductivities of the Au, Y, Au/InSe and Y/InSe with the help of Lorentz approach for optical conduction, assured that the conduction is dominated by the resonant plasmon-electron interactions at the metals and metals/semiconductors interfaces. It also allowed tabulating the necessary parameters for possible applications in terahertz technology: These parameters are the electron effective masses, the free electron densities, the electron bounded plasmon frequencies, the electron scattering times, the reduced resonant frequencies and the drift mobilities. On the other hand, the impedance spectral analysis of the Y/InSe/Au interfaces in the frequency range of 0.01-1.80 GHz, revealed negative capacitance effect associated with band filter features that exhibit maximum transition line at 1.17 GHz. This value nominates the interface as a member of filter classes in the gigahertz technology. (C) 2017 Elsevier GmbH. All rights reserved.Article Citation - WoS: 9Citation - Scopus: 10Growth and Characterization of Inse/Ge Interfaces(Elsevier Gmbh, Urban & Fischer verlag, 2017) Al Garni, S. E.; Omareye, Olfat A.; Qasrawi, A. F.In the current study, we report the effect of insertion of a 200 nm thick Ge film between two layers of InSe. The Ge sandwiched InSe films are studied by means of X-ray diffraction technique, energy dispersion X-ray spectroscopy attached to a scanning electron microscope, optical spectrophotometry and light power dependent photoconductivity. It was observed that, The InSe prefers the growth of InSe monophase when deposited onto glass and the growth of gamma-In2Se3 when deposited onto InSe/Ge substrate. The three layers interface (InSe/Ge/gamma-In2Se3) exhibits a Ge induced crystallization process at annealing temperature of 200 degrees C. The optical analysis has shown that the InSe films exhibit a redshift upon Ge sandwiching. In addition, the conduction and valence bands offsets at the first interface (InSe/Ge) and at the second (Ge/gamma-In2Se3) interface are found to be 0.55 eV and 1.0 eV, and 0.40eVand 1.38 eV, respectively. Moreover, the photocurrent of the Ge sandwiched InSe exhibited higher photocurrent values as compared to those of InSe. On the other hand, the dielectric spectral analysis and modeling which lead to the identifying of the optical conduction parameters presented by the plasmon frequency, electron scattering time, free electron density and drift mobility have shown that the Ge sandwiching increased the drift mobility values from 10 cm(2)/Vs to 42 cm(2)/Vs. The main plasmon frequency also increased from 1.08 to 1.68 GHz. (C) 2017 Elsevier GmbH. All rights reserved.
