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Article Citation - WoS: 28Citation - Scopus: 10Electrical Conductivity and Hall Mobility in P-Type Tlgase2 Crystals(Pergamon-elsevier Science Ltd, 2004) Qasrawi, AF; Qasrawı, Atef Fayez Hasan; Gasanly, NM; Qasrawı, Atef Fayez Hasan; Department of Electrical & Electronics Engineering; Department of Electrical & Electronics EngineeringSystematic dark electrical conductivity and Hall mobility measurements have been carried out in the temperature range of 200-350 K on p-type TlGaSe2 crystals. The analysis of the temperature-dependent electrical conductivity and carrier concentration reveals the extrinsic type of conduction with an acceptor impurity level located at 0.33 eV, and donor and acceptor concentrations of 9.0 x 10(15) and 1.3 x 10(16) cm(-3), respectively. A hole and electron effective masses of 0.520m(0) and 0.325m(0), respectively, with a donor to acceptor compensating ratio of 0.69 are also being identified. The Hall mobility is found to be limited by the hole-phonon short-range interactions scattering with a hole-phonon coupling constant of 0.17. (C) 2004 Elsevier Ltd. All rights reserved.Article Citation - WoS: 2Citation - Scopus: 2Performance of Ge-Sandwiched Gase Layers(Springer, 2018) Qasrawi, A. F.; Qasrawı, Atef Fayez Hasan; Abdallah, Maisam M. A.; Qasrawı, Atef Fayez Hasan; Department of Electrical & Electronics Engineering; Department of Electrical & Electronics EngineeringIn the current work, we report the effect of sandwiching Ge between two stacked layers of GaSe. The GaSe and Ge-sandwiched GaSe were subjected to x-ray diffraction, optical spectrophotometry and impedance spectroscopy measurement and analysis. The presence of a Ge layer between two layers of GaSe was observed to cause uniform deformation and increase the absorption of light by GaSe. The response of the dielectric constant to incident light was also significantly enhanced by Ge sandwiching. In addition, Drude-Lorentz modeling of the imaginary part of the dielectric constant revealed that the layer of Ge layer between GaSe layers increased the drift mobility from 30.76 cm(2)/Vs to 52.49 cm(2)/Vs. It also enhanced the plasmon frequency without altering the free carrier density. Moreover, Ge improved the band filtering features of GaSe. In particular, it enhanced the sensitivity of the impedance response to the incident signal and increased the return loss factor of GaSe when it was used as a high band pass filter.Article Citation - WoS: 9Citation - Scopus: 9Yb/Inse Straddling-Type Tunneling Devices Designed as Photosensors, Mos Capacitors, and Gigahertz Bandstop Filters(Ieee-inst Electrical Electronics Engineers inc, 2021) Alfhaid, Latifah Hamad Khalid; Qasrawı, Atef Fayez Hasan; Qasrawi, A. F.; AlGarni, Sabah E.; Qasrawı, Atef Fayez Hasan; Department of Electrical & Electronics Engineering; Department of Electrical & Electronics EngineeringIn this work, amorphous InSe thin films coated with 30-160-nm-thick SiO2 are used as an active material to fabricate multifunctional devices. The n-InSe/p-SiO2 layers that are deposited onto ytterbium substrates are optically and electrically characterized. It was observed that the coating of SiO2 nanosheets onto the surface of InSe enhances the light absorbability in the near-infrared range without remarkable altering of the bandgap. Significant increase in the steady-state photocurrent values accompanied by faster photocurrent responses resulted from the coating of SiO2 nanosheets. Electrically, while the Yb/InSe/Au channels display tunneling Schottky barrier characteristics, the Yb/InSe/SiO2/Au channels show pn junction features. Both channels displayed metal-oxide-semiconductors (MOS) capacitance-voltage characteristics. In addition, the analyses of the current-voltage characteristics have shown that the currents in the Yb/InSe/Au and Yb/InSe/SiO2 (30 nm)/Au channel are dominated by electric field-assisted thermionic emission (tunneling) of charge carriers through barriers of widths of 18/14 and 30/16 nm under reverse-/forward-biasing conditions, respectively. Further increase in the oxide layer thickness lowered the barrier height of the devices. On the other hand, when an ac signal of low amplitude is imposed through the device channels, the conductance, capacitance, and reflection coefficient spectra displayed bandstop filter characteristics near 1.6 GHz. The microwave cutoff frequency spectra show a remarkable increase in the cutoff frequency values as a result of the coating of InSe with SiO2 nanosheets. The features of the device assure its applicability as rectifying diodes, fast photosensors, MOS capacitors, and microwave bandstop filters.Article Citation - WoS: 5Citation - Scopus: 4Properties of Se/Inse Thin-Film Interface(Springer, 2016) Qasrawi, A. F.; Qasrawı, Atef Fayez Hasan; Kayed, T. S.; Elsayed, Khaled A.; Kayed, Tarek Said; Qasrawı, Atef Fayez Hasan; Kayed, Tarek Said; Department of Electrical & Electronics Engineering; Department of Electrical & Electronics EngineeringSe, InSe, and Se/InSe thin films have been prepared by the physical vapor deposition technique at pressure of similar to 10(-5) torr. The structural, optical, and electrical properties of the films and Se/InSe interface were investigated by means of x-ray diffraction (XRD) analysis, ultraviolet-visible spectroscopy, and current-voltage (I-V) characteristics. XRD analysis indicated that the prepared InSe films were amorphous while the Se films were polycrystalline having hexagonal structure with unit cell parameters of a = 4.3544 and c = 4.9494 . Spectral reflectance and transmittance analysis showed that both Se and InSe films exhibited indirect allowed transitions with energy bandgaps of 1.92 eV and 1.34 eV, respectively. The Se/InSe interface exhibited two energy bandgaps of 0.98 eV and 1.73 eV above and below 2.2 eV, respectively. Dielectric constant values were also calculated from reflectance spectra for the three layers in the frequency range of 500 THz to 272 THz. The dielectric constant exhibited a promising feature suggesting use of the Se/InSe interface as an optical resonator. Moreover, the Au/Se/InSe/Ag heterojunction showed some rectifying properties that could be used in standard optoelectronic devices. The ideality factor and height of the energy barrier to charge carrier motion in this device were found to be 1.72 and 0.66 eV, respectively.
