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Author: Gullu, H. H.WoS Q: Q1

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    Article
    Citation - WoS: 77
    Citation - Scopus: 78
    Electrical Properties of Al/Pcbm:zno Heterojunction for Photodiode Application
    (Elsevier Science Sa, 2020) Gullu, H. H.; Yildiz, D. E.; Kocyigit, A.; Yildirim, M.
    In this paper, the electrical characteristics of spin-coated PCBM:ZnO interlayered Al/PCBM:ZnO/Si diode are investigated under the aim of photodiode application. Under dark condition, the diode shows about four orders in magnitude rectification rate and diode illumination results in efficient rectification with increase in intensity. The analysis of current-voltage curve results a non-ideal diode characteristics according to the thermionic emission model due to the existence of parasitic resistances and interface states. The measured current-voltage values are used to extract the barrier height and ideality factor under dark and illumination conditions. Under illumination, photo-generated carriers contribute to the current flow and linear photo-conductivity behavior in photo-current measurements with illumination shows the possible use of hybrid PCBM:ZnO layer in Si-based photodiodes. In addition, change in the series and shunt resistance values under illumination is found to be effective in this light-sensing behavior of the diode. This characteristic is also observed from the typical on/off illumination switching behavior for the photodiodes in transient photo-current, photo-capacitance and photo-conductance measurements with the quick response to the illumination. The deviations from ideality are also discussed by means of distribution of interface states and series resistance depending on the applied frequency and bias voltage. (C) 2020 Elsevier B.V. All rights reserved.
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    Article
    Citation - WoS: 7
    Citation - Scopus: 8
    Effect of Tio2 Thin Film With Different Dopants in Bringing Au-Metal Into a Contact With N-Si
    (Springer, 2022) Yildiz, D. E.; Gullu, H. H.; Cavus, H. Kanbur
    In this work, effects of TiO2 contribution together with two different doping as graphene oxide (GO) and rubidium fluoride (RbF) are investigated at the interface of Au/n-Si metal-semiconductor (MS) diode. Diode characteristics are mainly evaluated from current-voltage measurements and values of barrier height and ideality factor are compared to the diodes with and without doping in interface layer. Although existence of interface layer increases these values, there is a decrease with adapting GO and RbF to the TiO2 structure. In addition, series and shunt resistance values are calculated with interface layer, and resistance effect is also discussed by Norde's and Cheung's functions. Forward biased carrier transport mechanism is evaluated under the presence of interface states by thermionic emission model and density of interface trap states is also discussed. At the reverse biased region, field effected thermionic emission model is found to be dominant flow mechanism, and leakage current behavior is explained by Schottky effect. Solar simulator with different illumination intensities is used to investigate photo-generated carrier contribution and photo-response of the diodes.