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Article Citation - WoS: 3Citation - Scopus: 4Effects of Ge Substrate on the Structural and Optical Conductivity Parameters of Bi2o3< Thin Films(Elsevier Gmbh, 2019) Alharbi, S. R.; Qasrawi, A. F.In this article the structural, optical and dielectric properties of a 200 nm thick Bi2O3 thin films which are deposited onto amorphous germanium substrate are reported. Both of the Ge and Bi2O3 thin films are prepared by the thermal evaporation technique under vacuum pressure of 10 s mbar. Bi2O3 thin films are found to prefer the monoclinic nature of structure with larger values of microstrain, dislocation density, stacking faults and smaller grain sizes upon replacement of the glass substrate by germanium. Optically, significant redshift in the energy band gap is observed when the films are grown onto Ge. The Ge/Bi2O3 heterojunctions exhibit a conduction and valence band offsets of value of 0.81 and 1.38 eV, respectively. In addition to the enhancement in the dielectric constant near the IR region, the Drude-Lorentz modeling of the Ge/Bi2O3 heterojunctions has shown remarkable effect of the Ge substrate on the optical conductivity parameters of Bi2O3. Particularly, the drift mobility increased by about one order of magnitude, the free hole density decreased by (similar to)24 times and the plasmon frequency ranges extended from 5.21 to 11.0 GHz to 2.59-12.80 GHz when germanium substrate is used. The optical features of the heterojunction nominate it for visible light communication technology.Article Citation - WoS: 15Citation - Scopus: 17Dielectric Dispersion in Ga2s3< Thin Films(Springer, 2017) Alharbi, S. R.; Qasrawi, A. F.In this work, the structural, compositional, optical, and dielectric properties of Ga2S3 thin films are investigated by means of X-ray diffraction, scanning electron microscopy, energy dispersion X-ray analysis, and ultraviolet-visible light spectrophotometry. The Ga2S3 thin films which exhibited amorphous nature in its as grown form are observed to be generally composed of 40.7 % Ga and 59.3 % S atomic content. The direct allowed transitions optical energy bandgap is found to be 2.96 eV. On the other hand, the modeling of the dielectric spectra in the frequency range of 270-1,000 THz, using the modified Drude-Lorentz model for electron-plasmon interactions revealed the electrons scattering time as 1.8 (fs), the electron bounded plasma frequency as similar to 0.76-0.94 (GHz) and the reduced resonant frequency as 2.20-4.60 x10(15) (Hz) in the range of 270-753 THz. The corresponding drift mobility of electrons to the terahertz oscillating incident electric field is found to be 7.91 (cm (2)/Vs). The values are promising as they nominate the Ga2S3 thin films as effective candidates in thin-film transistor and gas sensing technologies.Article Citation - WoS: 9Citation - Scopus: 9Effect of Ytterbium, Gold and Aluminum Transparent Metallic Substrates on the Performance of the Ga2s3< Thin Film Devices(Elsevier Science Bv, 2017) Alharbi, S. R.; Qasrawi, A. F.In the current work, the structural, optical, dielectric and electrical properties of the Ga2S3 thin films which are deposited onto transparent thin Al, Yb and Au metal substrates are characterized by means of transmittance electron microscopy, X-ray diffraction, ultraviolet visible light spectroscopy and impedance spectroscopy techniques. The effects of the metallic substrates on the crystalline nature, energy band gap and dielectric spectra are also investigated. The modeling of the dielectric spectra allowed determining the effect of the Al, Yb and Au thin layers on the electron scattering time, the plasmon frequency, free electron density and drift mobility. In addition, a Yb/Ga2S3/Au Schottky barrier and All Ga2S3/Au back to back Schottky barrier devices (metal-semiconductor-metal (MSM) device) are fabricated and characterized by means of capacitance-voltage characteristics and capacitance and conductance spectra in the frequency range of 10-1800 MHz. While the Schottky barrier device displayed three distinct positions of resonance-antiresonance phenomena, the MSM device displayed one peak with narrow bandwidth of 10 MHz. The MSM devices exhibited an inversion, depletion and accumulation modes within a voltage range of 0.25 V width at 250 MHz. The study indicates the applicability of these device as smart capacitive switches, as Plasmon devices and as wavetraps. (C) 2017 Elsevier B.V. All rights reserved.Article Citation - WoS: 5Citation - Scopus: 4Thickness and Annealing Effects on the Structural and Optical Conductivity Parameters of Zinc Phthalocyanine Thin Films(inst Materials Physics, 2020) Alharbi, S. R.; Qasrawi, A. F.; Khusayfan, N. M.; Department of Electrical & Electronics EngineeringIn this work, the effects of the thin film thicknesses on the structural, optical absorption, energy band gap, dielectric spectra and optical conductivity parameters of the Zinc phthalocyanine thin films are considered. Thin films of ZnPc of thicknesses of 50-600 nm which are coated onto glass substrates are observed to exhibit amorphous nature of growth. The polycrystalline monoclinic ZnPc phase of the films is obtained via annealing the films at 200 degrees C in a vacuum atmosphere. Increasing the ZnPc films thickness shrunk the energy band gap in the B- and Q- bands and decreased both of the optical conductivities and free holes density in the Q-band. The increase in the film thickness is also observed to decrease the plasmon frequency and the drift mobility of holes in the films. The highest dielectric constant is obtained for films of thicknesses of 100 nm. The annealing process enhanced the optical absorption, redshifts the energy band gap value and the critical energy of the absolute maxima of dielectric constant. In addition, while the heat treatment enhanced both of the scattering times at femtosecond level and the drift mobility, it reduced the free holes density, and the plasmon frequency.Article Citation - WoS: 18Citation - Scopus: 21Engineering the Optical and Dielectric Properties of the Ga2s3< Nanosandwiches Via Indium Layer Thickness(Springer, 2018) Nazzal, Eman O.; Qasrawi, A. F.; Alharbi, S. R.In this study, the effect of the nanosandwiched indium slab thickness (20-200 nm) on the performance of the Ga2S3/In/Ga2S3 interfaces is explored by means of X-ray diffraction, Raman spectroscopy, and optical spectroscopy techniques. The indium slab thickness which was varied in the range of 20-200 nm is observed to enhance the visible light absorbability of the Ga2S3 by 54.6 times, engineered the energy band gap in the range of 3.7-1.4 eV and increases the dielectric constant without, significantly, altering the structure of the Ga2S3. The broad range of the band gap tunability and the increased absorbability nominate the Ga2S3 thin films for photovoltaic applications. In addition, the dielectric spectral analysis and modeling have shown that a wide variety in the plasmon resonant frequency could be established within the Ga2S3/In/Ga2S3 trilayers. The plasmon frequency engineering in the range of 0.56-2.08 GHz which is associated with drift mobility of 12.58-5.76 cm(2)/Vs and electron scattering time at femtosecond level are promising for the production of broad band high frequency microwave filters.
