Engineering the Optical and Dielectric Properties of the Ga<sub>2</sub>S<sub>3</sub>/In/Ga<sub>2</sub>S<sub>3</sub> Nanosandwiches via Indium Layer Thickness

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Date

2018

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Publisher

Springer

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Organizational Unit
Department of Electrical & Electronics Engineering
Department of Electrical and Electronics Engineering (EE) offers solid graduate education and research program. Our Department is known for its student-centered and practice-oriented education. We are devoted to provide an exceptional educational experience to our students and prepare them for the highest personal and professional accomplishments. The advanced teaching and research laboratories are designed to educate the future workforce and meet the challenges of current technologies. The faculty's research activities are high voltage, electrical machinery, power systems, signal and image processing and photonics. Our students have exciting opportunities to participate in our department's research projects as well as in various activities sponsored by TUBİTAK, and other professional societies. European Remote Radio Laboratory project, which provides internet-access to our laboratories, has been accomplished under the leadership of our department with contributions from several European institutions.

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Abstract

In this study, the effect of the nanosandwiched indium slab thickness (20-200 nm) on the performance of the Ga2S3/In/Ga2S3 interfaces is explored by means of X-ray diffraction, Raman spectroscopy, and optical spectroscopy techniques. The indium slab thickness which was varied in the range of 20-200 nm is observed to enhance the visible light absorbability of the Ga2S3 by 54.6 times, engineered the energy band gap in the range of 3.7-1.4 eV and increases the dielectric constant without, significantly, altering the structure of the Ga2S3. The broad range of the band gap tunability and the increased absorbability nominate the Ga2S3 thin films for photovoltaic applications. In addition, the dielectric spectral analysis and modeling have shown that a wide variety in the plasmon resonant frequency could be established within the Ga2S3/In/Ga2S3 trilayers. The plasmon frequency engineering in the range of 0.56-2.08 GHz which is associated with drift mobility of 12.58-5.76 cm(2)/Vs and electron scattering time at femtosecond level are promising for the production of broad band high frequency microwave filters.

Description

Qasrawi, Atef Fayez/0000-0001-8193-6975

Keywords

Gallium sulfide, Optical materials, Coating, Dielectric properties, Plasmon

Turkish CoHE Thesis Center URL

Citation

14

WoS Q

Q3

Scopus Q

Q2

Source

Volume

13

Issue

3

Start Page

1049

End Page

1056

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