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Article Citation - WoS: 2Citation - Scopus: 3Electrical Characterization of Zninse2 Thin-Film Heterojunction(Springer, 2019) Gullu, H. H.; Parlak, M.ZnInSe2/Cu0.5Ag0.5InSe2 diode structures have been fabricated by thermal evaporation of stacked layers on indium tin oxide-coated glass substrates. Temperature-dependent dark current-voltage measurements were carried out to extract the diode parameters and to determine the dominant conduction mechanisms in the forward- and reverse-bias regions. The heterostructure showed three order of magnitude rectifying behavior with a barrier height of 0.72 eV and ideality factor of 2.16 at room temperature. In the high forward-bias region, the series and shunt resistances were calculated with the help of parasitic resistance relations, yielding room-temperature values of 9.54 x 10(2) Omega cm(2) and 1.23 x 10(3) Omega cm(2), respectively. According to the analysis of the current flow in the forward-bias region, abnormal thermionic emission due to the variation of the ideality factor with temperature and space-charge-limited current processes were determined to be the dominant conduction mechanisms in this heterostructure. In the reverse-bias region, the tunneling mechanism was found to be effective in the leakage current flow with trap density of 10(6) cm(-3). Spectral photocurrent measurements were carried out to investigate the spectral working range of the device structure. The main photocurrent peaks observed in the spectrum corresponded to the band-edge values of the active thin-film layers.Article Citation - WoS: 4Citation - Scopus: 4Physical Characterization of Thermally Evaporated Sn-Sb Thin Films for Solar Cell Applications(Springer Heidelberg, 2023) Bektas, Tunc; Surucu, Ozge; Terlemezoglu, Makbule; Parlak, MehmetThe substitution of Sb in binary SnSe structure may lead to tailoring the physical properties of both SnSe and SbSe, promising absorber layers for thin film solar cells. The resulting Sn-Sb-Se structure could be an outstanding material for photovoltaic applications. In this study, Sn-Sb-Se thin films were deposited by thermal evaporation, and the effect of annealing on the films' structural, optical, and electrical properties were reported. XRD measurement shows that annealing at 300 degrees C yields the best crystalline quality, and structural parameters were calculated using XRD data. SEM and AFM measurements indicate deformation in the film surface after annealing at 400 degrees C. UV-Vis spectroscopy measurement provides a high absorption coefficient which indicates a direct band gap. The band gap and activation energies of the as-grown sample were found as 1.59 eV and 106.1 meV, respectively. The results of SEM, AFM, XRD, Raman, UV-Vis spectroscopy and temperature-dependent photoconductivity measurements were discussed throughout the paper.Article Citation - WoS: 10Citation - Scopus: 10Electrical Characterization of Cdznte/Si Diode Structure(Springer Heidelberg, 2020) Balbasi, C. Dogru; Terlemezoglu, M.; Gullu, H. H.; Yildiz, D. E.; Parlak, M.Temperature-dependent current-voltage (I - V), and frequency dependent capacitance-voltage (C - V) and conductance-voltage (G - V) measurements were performed in order to analyze characteristics of CdZnTe/Si structure. Obtained profiles enable us to understand the different characteristics of the diode structure such as the carrier conduction mechanism and the nature of the interfacial layer. Over the temperature range between 220 and 340 K, taking consideration of the disparity in the forward-biased current, the diode parameters such as saturation current (I-0), zero-bias barrier height (Phi(B0)) and ideality factor (n) have been obtained. The barrier height increased (0.53 to 0.80 eV) while the ideality factor decreased (4.63 to 2.79) with increasing temperature from 220 to 340 K, indicating an improvement in the junction characteristics at high temperatures. Due to the inhomogeneity in barrier height, the conduction mechanism was investigated by Gaussian distribution analysis. Hence, the mean zero-bias barrier height ((Phi) over bar (B0)) and zero-bias standard deviation (sigma(0)) were calculated as 1.31 eV and 0.18, respectively. Moreover, for holes in p-type Si, Richardson constant was found to be 32.09 A cm(-2) K-2 via modified Richardson plot. Using the capacitance-voltage (C - V) and conductance-voltage (G - V) characteristics, series resistance (R-s) and density of interfacial traps (D-it) have been also investigated in detail. A decreasing trend for R-s and D-it profiles with increasing frequency was observed due to the impurities at the CdZnTe/Si interface and interfacial layer between the front metal contact and CdZnTe film.Article Citation - WoS: 45Citation - Scopus: 41Temperature-Dependent Optical Characteristics of Sputtered Nio Thin Films(Springer Heidelberg, 2022) Terlemezoglu, M.; Surucu, O.; Isik, M.; Gasanly, N. M.; Parlak, M.In this work, nickel oxide thin films were deposited by radio frequency magnetron sputtering technique. X-ray diffraction (XRD), scanning electron microscopy and energy-dispersive X-ray analysis methods were applied to reveal the structural and morphological properties of sputtered thin films. The XRD pattern of films confirmed the presence of the cubic phase of nickel oxide with the preferential orientation of (200) direction. The surface morphology of thin films was observed as almost uniform and smooth. Optical aspects of sputtered film were studied by employing the room temperature Raman and temperature-dependent transmittance spectroscopy techniques in the range of 10-300 K. Tauc relation and derivative spectroscopy techniques were applied to obtain the band gap energy of the films. In addition, the relation between the band gap energy and the temperature was investigated in detail considering the Varshni optical model. The absolute zero band gap energy, rate of change of band gap energy, and Debye temperature were obtained as 3.57 eV, - 2.77 x 10(-4) eV/K and 393 K, respectively.
