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  • Article
    Citation - WoS: 5
    Citation - Scopus: 5
    Acoustic Phonons Scattering Mobility and Carrier Effective Mass in In6s7< Crystals
    (Elsevier Science Sa, 2006) Qasrawi, A. F.; Gasanly, N. M.
    Systematic dark electrical resistivity and Hall coefficient measurements have been carried out in the temperature range of 170-320 K on n-type In6S7 crystals. The analysis of the electrical resistivity and carrier concentration reveals the intrinsic type of conduction with an average energy band gap of similar to 0.75 eV The carrier effective masses of the conduction and valence bands were calculated from the intrinsic temperature-dependent carrier concentration data and were found to be 0.565m(0) and 2.020m(0), respectively. The temperature-dependent Hall mobility was observed to follow the mu alpha T-3/2 law and was analyzed assuming the domination of acoustic phonons scattering. The acoustic phonons scattering mobility was calculated from the crystal's structural data with no assumptions. The experimental Hall mobility data of In6S7 crystals coincides with the theoretical acoustic phonons scattering mobility data with acoustic deformation potential of 6.4 eV. (c) 2006 Elsevier B.V. All rights reserved.
  • Article
    Citation - WoS: 7
    Citation - Scopus: 7
    Photoconductivity Kinetics in Agin5s8< Thin Films
    (Elsevier Science Sa, 2010) Qasrawi, A. F.; Kayed, T. S.; Ercan, Ismail
    The temperature (T) and illumination intensity (F) effects on the photoconductivity of as grown and heat-treated AgIn5S8 thin films has been investigated. At fixed illumination intensity, in the temperature region of 40-300K, the photocurrent (I-ph) of the films was observed to decrease with decreasing temperature. The I-ph of the as grown sample behaved abnormally in the temperature region of 170-180K. At fixed temperature and variable illumination intensity, the photocurrent of the as grown sample exhibited linear, sublinear and supralinear recombination mechanisms at 300 K and in the regions of 160-260K and 25-130 K. respectively. This behavior is attributed to the exchange of role between the linear recombination at the surface near room temperature and trapping centers in the film which become dominant as temperature decreases. Annealing the sample at 350 K for 1 h improved the characteristic curves of I-ph. The abnormality disappeared and the I-ph - T dependence is systematic. The data analysis of which revealed two recombination centers located at 66 and 16 meV. In addition, the sublinear recombination mechanism disappeared and the heat-treated films exhibited supralinear recombination in most of the studied temperature range. (C) 2010 Elsevier B.V. All rights reserved.
  • Article
    Citation - WoS: 28
    Citation - Scopus: 29
    Annealing Effects on the Structural and Optical Properties of Agin5s8< Thin Films
    (Elsevier Science Sa, 2008) Qasrawi, A. F.; Qasrawı, Atef Fayez Hasan; Qasrawı, Atef Fayez Hasan; Department of Electrical & Electronics Engineering; Department of Electrical & Electronics Engineering
    Due to its importance as a perspective material for application in optoelectronic semiconductor devices, the thermal annealing effects on the structural and optical properties of the as-grown vacuum evaporated AgIn5S8 thin films have been investigated. The X-ray data analysis have shown that these films are polycrystalline in nature and exhibit better crystallization with increasing crystallite size and slightly, decreasing unit cell lattice parameter as annealing temperature is raised from 450 to 600 K. The optical energy band gap for the as-grown and thermally annealed films is found to be of direct allowed transitions type. The energy band gap exhibited values of 1.78, 1.74 and 1.62 eV as the samples were annealed at, 450 and 600 K, respectively. This indicates the ability of altering the band gap values of this material by the thermal annealing process. The structural and optical features seem to be suitable for semiconductor device production such as solar cell converters, which has successfully been fabricated by others, metal-insulator-semiconductor (MIS) and metal - oxide - semiconductor (MOS) devices, as well. (c) 2007 Elsevier B.V. All rights reserved.