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Publication Index: WoSSubject: Electrical characterization

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    Article
    Citation - WoS: 4
    Citation - Scopus: 4
    Mixed Conduction and Anisotropic Single Oscillator Parameters in Low Dimensional Tlinse2 Crystals
    (Elsevier Science Sa, 2013) Qasrawi, A. F.; Gasanly, N. M.
    Due to the importance of the TlInSe2 crystal as neutron and gamma-ray detectors, its electrical and dispersive optical parameters have been investigated. Particularly, the anisotropic current conduction mechanism in the temperature region of 100-350 K and the room temperature anisotropic dispersive optical properties were studied by means of electrical conductivity and optical reflectance, respectively. It has been shown that the mixed conduction is the most dominant transport mechanism in the TlInSe2 crystals. Particularly, when the electric field is applied perpendicular to the crystal's c-axis, the main dominant current transport mechanism is due to the mixed conduction and the variable range hopping above and below 160 K, respectively. When the electric field is applied parallel to the crystal's c-axis, the electrical conductivity is dominated by the thermionic emission, mixed conduction and variable range hopping at high, moderate and low temperatures, respectively. The optical reflectivity analysis in the wavelength range 210-1500 nm revealed a clear anisotropy effect on the dispersive optical parameters. Particularly, the static refractive index, static dielectric constant, dispersion energy and oscillator energy exhibited values of 2.50, 6.24, 20.72 eV and 3.96 eV, and values of 3.05, 9.33, 39.27 eV and 4.72 eV for light propagation parallel and perpendicular to the crystal's c-axis, respectively. Moreover, the frequency dependence of the dielectric constant, epsilon(omega), reflected strong dielectric anisotropy that exhibit maximum epsilon(omega) value of 38.80 and 11.40 at frequencies of 11.07 x 10(14) Hz for light propagation parallel and perpendicular to the crystal's c-axis, respectively. The anisotropy in the epsilon(omega) makes the TlInSe2 crystals attractive to be used as nonvolatile static memory devices. (C) 2013 Elsevier B.V. All rights reserved.
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    Article
    Citation - WoS: 19
    Citation - Scopus: 20
    A Study on the Dark and Illuminated Operation of Al/Si3< Schottky Photodiodes: Optoelectronic Insights
    (Springer Heidelberg, 2024) Surucu, Ozge; Yildiz, Dilber Esra; Yildirim, Murat
    This work extensively investigates the operation of an Al/ Si3N4/p-Si Schottky-type photodiode under dark and varying illumination intensities. The photodiode is fabricated by employing the metal-organic chemical vapor deposition (MOCVD) method. A thorough electrical characterization is performed at room temperature, encompassing measurements of current-voltage (I-V), current-time (I-t), capacitance-time (C-t), and conductance time (G-t). The photodiode's rectification factor and reverse bias area increased under illumination. The relationship between light power density, barrier height, and diode ideality factor is found. The study also found a strong correlation between light intensity and applied voltage on series resistance (R-s) and shunt resistance (R-sh). R-s values are calculated using Cheung's functions, revealing the diode's resistance behavior. The study also examines the photodiode's photoconductivity and photoconductance, finding a non-linear relationship between photocurrent and illumination intensity, suggesting bimolecular recombination. Calculated photosensitivity (K), responsivity (R), and detectivity (D*) values show the device's light response effectiveness, but efficiency decreases at higher illumination intensities. Transient experiments indicate stable and reproducible photocurrent characteristics, revealing photogenerated charge temporal evolution. This study provides a complete understanding of the Al/Si3N4/p-Si Schottky photodiode's behavior under different illumination intensities. The findings advance optoelectronic device knowledge and enable their use in advanced technologies.
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    Article
    Citation - WoS: 7
    Citation - Scopus: 8
    Effect of Tio2 Thin Film With Different Dopants in Bringing Au-Metal Into a Contact With N-Si
    (Springer, 2022) Yildiz, D. E.; Gullu, H. H.; Cavus, H. Kanbur
    In this work, effects of TiO2 contribution together with two different doping as graphene oxide (GO) and rubidium fluoride (RbF) are investigated at the interface of Au/n-Si metal-semiconductor (MS) diode. Diode characteristics are mainly evaluated from current-voltage measurements and values of barrier height and ideality factor are compared to the diodes with and without doping in interface layer. Although existence of interface layer increases these values, there is a decrease with adapting GO and RbF to the TiO2 structure. In addition, series and shunt resistance values are calculated with interface layer, and resistance effect is also discussed by Norde's and Cheung's functions. Forward biased carrier transport mechanism is evaluated under the presence of interface states by thermionic emission model and density of interface trap states is also discussed. At the reverse biased region, field effected thermionic emission model is found to be dominant flow mechanism, and leakage current behavior is explained by Schottky effect. Solar simulator with different illumination intensities is used to investigate photo-generated carrier contribution and photo-response of the diodes.