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Article Citation - WoS: 4Citation - Scopus: 4Optical Characterization of the Mgo/Inse Interface(Wiley-v C H verlag Gmbh, 2015) Kayed, T. S.; Qasrawi, A. F.; Elsayed, Khaled A.In this work, a 500nm thick MgO layer deposited on the physically evaporated amorphous InSe thin film substrate is designed as a window for the MgO/InSe terahertz resonators. The optical properties including the reflectance and the dielectric constant dependence on the angle of incidence ((i)), the normal transmittance, and the absorption coefficient of the interface were investigated in the range of approximate to 270-1000THz. It was observed that the total reflectivity of the substrate continuously decreases with increasing (i) in the range of 33-80 degrees. The spectra of InSe and MgO/InSe revealed strong dielectric resonance patterns below 450THz. The energy bands of the direct allowed transitions in InSe film shrunk from 3.90, 2.75, and 1.49eV to 3.71, 2.10, and 0.96eV when MgO was deposited onto the InSe film. By analyzing the dielectric spectra, we were able to determine the static and lattice dielectric constants in addition to the oscillator and dispersion energies. The latter energy increased from 27.43 to 35.84 via interface construction.Article Citation - WoS: 18Citation - Scopus: 18Heat Treatment Effects on the Structural and Electrical Properties of Thermally Deposited Agin5s8< Thin Films(Pergamon-elsevier Science Ltd, 2011) Qasrawi, A. F.; Kayed, T. S.; Ercan, FilizThe heat treatment effects on structural and electrical properties of thermally deposited AgIn5S8 thin films have been investigated. By increasing the annealing temperature of the sample from 450 to 500 K, we observed a change in the crystallization direction from (420) to (311). Further annealing of the AgIn5S8 films at 550, 600 and 650 K resulted in larger grain size in the (311) preferred direction. The room temperature electrical resistivity, Hall coefficient and Hall mobility were significantly influenced by higher annealing temperatures. Three impurity levels at 230, 150, and 78 meV were detected for samples annealed at 350 K. The electrical resistivity decreased by four orders of magnitude when the sample annealing temperature was raised from 350 to 450 K. The temperature dependent electrical resistivity and carrier concentration of the thin film samples were studied in the temperature ranges of 25-300 K and 140-300 K, respectively. A degenerate-nondegenerate semiconductor transition at approximately 180 was observed for samples annealed at 450 and 500 K. Similar type of transition was observed at 240 K for samples annealed at 600 and 650 K. (C) 2011 Elsevier Ltd. All rights reserved.
