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Article Citation - WoS: 11Citation - Scopus: 13Optical and Structural Characteristics of Electrodeposited Cd1-xznx< Nanostructured Thin Films(Elsevier, 2021) Erturk, K.; Isik, M.; Terlemezoglu, M.; Gasanly, N. M.The structural and optical characteristics of Cd1-xZnxS (CdZnS) thin films grown by the electrodeposition method were investigated in the present paper. The crystalline structure of the grown CdZnS thin film was determined as cubic wurtzite due to observed diffraction peaks associated with (111) and (220) planes. Atomic compositional ratios of the constituent elements were obtained using energy dispersive spectroscopy and doping concentration of the Zn was found as 5% (x similar to 0.05). Scanning electron microscopy image of the studied thin film indicated that grown film is nanostructured. Raman spectra of CdS and CdZnS thin films were measured and it was seen that observed longitudinal optical modes for CdZnS present a blue-shift. Temperature-dependent band gap energy characteristics of the thin films were studied performing transmission experiments in the 10-300 K temperature range. The analyses of the recorded transmittance spectra showed that direct band gap energy of the films decreases from 2.56 eV (10 K) to 2.51 eV (300 K) with the increase of temperature. The band gap energy vs. temperature dependency was studied applying well-known Varshni optical model and various optical parameters of the films were reported according to the results of the applied model.Article Citation - WoS: 11Citation - Scopus: 13Low Temperature Crystallization of Amorphous Silicon by Gold Nanoparticle(Elsevier, 2013) Karaman, M.; Aydin, M.; Sedani, S. H.; Erturk, K.; Turan, R.Single crystalline Si thin film fabricated on glass substrate by a process called Solid Phase Crystallization (SPC) is highly desirable for the development of high efficiency and low cost thin film solar cells. However, the use of ordinary soda lime glass requires process temperatures higher than 600 degrees C. Crystallization of Si film at around this temperature takes place in extremely long time exceeding 20 h in most cases. In order to reduce this long process time, new crystallization techniques such as Metal Induced Crystallization (MIC) using thin metal films as a catalyst layer is attracting much attention. Instead of using continuous metal films, the use of metal nanoparticles offers some advantages. In this work, gold thin films were deposited on aluminum doped zinc oxide (AZO) coated glass and then annealed for nanoparticle formation. Amorphous silicon was then deposited by e-beam evaporation onto metal nanoparticles. Silicon films were annealed for crystallization at different temperatures between 500 degrees C and 600 degrees C. We showed that the crystallization occurs at lower temperatures and with higher rates with the inclusion of gold nanoparticles (AuNP). Raman and XRD results indicate that the crystallization starts at temperatures as low as 500 degrees C and an annealing at 600 degrees C for a short process time provides sufficiently good crystallinity. (c) 2013 Elsevier B.V. All rights reserved.
