Browsing by Author "Parlak, M."
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Article Citation Count: 2Analysis of temperature-dependent transmittance spectra of Zn0.5In0.5Se (ZIS) thin films(Springer, 2019) Işık, Mehmet; Gullu, H. H.; Güllü, Hasan Hüseyin; Gasanly, N. M.; Parlak, M.; Department of Electrical & Electronics EngineeringTemperature-dependent transmission experiments of ZnInSe thin films deposited by thermal evaporation method were performed in the spectral range of 550-950nm and in temperature range of 10-300K. Transmission spectra shifted towards higher wavelengths (lower energies) with increasing temperature. Transmission data were analyzed using Tauc relation and derivative spectroscopy. Analysis with Tauc relation was resulted in three different energy levels for the room temperature band gap values of material as 1.594, 1.735 and 1.830eV. The spectrum of first wavelength derivative of transmittance exhibited two maxima positions at 1.632 and 1.814eV and one minima around 1.741eV. The determined energies from both methods were in good agreement with each other. The presence of three band gap energy levels were associated to valence band splitting due to crystal-field and spin-orbit splitting. Temperature dependence of the band gap energies were also analyzed using Varshni relation and gap energy value at absolute zero and the rate of change of gap energy with temperature were determined.Article Citation Count: 6Construction of self-assembled vertical nanoflakes on CZTSSe thin films(Iop Publishing Ltd, 2019) Sürücü, Özge; Surucu, O. Bayrakli; Güllü, Hasan Hüseyin; Abak, M. K.; Gullu, H. H.; Ercelebi, C.; Parlak, M.; Electrical-Electronics Engineering; Department of Electrical & Electronics EngineeringCu2ZnSn(S, Se)(4) (CZTSSe) is a promising alternative absorber material to achieve high power conversion efficiencies, besides its property of involving low-cost and earth-abundant elements when compared to Cu(In, Ga) Se-2 (CIGS) and cadmium telluride (CdTe), to be used in solar cell technology. In this study, a novel fabrication technique was developed by utilizing RF sputtering deposition of CZTSSe thin films having a surface decorated with self-assembled nanoflakes. The formation of nanoflakes was investigated by detailed spectroscopic method of analysis in the effect of each stacked layer deposition in an optimized sequence and the size of nanoflakes by an accurate control of sputtering process including film thickness. Moreover, the effects of substrate temperature on the formation of nanoflakes on the film surface were discussed at a fixed deposition route. One of the main advantages arising from the film surface with self-assembled nanoflakes is the efficient light trapping which decreases the surface reflectance. As a result of the detailed production and characterization studies, it was observed that there was a possibility of repeatable and controllable fabrication sequence for the preparation of CZTSSe thin films with self-textured surfaces yielding low surface reflectance.Article Citation Count: 9CZTSSe thin films fabricated by single step deposition for superstrate solar cell applications(Springer, 2019) Sürücü, Özge; Surucu, O. Bayrakli; Güllü, Hasan Hüseyin; Gullu, H. H.; Ciftpinar, E. H.; Ercelebi, C.; Parlak, M.; Electrical-Electronics Engineering; Department of Electrical & Electronics EngineeringThe focus of this study is the characterization of Cu2ZnSn(S,Se)(4) (CZTSSe) thin films and fabrication of CZTSSe solar cell in superstrate configuration. In this work, superstrate-type configuration of glass/ITO/CdS/CZTSSe/Au was entirely fabricated by totally vacuum-based process. CZTSSe absorber layers were grown by RF magnetron sputtering technique using stacked layer procedure. SnS, CuSe and ZnSe solid targets were used as precursors and no additional step like the selenization process was applied. The structural and morphological properties of deposited CZTSSe layers were analyzed using X-ray diffraction (XRD), Raman scattering, scanning electron microscopy (SEM) and energy dispersive X-ray spectroscopy analysis (EDS) measurements. The optical and electrical properties of the CZTSSe thin films were investigated by UV-Vis spectroscopy, Hall-Effect and photoconductivity measurements. In addition, the device performance of the fabricated superstrate solar cell was examined.Article Citation Count: 21Determination of current transport characteristics in Au-Cu/CuO/n-Si Schottky diodes(Elsevier, 2019) Sürücü, Özge; Gullu, H. H.; Güllü, Hasan Hüseyin; Yildiz, D. E.; Parlak, M.; Electrical-Electronics Engineering; Department of Electrical & Electronics EngineeringIn this study, the material properties of CuO thin films fabricated by sputtering technique and electrical properties of CuO/n-Si structure were reported. Temperature-dependent current-voltage (I-V) measurement was carried out to determine the detail electrical characteristics of this structure. The anomaly in thermionic emission (TE) model related to barrier height inhomogeneity at the interface was obtained from the forward bias I-V analysis. The current transport mechanism at the junction was determined under the assumption of TE with Gaussian distribution of barrier height. In this analysis, standard deviation and mean zero bias barrier height were evaluated as 0.176 and 1.48 eV, respectively. Depending on the change in the diode parameters with temperature, Richardson constant was recalculated as 110.20 Acm(-2)K(-2) with the help of modified Richardson plot. In addition, density of states at the interface were determined by using the forward bias I-V results.Article Citation Count: 7Effects of Si nanowire on the device properties of n-ZnSe/p-Si heterostructure(Springer, 2019) Güllü, Hasan Hüseyin; Gullu, H. H.; Colakoglu, T.; Emir, C.; Bozdogan, E.; Parlak, M.; Department of Electrical & Electronics EngineeringThe semiconductor nanowire (NW) technology has raised attention owing to its one-dimensional geometry as a solution for lattice mismatch in the fabricated heterostructures. Although, SiNWs have been investigated for various device technologies, there is no published work on the p-n junction formed by deposition of ZnSe thin film on these NW structures, in which this film layer has significant optical and electrical properties in optoelectronics applications. The aim of this study is determining the device properties of n-ZnSe/SiNW heterojunction and obtaining the enhancement in the device application of the NW structure on Si surface with comparing to planar surface. SiNW was produced by metal assisted etching method as a cost-efficient process, and the ZnSe film was deposited on SiNW and planar Si substrates by thermal evaporation of elemental sources. The optical band gap of the deposited ZnSe film was determined as 2.7eV which is in a good agreement with literature. The ideality factor and series resistance values of the ZnSe/SiNW and ZnSe/Si heterojunctions were calculated as 3.12, 461 , and 4.52, 7.26x103, respectively. As a result of utilizing SiNW structure, a spectacular improvement in terms of the physical parameters related to device properties was achieved.Article Citation Count: 10Electrical characterization of CdZnTe/Si diode structure(Springer Heidelberg, 2020) Güllü, Hasan Hüseyin; Terlemezoglu, M.; Gullu, H. H.; Yildiz, D. E.; Parlak, M.; Department of Electrical & Electronics EngineeringTemperature-dependent current-voltage (I - V), and frequency dependent capacitance-voltage (C - V) and conductance-voltage (G - V) measurements were performed in order to analyze characteristics of CdZnTe/Si structure. Obtained profiles enable us to understand the different characteristics of the diode structure such as the carrier conduction mechanism and the nature of the interfacial layer. Over the temperature range between 220 and 340 K, taking consideration of the disparity in the forward-biased current, the diode parameters such as saturation current (I-0), zero-bias barrier height (Phi(B0)) and ideality factor (n) have been obtained. The barrier height increased (0.53 to 0.80 eV) while the ideality factor decreased (4.63 to 2.79) with increasing temperature from 220 to 340 K, indicating an improvement in the junction characteristics at high temperatures. Due to the inhomogeneity in barrier height, the conduction mechanism was investigated by Gaussian distribution analysis. Hence, the mean zero-bias barrier height ((Phi) over bar (B0)) and zero-bias standard deviation (sigma(0)) were calculated as 1.31 eV and 0.18, respectively. Moreover, for holes in p-type Si, Richardson constant was found to be 32.09 A cm(-2) K-2 via modified Richardson plot. Using the capacitance-voltage (C - V) and conductance-voltage (G - V) characteristics, series resistance (R-s) and density of interfacial traps (D-it) have been also investigated in detail. A decreasing trend for R-s and D-it profiles with increasing frequency was observed due to the impurities at the CdZnTe/Si interface and interfacial layer between the front metal contact and CdZnTe film.Article Citation Count: 2Electrical Characterization of ZnInSe2/Cu0.5Ag0.5InSe2 Thin-Film Heterojunction(Springer, 2019) Güllü, Hasan Hüseyin; Parlak, M.; Department of Electrical & Electronics EngineeringZnInSe2/Cu0.5Ag0.5InSe2 diode structures have been fabricated by thermal evaporation of stacked layers on indium tin oxide-coated glass substrates. Temperature-dependent dark current-voltage measurements were carried out to extract the diode parameters and to determine the dominant conduction mechanisms in the forward- and reverse-bias regions. The heterostructure showed three order of magnitude rectifying behavior with a barrier height of 0.72 eV and ideality factor of 2.16 at room temperature. In the high forward-bias region, the series and shunt resistances were calculated with the help of parasitic resistance relations, yielding room-temperature values of 9.54 x 10(2) Omega cm(2) and 1.23 x 10(3) Omega cm(2), respectively. According to the analysis of the current flow in the forward-bias region, abnormal thermionic emission due to the variation of the ideality factor with temperature and space-charge-limited current processes were determined to be the dominant conduction mechanisms in this heterostructure. In the reverse-bias region, the tunneling mechanism was found to be effective in the leakage current flow with trap density of 10(6) cm(-3). Spectral photocurrent measurements were carried out to investigate the spectral working range of the device structure. The main photocurrent peaks observed in the spectrum corresponded to the band-edge values of the active thin-film layers.Article Citation Count: 0Exploring Temperature-Dependent bandgap and Urbach energies in CdTe thin films for optoelectronic applications(Elsevier, 2024) Sürücü, Özge; Surucu, G.; Işık, Mehmet; Parlak, M.; Isik, M.; Electrical-Electronics Engineering; Department of Electrical & Electronics EngineeringThis study examines CdTe thin films deposited via RF magnetron sputtering, focusing on structural and optical properties. X-ray diffraction, Raman spectroscopy, and SEM assessed structural characteristics. Optical properties were analyzed through transmittance measurements from 10 to 300 K. Tauc plots and Varshni modeling revealed a temperature-dependent bandgap, increasing from 1.49 eV at room temperature to 1.57 eV at 10 K. Urbach energy rose from 82.7 to 93.7 meV with temperature. These results are essential for applications where temperature affects CdTe-based device performance.Article Citation Count: 7FABRICATION AND CHARACTERIZATION OF TiO2 THIN FILM FOR DEVICE APPLICATIONS(World Scientific Publ Co Pte Ltd, 2019) Güllü, Hasan Hüseyin; Gullu, H. H.; Coskun, E.; Parlak, M.; Ercelebi, C.; Department of Electrical & Electronics EngineeringTitanium oxide (TiO2) film was deposited by rectification factor (RF) magnetron sputtering technique on glass substrates and p-Si (111) wafers to fabricate n-TiO2/p-Si heterojunction devices for the investigation of material and device properties, respectively. The structural, surface morphology, optical and electrical properties of TiO(2 )film were characterized by means of scanning electron microscopy (SEM), atomic force microscopy (AFM), X-ray diffraction (XRD), UV-visual (UV-Vis) spectral and dark current-voltage (I-V) measurement analyses. The deposited film layer was found to be homogeneous structure with crack-free surface. The bandgap value of TiO2 film was determined as 3.6 eV and transmission was around 65-85% in the spectral range of 320-1100 nm. The conductivity type of the deposited film was determined as n-type by hot probe method. These values make TiO2 film a suitable candidate as the n-type window layer in possible diode applications. TiO2 film was also deposited on p-Si (111) wafer to obtain Al/n-TiO2/p-Si/Al heterojunction device structure. The dark I-V characteristic was studied to determine the possible conduction mechanisms and diode parameters.Article Citation Count: 2Fabrication of CdSeXTe1-x thin films by sequential growth using double sources(Elsevier, 2021) Güllü, Hasan Hüseyin; Gullu, H. H.; Terlemezoglu, M.; Parlak, M.; Department of Electrical & Electronics EngineeringCdSexTe(1-x) (CST) ternary thin films were fabricated by stacking thermally evaporated CdSe and electron beam evaporated CdTe layers. The final structure was achieved in a stoichiometric form of approximately Cd:Se:Te = 50:25:25. The post-annealing processes at 300, 400, and 450 degrees C were applied to trigger the compound formation of CST thin films. The X-ray diffraction (XRD) profiles revealed that CdTe and CdSe have major peaks at 23.9 degrees and 25.5 degrees corresponds to (111) direction in cubic zinc-blend structure. Raman modes of CdTe were observed at 140 and 168 cm(-1), while Raman modes of CdSe films were detected at 208 and 417 cm(-1). The post-annealing process was found to be an effective method in order to combine both diffraction peaks and the vibrational modes of CdTe and CdSe, consequently to form CST ternary alloy. Transmission spectroscopy analysis revealed that CST films have direct band gap value of 1.6 eV.Article Citation Count: 22Frequency effect on electrical and dielectric characteristics of HfO2-interlayered Si-based Schottky barrier diode(Springer, 2020) Sürücü, Özge; Yildiz, D. E.; Güllü, Hasan Hüseyin; Parlak, M.; Electrical-Electronics Engineering; Department of Electrical & Electronics EngineeringThis study reveals the electrical properties of In/HfO2/n-Si structure with atomic layer-deposited interfacial oxide layer, HfO2 thin film between In top metal contact and monocrystalline Si wafer substrate. From the dark current-voltage measurements, the diode structure showed good rectifying behavior and low saturation current of about two order of magnitude and 1.2 x 10(- 9) A, respectively. According to the conventional thermionic emission model, zero-bias barrier height and ideality factor were calculated from the forward bias current-voltage curve at room temperature under dark conditions as 0.79 eV and 4.22 eV, respectively. In order to get detailed information about density of interface states and series resistance of this structure, capacitance-voltage and conductance-voltage measurements in the frequency range of 10-1000 kHz were performed. As a result, a decreasing capacitance profile with increasing frequency was obtained. In addition, peak-like behavior in the capacitance profiles was observed and these were found to be the indication of density of states. Further analysis was performed on the evaluation of density of interface states values and these values were calculated by using two different methods: Hill-Coleman and high-low frequency capacitance. These profiles were also analyzed by eliminating the effect of series resistance values on the measured capacitance and conductance; then the values of corrected capacitance and conductance as a function of applied voltage were discussed. Based on these analyses on the capacitive characteristics of the diode, dielectric constant, dielectric loss, loss tangent, electrical conductivity, and the real and imaginary part of electric modulus were investigated for complete understanding on the diode characteristics.Article Citation Count: 14Frequency effect on electrical and dielectric characteristics of In/Cu2ZnSnTe4/Si/Ag diode structure(Springer, 2019) Sürücü, Özge; Surucu, O. Bayrakli; Güllü, Hasan Hüseyin; Yildiz, D. E.; Parlak, M.; Electrical-Electronics Engineering; Department of Electrical & Electronics EngineeringIn/Cu2ZnSnTe4/Si/Ag diode structure was fabricated by sputtering Cu2ZnSnTe4 (CZTTe) thin film layer on the Si layer with In front contact. The frequency dependent room temperature capacitance and conductance measurements were carried out to obtain detailed information of its electrical characteristics. Admittance spectra of the diode exhibited strong frequency dependence and the obtained values showed decreasing behavior with the increase in the applied frequency. The effect of interfacial film layer with series resistance values and density of interface states were investigated by taking into consideration of non-ideal electrical characteristics of the diode. The distribution profile of the interface states was extracted by Hill-Coleman and high-low frequency capacitance methods. As a function of frequency, they were in proportionality with the inverse of applied frequency. Dielectric constant and dielectric loss parameters were calculated from the maximum value of the diode capacitance at the strong accumulation region. The loss tangent showed a characteristic peak behavior at each frequency. Based on the time-dependent response of the interfacial charges to the applied ac field, the values of ac electrical conductivity and complex electric modulus were calculated and discussed as a function of frequency and bias voltage.Article Citation Count: 4Growth and optical characterization of Sn0.6Sb0.4Se layer single crystals for optoelectronic applications(Elsevier Sci Ltd, 2022) Sürücü, Özge; Terlemezoglu, M.; Işık, Mehmet; Isik, M.; Parlak, M.; Electrical-Electronics Engineering; Department of Electrical & Electronics EngineeringSnSe compound is an attractive semiconductor material due to its usage in photovoltaic applications. The sub-stitution of Sb in the SnSe compound presents a remarkable advantage especially in point of tuning optical characteristics. The present paper reports the structural and optical properties of Sn1-xSbxSe (x = 0.4) layered single crystals grown by the vertical Bridgman method. To the best of our knowledge, this work is the first investigation of the Sn0.6Sb0.4Se crystal grown with the vertical Bridgman technique. X-ray diffraction (XRD) pattern of the grown crystal indicated the well crystalline structure of the grown crystals. Lattice strain and interplanar spacing of the crystal structure were determined using the XRD pattern. Scanning electron micro-scope images allowed to the observation of the layer crystal structure. The layer crystalline structure shows 2D material properties and provides 2D applications. Optical properties were revealed by carrying out Raman, ellipsometry and transmission measurements. Raman modes, refractive index, extinction coefficient, and dielectric spectra, band gap energy of the crystal were presented throughout the paper. The obtained results indicated that Sn1-xSbxSe (x = 0.4) layer single crystals may be an alternative potential for photovoltaic and optoelectronic applications.Article Citation Count: 4Improvement of electrical characteristics of SnSe/Si heterostructure by integration of Si nanowires(Elsevier, 2021) Güllü, Hasan Hüseyin; Gullu, H. H.; Emir, C.; Parlak, M.; Department of Electrical & Electronics EngineeringIn this study, the effects of the nanowire geometry on Si wafer substrate were investigated for the SnSe/Si-nanowire heterojunction device and the obtained results were compared with the one fabricated on planar Si surface. Nanowires on Si surface were produced by metal-assisted etching method and the SnSe film layer was deposited by thermal evaporation technique. On both Si and glass surfaces, deposited film shows polycrystalline and single SnSe phase. From optical transmission measurements, optical band gap of this film was determined as 1.36 eV in a good agreement with the literature. All SnSe/Si heterostructures were found in a p-n diode behavior and the ideality factor and series resistance values were calculated as 2.40, 547 Omega, and 3.71, 1.57 x 10(3) Omega, for SnSe/Si-nanowire and SnSe/Si heterojunctions, respectively. As a result, an improvement in device characteristics concerning the planar Si structure was found by utilizing Si nanowire structure.Article Citation Count: 5Influence of temperature on optical properties of electron-beam-evaporated ZnSe thin film(Iop Publishing Ltd, 2020) Işık, Mehmet; Isik, M.; Güllü, Hasan Hüseyin; Parlak, M.; Department of Electrical & Electronics EngineeringStructural and optical properties of ZnSe thin films grown by electron-beam evaporation technique were reported in the present paper. X-ray diffraction pattern exhibited a single peak around 27 degrees which is well-suited with cubic phase of the films. Energy dispersive X-ray spectroscopy analyses resulted in atomic composition ratio of Zn/Se nearly 1.0 which corresponds to the chemical formula of ZnSe. Transmission experiments were performed at various temperatures in between 10 and 300 K. The analyses of the transmission data showed that direct band gap energy of the ZnSe thin films increases from 2.72 to 2.83 eV as temperature was reduced to 10 K from room temperature. The Varshni and O'Donnell-Chen models giving the temperature-band gap energy relation were used to get various optical parameters of the evaporated thin films. Analyses resulted in absolute zero temperature band gap energy as 2.83 eV, temperature coefficient as -5.8 x 10(-4) eV K-1 and average phonon energy as 16 meV. Urbach tail state energies were also calculated using absorption coefficient in the low photon energy region as increasing from 173 meV (300 K) to 181 meV (10 K) with decreasing ambient temperature.Article Citation Count: 10Investigation of band gap energy versus temperature for SnS 2 thin films grown by RF-magnetron sputtering(Elsevier, 2020) Sürücü, Özge; Gullu, H. H.; Işık, Mehmet; Surucu, O. Bayrakli; Güllü, Hasan Hüseyin; Gasanly, N. M.; Electrical-Electronics Engineering; Department of Electrical & Electronics Engineering[No Abstract Available]Conference Object Citation Count: 10Investigation of carrier transport mechanisms in the Cu-Zn-Se based hetero-structure grown by sputtering technique(Canadian Science Publishing, 2018) Sürücü, Özge; Terlemezoglu, M.; Güllü, Hasan Hüseyin; Yildiz, D. E.; Parlak, M.; Electrical-Electronics Engineering; Department of Electrical & Electronics EngineeringIn this paper, we present results of the electrical characterization of n-Si/p-Cu-Zn-Se hetero-structure. Sputtered film was found in Se-rich behavior with tetragonal polycrystalline nature along with (112) preferred orientation. The band gap energy for direct optical transitions was obtained as 2.65 eV. The results of the conductivity measurements indicated p-type behavior and carrier transport mechanism was modelled according to thermionic emission theory. Detailed electrical characterization of this structure was carried out with the help of temperature-dependent current-voltage measurements in the temperature range of 220-360 K, room temperature, and frequency-dependent capacitance-voltage and conductance-voltage measurements. The anomaly in current-voltage characteristics was related to barrier height inhomogeneity at the interface and modified by the assumption of Gaussian distribution of barrier height, in which mean barrier height and standard deviation at zero bias were found as 2.11 and 0.24 eV, respectively. Moreover, Richardson constant value was determined as 141.95 Acm(-2)K(-2) by means of modified Richardson plot.Article Citation Count: 2INVESTIGATION OF CONDUCTIVITY CHARACTERISTICS OF Zn-In-Se THIN FILMS(World Scientific Publ Co Pte Ltd, 2020) Güllü, Hasan Hüseyin; Parlak, M.; Department of Electrical & Electronics EngineeringZn-In-Se thin films were fabricated on the ultrasonically cleaned glass substrates masked with clover-shaped geometry by thermal evaporation of its elemental sources. Temperature-dependent conductivity characteristics of the films were investigated under dark and illuminated conditions. The semiconductor type of the films was found as n-type by thermal probe test. According to the van der Pauw technique, the dark electrical conductivity analyses showed that the variations of conductivity of unannealed and annealed at 300 degrees C samples are in exponential dependence of temperature. These conductivity profiles were found to be dominated by the thermionic emission at high temperature region whereas their behaviors at low temperatures were modeled by hopping theory. On the contrary, as a result of the further annealing temperatures, the surface of the samples showed semi-metallic characteristics with deviating from expected Arrhenius behavior. In addition, the temperature-dependent photoconductivity of the films was analyzed under different illumination intensities and the results were explained by the supra-linear characteristic based on the two-center recombination model.Article Citation Count: 11Investigation of electrical characteristics of Ag/ZnO/Si sandwich structure(Springer, 2019) Sürücü, Özge; Surucu, O. Bayrakli; Güllü, Hasan Hüseyin; Yildiz, D. E.; Parlak, M.; Electrical-Electronics Engineering; Department of Electrical & Electronics EngineeringIn this study, temperature-dependent current-voltage (I-V), frequency-dependent capacitance-voltage (C-V) and conductance-voltage (G/omega-V) measurements are carried out for the electrical characterization of a zinc oxide (ZnO) thin film-based diode. The sandwich structure in the form of Ag/ZnO/Si/Al is investigated at temperatures between 220 and 360 K and in the frequency region of 1 kHz-1 MHz. ZnO thin film layer is deposited on a p-Si wafer substrate as a transparent conductive oxide layer by taking into consideration possible electronic applications with intrinsic attractive material properties. At each temperature step, the I-V curves showed about two orders of magnitude rectifying behavior and, according to the Schottky diode relation, the saturation current, zero-bias barrier height and ideality factor were extracted as a function of the temperature. In the case of non-ideal diode characteristics due to the inhomogeneties in the diode as observed from the characteristics of the calculated parameters, effective barrier height values are evaluated. In addition, based on the existence of the interface layer, density of interface states in the band gap region and parasitic resistances were determined by the capacitance measurements.Article Citation Count: 0Material and device properties of Si-based Cu0.5Ag0.5InSe2 thin-film heterojunction diode(Springer, 2020) Işık, Mehmet; Isik, M.; Güllü, Hasan Hüseyin; Parlak, M.; Gasanly, N. M.; Department of Electrical & Electronics EngineeringCu0.5Ag0.5InSe2 (CAIS) thin films were deposited on a glass substrate by sequential sputtering of Cu, Ag, and In2Se3-stacked film layers. Structural characterization showed that the deposited CAIS film satisfies nearly the stoichiometric form with uniform and homogeneous surface structure. The single-phase polycrystalline behavior without any secondary-phase formation was observed from the diffraction profile. The optical properties were investigated using temperature-dependent transmission measurements in the wavelength region of 600-1100 nm and in between 10 and 300 K. In the region of interest, the transmission spectra shifted towards the higher wavelengths as a result of an increase in the sample temperature. The analysis of the absorption data based on the transmission spectra resulted in absorption coefficient values of around 10(5) cm(-1) and the presence of direct allowed optical transition. From the Tauc plots, CAIS samples were found to have three distinct direct optical transitions depending on the possible splitting in the valence band. The obtained room temperature uppermost band gap energy value of 1.09 eV was found in the energy limit of ternary analogues (CuInSe2 and AgInSe2), and also in a good agreement with the previous works in the literature. The dependency of the band gap energy on the temperature was analyzed using fundamental relations. In addition, the electrical characteristics of the film layer were discussed in four-contact conductivity measurements, and room temperature conductivity was observed as 0.8 ohm(-1) cm(-1). Additionally, two activation energy values were found in the temperature-dependent conductivity profile. As a diode application, CAIS/Si heterojunction was fabricated and the main diode parameters were extracted at dark and room temperature conditions.