Theoretical Modelling of Magnetron Sputtering of Boron Nitride Coating
| dc.contributor.author | Rake, Nakka | |
| dc.contributor.author | Kaftanoglu, Bilgin | |
| dc.contributor.author | Hacaloglu, Tugce | |
| dc.contributor.author | Aydogan, Asude | |
| dc.date.accessioned | 2024-07-05T15:23:59Z | |
| dc.date.available | 2024-07-05T15:23:59Z | |
| dc.date.issued | 2023 | |
| dc.description.abstract | The fundamentals of the magnetron sputtering (MS) technique are simple. However, the complex interplay of various physical and chemical sub-processes lies in its simplicity. The direct simulation Monte Carlo (DSMC) method is used to model the MS of the Boron Nitride (BN) coating. The Lorentz force, which is created by an electric field, magnetic field and particle collision, is utilised to model the BN coating. Three distinct bias voltages are used to generate three different BN-coating models under the same conditions. The modelling of BN coatings reveals that the deposition rate decreases as the substrate voltage increases. | en_US |
| dc.description.sponsorship | The authors would like to thank the BOREN/TENMAK Center of Competence for Boron Coatings at the Metal Forming Centre of Excellence at ATILIM university for performing physical Vapour deposition in the lab and coating thickness analysis tests. The authors would like to thank Metariver Technology and Metariver team Seoul, 05854, Korea for sharing the Samadii™/sciv (Statistical Contact in Vacuum) package which uses to interpret MS of BN coating in this study. Their support and kindness give us excellent help to continue this research. | |
| dc.description.sponsorship | Metariver Technology and Metariver team Seoul, (05854); TENMAK Center of Competence for Boron Coatings; Ulusal Bor Araştırma Enstitüsü, BOREN | |
| dc.identifier.doi | 10.1557/s43579-022-00293-3 | |
| dc.identifier.issn | 2159-6859 | |
| dc.identifier.issn | 2159-6867 | |
| dc.identifier.scopus | 2-s2.0-85142284287 | |
| dc.identifier.uri | https://doi.org/10.1557/s43579-022-00293-3 | |
| dc.identifier.uri | https://hdl.handle.net/20.500.14411/2362 | |
| dc.language.iso | en | en_US |
| dc.publisher | Springer Heidelberg | en_US |
| dc.relation.ispartof | MRS Communications | |
| dc.rights | info:eu-repo/semantics/closedAccess | en_US |
| dc.subject | [No Keyword Available] | en_US |
| dc.subject | Thin Film | |
| dc.subject | Coating | |
| dc.subject | Crystal Growth | |
| dc.subject | Physical Vapour Deposition (PVD) | |
| dc.subject | Sputtering | |
| dc.subject | Modelling | |
| dc.title | Theoretical Modelling of Magnetron Sputtering of Boron Nitride Coating | en_US |
| dc.type | Letter | en_US |
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| gdc.author.id | Rake, Nakka/0000-0002-2755-3831 | |
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| gdc.author.wosid | HACALOGLU, TUGCE/KGL-3363-2024 | |
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| gdc.description.department | Atılım University | en_US |
| gdc.description.departmenttemp | [Rake, Nakka; Kaftanoglu, Bilgin; Hacaloglu, Tugce; Aydogan, Asude] ATILIM Univ, Mech Engn Dept, Ankara, Turkey | en_US |
| gdc.description.endpage | 7 | en_US |
| gdc.description.issue | 1 | en_US |
| gdc.description.publicationcategory | Diğer | en_US |
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| gdc.description.volume | 13 | en_US |
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| gdc.virtual.author | Kaftanoğlu, Bilgin | |
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