Theoretical Modelling of Magnetron Sputtering of Boron Nitride Coating

dc.authorscopusid 57971757200
dc.authorscopusid 7003779929
dc.authorscopusid 57211179167
dc.authorscopusid 57970949800
dc.contributor.author Rake, Nakka
dc.contributor.author Kaftanoglu, Bilgin
dc.contributor.author Hacaloglu, Tugce
dc.contributor.author Aydogan, Asude
dc.contributor.other Manufacturing Engineering
dc.date.accessioned 2024-07-05T15:23:59Z
dc.date.available 2024-07-05T15:23:59Z
dc.date.issued 2023
dc.department Atılım University en_US
dc.department-temp [Rake, Nakka; Kaftanoglu, Bilgin; Hacaloglu, Tugce; Aydogan, Asude] ATILIM Univ, Mech Engn Dept, Ankara, Turkey en_US
dc.description.abstract The fundamentals of the magnetron sputtering (MS) technique are simple. However, the complex interplay of various physical and chemical sub-processes lies in its simplicity. The direct simulation Monte Carlo (DSMC) method is used to model the MS of the Boron Nitride (BN) coating. The Lorentz force, which is created by an electric field, magnetic field and particle collision, is utilised to model the BN coating. Three distinct bias voltages are used to generate three different BN-coating models under the same conditions. The modelling of BN coatings reveals that the deposition rate decreases as the substrate voltage increases. en_US
dc.identifier.citationcount 0
dc.identifier.doi 10.1557/s43579-022-00293-3
dc.identifier.endpage 7 en_US
dc.identifier.issn 2159-6859
dc.identifier.issn 2159-6867
dc.identifier.issue 1 en_US
dc.identifier.scopus 2-s2.0-85142284287
dc.identifier.scopusquality Q3
dc.identifier.startpage 1 en_US
dc.identifier.uri https://doi.org/10.1557/s43579-022-00293-3
dc.identifier.uri https://hdl.handle.net/20.500.14411/2362
dc.identifier.volume 13 en_US
dc.identifier.wos WOS:000886415800001
dc.identifier.wosquality Q4
dc.institutionauthor Kaftanoğlu, Bilgin
dc.language.iso en en_US
dc.publisher Springer Heidelberg en_US
dc.relation.publicationcategory Diğer en_US
dc.rights info:eu-repo/semantics/closedAccess en_US
dc.scopus.citedbyCount 0
dc.subject [No Keyword Available] en_US
dc.title Theoretical Modelling of Magnetron Sputtering of Boron Nitride Coating en_US
dc.type Letter en_US
dc.wos.citedbyCount 0
dspace.entity.type Publication
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relation.isOrgUnitOfPublication.latestForDiscovery 9804a563-7f37-4a61-92b1-e24b3f0d8418

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