Güllü, Hasan Hüseyin
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Name Variants
Gullu,H.H.
H.,Güllü
H.H.Güllü
G., Hasan Huseyin
Güllü, Hasan Hüseyin
H., Gullu
G.,Hasan Huseyin
H.H.Gullu
Hasan Hüseyin, Güllü
G.,Hasan Hüseyin
Hasan Huseyin, Gullu
Gullu, Hasan Huseyin
Güllü,H.H.
Gullu, H. H.
Gullu, Hasan H.
H.,Güllü
H.H.Güllü
G., Hasan Huseyin
Güllü, Hasan Hüseyin
H., Gullu
G.,Hasan Huseyin
H.H.Gullu
Hasan Hüseyin, Güllü
G.,Hasan Hüseyin
Hasan Huseyin, Gullu
Gullu, Hasan Huseyin
Güllü,H.H.
Gullu, H. H.
Gullu, Hasan H.
Job Title
Doktor Öğretim Üyesi
Email Address
hasan.gullu@atilim.edu.tr
Main Affiliation
Department of Electrical & Electronics Engineering
Status
Former Staff
Website
ORCID ID
Scopus Author ID
Turkish CoHE Profile ID
Google Scholar ID
WoS Researcher ID
Sustainable Development Goals
2
ZERO HUNGER
0
Research Products
14
LIFE BELOW WATER
0
Research Products
17
PARTNERSHIPS FOR THE GOALS
0
Research Products
5
GENDER EQUALITY
0
Research Products
16
PEACE, JUSTICE AND STRONG INSTITUTIONS
0
Research Products
8
DECENT WORK AND ECONOMIC GROWTH
0
Research Products
4
QUALITY EDUCATION
0
Research Products
6
CLEAN WATER AND SANITATION
0
Research Products
7
AFFORDABLE AND CLEAN ENERGY
5
Research Products
10
REDUCED INEQUALITIES
0
Research Products
11
SUSTAINABLE CITIES AND COMMUNITIES
0
Research Products
9
INDUSTRY, INNOVATION AND INFRASTRUCTURE
0
Research Products
1
NO POVERTY
0
Research Products
3
GOOD HEALTH AND WELL-BEING
0
Research Products
12
RESPONSIBLE CONSUMPTION AND PRODUCTION
0
Research Products
13
CLIMATE ACTION
0
Research Products
15
LIFE ON LAND
0
Research Products
This researcher does not have a Scopus ID.
This researcher does not have a WoS ID.
Scholarly Output
55
Articles
52
Views / Downloads
7/0
Supervised MSc Theses
1
Supervised PhD Theses
0
WoS Citation Count
877
Scopus Citation Count
899
WoS h-index
16
Scopus h-index
16
Patents
0
Projects
0
WoS Citations per Publication
15.95
Scopus Citations per Publication
16.35
Open Access Source
8
Supervised Theses
1
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| Journal | Count |
|---|---|
| Journal of Materials Science: Materials in Electronics | 16 |
| Physica B: Condensed Matter | 7 |
| Bulletin of Materials Science | 3 |
| Materials Science in Semiconductor Processing | 3 |
| Optik | 3 |
Current Page: 1 / 5
Scopus Quartile Distribution
Competency Cloud
20 results
Scholarly Output Search Results
Now showing 1 - 10 of 20
Article Citation - WoS: 42Citation - Scopus: 41Analysis of Forward and Reverse Biased Current-Voltage Characteristics of Al/Al2< Schottky Diode With Atomic Layer Deposited Al2o3< Thin Film Interlayer(Springer, 2019) Gullu, H. H.; Yildiz, D. E.The dark current-voltage (I-V) characteristics of Al/Al2O3/n-Si Schottky diode are investigated in a wide temperature range of 260-360 K. The diode shows four orders of magnitude rectification. In forward and reverse bias regions, the temperature-dependent I-Vcharacteristics are detailed in terms of diode parameters and dominant conduction mechanisms. Due to the existence of Al2O3 film layer and series resistance in the diode structure, current flow under the forward bias is observed in a deviation from pure exponential characteristics. The diode parameters are estimated from thermionic emission model with non-unity ideality factor, and this non-ideal behavior is resulted in the ideality factors greater than two. In addition to these values, zero-bias barrier height is found to be strongly temperature dependent, and this variation indicates a presence of inhomogeneties in the barrier according to Gaussian distribution (GD) approximation. This fact is investigated plotting characteristic plot of this model and by extracting mean barrier height with its standard deviation. In order to complete the work on the forward I-V region, the carrier transport characteristics of the diode are explained on the basis of thermionic emission mechanism with a GD of the harrier heights. In accordance with this approximation, the conventional Richardson plot exhibits non-linearity behavior and modified current relation based on GD model is used to calculate mean barrier height and Richardson constant. In addition, the values of parasitic resistances are determined using Ohm's law as a function of temperature for all bias voltage spectra. In the reverse bias region, Poole-Frenkel effect is found to be dominant on the conduction associated with the barrier lowering, and barrier height in the emission process from the trapped states, and high-frequency dielectric constant of Al2O3 film layer is calculated.Article Citation - WoS: 11Citation - Scopus: 8Fabrication and Characterization of Tio2 Thin Film for Device Applications(World Scientific Publ Co Pte Ltd, 2019) Hosseini, A.; Gullu, H. H.; Coskun, E.; Parlak, M.; Ercelebi, C.Titanium oxide (TiO2) film was deposited by rectification factor (RF) magnetron sputtering technique on glass substrates and p-Si (111) wafers to fabricate n-TiO2/p-Si heterojunction devices for the investigation of material and device properties, respectively. The structural, surface morphology, optical and electrical properties of TiO(2 )film were characterized by means of scanning electron microscopy (SEM), atomic force microscopy (AFM), X-ray diffraction (XRD), UV-visual (UV-Vis) spectral and dark current-voltage (I-V) measurement analyses. The deposited film layer was found to be homogeneous structure with crack-free surface. The bandgap value of TiO2 film was determined as 3.6 eV and transmission was around 65-85% in the spectral range of 320-1100 nm. The conductivity type of the deposited film was determined as n-type by hot probe method. These values make TiO2 film a suitable candidate as the n-type window layer in possible diode applications. TiO2 film was also deposited on p-Si (111) wafer to obtain Al/n-TiO2/p-Si/Al heterojunction device structure. The dark I-V characteristic was studied to determine the possible conduction mechanisms and diode parameters.Article Citation - WoS: 1Citation - Scopus: 1Material Characterization of Thermally Evaporated Znsn2te4< Thin Films(Elsevier Gmbh, Urban & Fischer verlag, 2019) Gullu, H. H.Polycrystalline and stoichiometric ZnSn2Te4 (ZST) thin films were deposited on glass substrates by sequential evaporation of elemental powder sources. The deposited films were annealed in nitrogen atmosphere at annealing temperature ranging 100-300 degrees C. Under post-annealing treatments, the composition, structural, surface morphological, optical and electrical characteristics of the films were investigated. Annealing treatments lead to maintain the structural characteristics with the possible change in atomic concentration of the constituent elements in limit of detection and crystallinity of the films increased with increasing annealing temperature. Grainy surface morphology was observed in as-grown and annealed films and densely packed appearance of the surface of the samples indicates uniform deposition of the film over the entire substrate surface. Under the aim of visible light harvesting in the applications of thin film photovoltaics, normal-incidence transmittance measurements were performed and the direct band gap values were found in the range of 1.8-2.1 eV. Temperature dependent conductivity characteristics of the films were investigated under dark condition and the observed conductivity profiles were found in Arrhenius behavior with temperature dominated by the thermionic emission model.Article Citation - WoS: 3Citation - Scopus: 6Structural and Optical Properties of Thermally Evaporated Cu-Ga (cgs) Thin Films(Elsevier, 2018) Gullu, H. H.; Isik, M.; Gasanly, N. M.The structural and optical properties of thermally evaporated Cu-Ga-S (CGS) thin films were investigated by Xray diffraction (XRD), energy dispersive X-ray spectroscopy (EDS), atomic force microscopy (AFM) and optical transmittance measurements. The effect of annealing temperature on the results of applied techniques was also studied in the present paper. EDS results revealed that each of the elements, Cu, Ga and S are presented in the films and Cu and Ga concentration increases whereas S concentration decreases within the films as annealing temperature is increased. XRD pattern exhibited four diffraction peaks which are well-matched with those of tetragonal CuGaS2 compound. AFM images were recorded to get knowledge about the surface morphology and roughness of deposited thin films. Transmittance measurements were applied in the wavelength region of 300-1000 nm. Analyses of the absorption coefficient derived from transmittance data resulted in presence of three distinct transition regions in each thin films with direct transition type. Crystal-field and spin-orbit splitting energies existing due to valence band splitting were also calculated using quasicubic model.Conference Object Citation - WoS: 10Citation - Scopus: 10Investigation of Carrier Transport Mechanisms in the Cu-Zn Based Hetero-Structure Grown by Sputtering Technique(Canadian Science Publishing, 2018) Gullu, H. H.; Terlemezoglu, M.; Bayrakli, O.; Yildiz, D. E.; Parlak, M.In this paper, we present results of the electrical characterization of n-Si/p-Cu-Zn-Se hetero-structure. Sputtered film was found in Se-rich behavior with tetragonal polycrystalline nature along with (112) preferred orientation. The band gap energy for direct optical transitions was obtained as 2.65 eV. The results of the conductivity measurements indicated p-type behavior and carrier transport mechanism was modelled according to thermionic emission theory. Detailed electrical characterization of this structure was carried out with the help of temperature-dependent current-voltage measurements in the temperature range of 220-360 K, room temperature, and frequency-dependent capacitance-voltage and conductance-voltage measurements. The anomaly in current-voltage characteristics was related to barrier height inhomogeneity at the interface and modified by the assumption of Gaussian distribution of barrier height, in which mean barrier height and standard deviation at zero bias were found as 2.11 and 0.24 eV, respectively. Moreover, Richardson constant value was determined as 141.95 Acm(-2)K(-2) by means of modified Richardson plot.Article Citation - WoS: 6Citation - Scopus: 7Construction of Self-Assembled Vertical Nanoflakes on Cztsse Thin Films(Iop Publishing Ltd, 2019) Terlemezoglu, M.; Surucu, O. Bayrakli; Colakoglu, T.; Abak, M. K.; Gullu, H. H.; Ercelebi, C.; Parlak, M.Cu2ZnSn(S, Se)(4) (CZTSSe) is a promising alternative absorber material to achieve high power conversion efficiencies, besides its property of involving low-cost and earth-abundant elements when compared to Cu(In, Ga) Se-2 (CIGS) and cadmium telluride (CdTe), to be used in solar cell technology. In this study, a novel fabrication technique was developed by utilizing RF sputtering deposition of CZTSSe thin films having a surface decorated with self-assembled nanoflakes. The formation of nanoflakes was investigated by detailed spectroscopic method of analysis in the effect of each stacked layer deposition in an optimized sequence and the size of nanoflakes by an accurate control of sputtering process including film thickness. Moreover, the effects of substrate temperature on the formation of nanoflakes on the film surface were discussed at a fixed deposition route. One of the main advantages arising from the film surface with self-assembled nanoflakes is the efficient light trapping which decreases the surface reflectance. As a result of the detailed production and characterization studies, it was observed that there was a possibility of repeatable and controllable fabrication sequence for the preparation of CZTSSe thin films with self-textured surfaces yielding low surface reflectance.Article Citation - WoS: 3Citation - Scopus: 4Analysis of Temperature-Dependent Transmittance Spectra of Zn0.5in0.5< (zis) Thin Films(Springer, 2019) Isik, M.; Gullu, H. H.; Delice, S.; Gasanly, N. M.; Parlak, M.Temperature-dependent transmission experiments of ZnInSe thin films deposited by thermal evaporation method were performed in the spectral range of 550-950nm and in temperature range of 10-300K. Transmission spectra shifted towards higher wavelengths (lower energies) with increasing temperature. Transmission data were analyzed using Tauc relation and derivative spectroscopy. Analysis with Tauc relation was resulted in three different energy levels for the room temperature band gap values of material as 1.594, 1.735 and 1.830eV. The spectrum of first wavelength derivative of transmittance exhibited two maxima positions at 1.632 and 1.814eV and one minima around 1.741eV. The determined energies from both methods were in good agreement with each other. The presence of three band gap energy levels were associated to valence band splitting due to crystal-field and spin-orbit splitting. Temperature dependence of the band gap energies were also analyzed using Varshni relation and gap energy value at absolute zero and the rate of change of gap energy with temperature were determined.Article Citation - WoS: 13Citation - Scopus: 15Investigation of electrical characteristics of Ag/ZnO/Si sandwich structure(Springer, 2019) Gullu, H. H.; Surucu, O. Bayrakli; Terlemezoglu, M.; Yildiz, D. E.; Parlak, M.In this study, temperature-dependent current-voltage (I-V), frequency-dependent capacitance-voltage (C-V) and conductance-voltage (G/omega-V) measurements are carried out for the electrical characterization of a zinc oxide (ZnO) thin film-based diode. The sandwich structure in the form of Ag/ZnO/Si/Al is investigated at temperatures between 220 and 360 K and in the frequency region of 1 kHz-1 MHz. ZnO thin film layer is deposited on a p-Si wafer substrate as a transparent conductive oxide layer by taking into consideration possible electronic applications with intrinsic attractive material properties. At each temperature step, the I-V curves showed about two orders of magnitude rectifying behavior and, according to the Schottky diode relation, the saturation current, zero-bias barrier height and ideality factor were extracted as a function of the temperature. In the case of non-ideal diode characteristics due to the inhomogeneties in the diode as observed from the characteristics of the calculated parameters, effective barrier height values are evaluated. In addition, based on the existence of the interface layer, density of interface states in the band gap region and parasitic resistances were determined by the capacitance measurements.Article Citation - WoS: 9Citation - Scopus: 9Optical Band Gap and Dispersion of Optical Constants of Cu-Ga Thin Films(Elsevier Gmbh, 2019) Isik, M.; Gullu, H. H.; Coskun, E.; Gasanly, N. M.Thermally deposited Cu-Ga-S thin films were optically characterized by means of experimental techniques of transmission measurements. The analyses of transmittance spectra were accomplished by derivative spectrophotometry analyses to get gap energies of thin films. The transmittance spectra of thin films annealed at different temperatures presented interference fringes which were analyzed by Swanepoel envelope method. The wavelength dependencies of optical parameters; refractive index (n), real part of complex dielectric function (epsilon(re)) and extinction coefficient (k) were reported in the weak absorption region. The photon energy dependencies of n and epsilon(re) were analyzed using single-oscillator and Spitzer-Fan models, respectively.Article Citation - WoS: 25Citation - Scopus: 26Determination of Current Transport Characteristics in Au-cu/Cuo Schottky Diodes(Elsevier, 2019) Surucu, O. Bayrakli; Gullu, H. H.; Terlemezoglu, M.; Yildiz, D. E.; Parlak, M.In this study, the material properties of CuO thin films fabricated by sputtering technique and electrical properties of CuO/n-Si structure were reported. Temperature-dependent current-voltage (I-V) measurement was carried out to determine the detail electrical characteristics of this structure. The anomaly in thermionic emission (TE) model related to barrier height inhomogeneity at the interface was obtained from the forward bias I-V analysis. The current transport mechanism at the junction was determined under the assumption of TE with Gaussian distribution of barrier height. In this analysis, standard deviation and mean zero bias barrier height were evaluated as 0.176 and 1.48 eV, respectively. Depending on the change in the diode parameters with temperature, Richardson constant was recalculated as 110.20 Acm(-2)K(-2) with the help of modified Richardson plot. In addition, density of states at the interface were determined by using the forward bias I-V results.
