Browsing by Author "Emir, C."
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Article Citation Count: 7Effects of Si nanowire on the device properties of n-ZnSe/p-Si heterostructure(Springer, 2019) Güllü, Hasan Hüseyin; Gullu, H. H.; Colakoglu, T.; Emir, C.; Bozdogan, E.; Parlak, M.; Department of Electrical & Electronics EngineeringThe semiconductor nanowire (NW) technology has raised attention owing to its one-dimensional geometry as a solution for lattice mismatch in the fabricated heterostructures. Although, SiNWs have been investigated for various device technologies, there is no published work on the p-n junction formed by deposition of ZnSe thin film on these NW structures, in which this film layer has significant optical and electrical properties in optoelectronics applications. The aim of this study is determining the device properties of n-ZnSe/SiNW heterojunction and obtaining the enhancement in the device application of the NW structure on Si surface with comparing to planar surface. SiNW was produced by metal assisted etching method as a cost-efficient process, and the ZnSe film was deposited on SiNW and planar Si substrates by thermal evaporation of elemental sources. The optical band gap of the deposited ZnSe film was determined as 2.7eV which is in a good agreement with literature. The ideality factor and series resistance values of the ZnSe/SiNW and ZnSe/Si heterojunctions were calculated as 3.12, 461 , and 4.52, 7.26x103, respectively. As a result of utilizing SiNW structure, a spectacular improvement in terms of the physical parameters related to device properties was achieved.Article Citation Count: 4Improvement of electrical characteristics of SnSe/Si heterostructure by integration of Si nanowires(Elsevier, 2021) Güllü, Hasan Hüseyin; Gullu, H. H.; Emir, C.; Parlak, M.; Department of Electrical & Electronics EngineeringIn this study, the effects of the nanowire geometry on Si wafer substrate were investigated for the SnSe/Si-nanowire heterojunction device and the obtained results were compared with the one fabricated on planar Si surface. Nanowires on Si surface were produced by metal-assisted etching method and the SnSe film layer was deposited by thermal evaporation technique. On both Si and glass surfaces, deposited film shows polycrystalline and single SnSe phase. From optical transmission measurements, optical band gap of this film was determined as 1.36 eV in a good agreement with the literature. All SnSe/Si heterostructures were found in a p-n diode behavior and the ideality factor and series resistance values were calculated as 2.40, 547 Omega, and 3.71, 1.57 x 10(3) Omega, for SnSe/Si-nanowire and SnSe/Si heterojunctions, respectively. As a result, an improvement in device characteristics concerning the planar Si structure was found by utilizing Si nanowire structure.Article Citation Count: 3Structural and optical properties of thermally evaporated (GaSe)0.75-(GaS)0.25 thin films(Elsevier Gmbh, 2021) Işık, Mehmet; Emir, C.; Gasanly, N. M.; Department of Electrical & Electronics EngineeringGaSe and GaS binary semiconducting compounds are layered structured and have been an attractive research interest in two-dimensional material research area. The present paper aims at growing (GaSe)0.75 - (GaS)0.25 (or simply GaSe0.75S0.25) thin film and investigating its structural and optical properties. Thin films were prepared by thermal evaporation technique using evaporation source of its single crystal grown by Bridgman method. The structural properties were revealed using x-ray diffraction (XRD), energy dispersive spectroscopy (EDS), scanning electron microscopy (SEM) and atomic force microscopy (AFM) techniques. XRD pattern and EDS analyses indicated that thin films annealed at 300 ?C were successfully deposited and its structural characteristics are well-consistent with its single crystal form. Surface morphology was studied by means of SEM and AFM measurements. Optical properties were investigated by transmission and Raman spectroscopy techniques. Raman spectrum exhibited three peaks around 172, 242 and 342 cm-1. Analyses of transmission spectrum revealed the direct band gap energy as 2.34 eV. The mixed compounds of GaSe0.75S0.25 were prepared for the first time in a thin film form and the results of the present paper would provide valuable information to research area in which layered compounds have been studied in detail.