Preparation and Characterization of Cdo/In<sub>6< Thin Film Transistors

dc.authoridQasrawi, Atef Fayez/0000-0001-8193-6975
dc.authorscopusid36909456400
dc.authorscopusid6603962677
dc.authorwosidQasrawi, Atef Fayez/R-4409-2019
dc.contributor.authorAlGarni, Sabah E.
dc.contributor.authorQasrawi, A. F.
dc.contributor.otherDepartment of Electrical & Electronics Engineering
dc.date.accessioned2024-07-05T15:40:57Z
dc.date.available2024-07-05T15:40:57Z
dc.date.issued2020
dc.departmentAtılım Universityen_US
dc.department-temp[AlGarni, Sabah E.] King Abdulaziz Univ, Fac Sci Al Faisaliah, Dept Phys, Jeddah, Saudi Arabia; [AlGarni, Sabah E.] Univ Jeddah, Dept Phys, Fac Sci, Jeddah, Saudi Arabia; [Qasrawi, A. F.] Arab Amer Univ, Dept Phys, Jenin, Palestine; [Qasrawi, A. F.] Atilim Univ, Grp Phys, Fac Engn, Ankara, Turkeyen_US
dc.descriptionQasrawi, Atef Fayez/0000-0001-8193-6975en_US
dc.description.abstractIn this study, the design and characterization of CdO/InSe thin film transistors (TFT) that are grown onto Au substrates are investigated. The devices are also subjected to a vacuum annealing process at 300 degrees C to enhance the structure and electrical performance. It was observed that the growth of polycrystalline monoclinic In6Se7 phase of InSe is preferred at this annealing temperature when coated onto Au/CdO substrates. Electrically, noisy negative capacitance effect accompanied with resonance-antiresonance phenomena is observed in the capacitance spectra of the as prepared TFT devices. The annealing of the TFT devices reduced the noise in the capacitance, conductance, impedance, and reflection coefficient and return loss spectral responses. The heat treated TFT devices displayed low bandpass, high bandpass and bandstop filter characteristics in the studied frequency domain (0.01-1.80 GHz) indicating the applicability of these devices as radio wave-microwave resonators.en_US
dc.description.sponsorshipDeanship of Scientific Research (DSR) at King Abdulaziz University, Jeddahen_US
dc.description.sponsorshipThis article was funded by the Deanship of Scientific Research (DSR) at King Abdulaziz University, Jeddah. The authors, therefore, acknowledge with thanks DSR for technical and financial support.en_US
dc.identifier.citationcount3
dc.identifier.doi10.1590/1980-5373-MR-2020-0449
dc.identifier.issn1516-1439
dc.identifier.issn1980-5373
dc.identifier.issue6en_US
dc.identifier.scopus2-s2.0-85097335577
dc.identifier.scopusqualityQ3
dc.identifier.urihttps://doi.org/10.1590/1980-5373-MR-2020-0449
dc.identifier.urihttps://hdl.handle.net/20.500.14411/3401
dc.identifier.volume23en_US
dc.identifier.wosWOS:000605648600001
dc.identifier.wosqualityQ4
dc.institutionauthorQasrawı, Atef Fayez Hasan
dc.language.isoenen_US
dc.publisherUniv Fed Sao Carlos, dept Engenharia Materialsen_US
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanıen_US
dc.rightsinfo:eu-repo/semantics/openAccessen_US
dc.scopus.citedbyCount4
dc.subjectCdO/InSeen_US
dc.subjectannealingen_US
dc.subjectthin film transistoren_US
dc.subjectband filteren_US
dc.titlePreparation and Characterization of Cdo/In<sub>6< Thin Film Transistorsen_US
dc.typeArticleen_US
dc.wos.citedbyCount3
dspace.entity.typePublication
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