Preparation and Characterization of Cdo/In<sub>6< Thin Film Transistors

dc.authorid Qasrawi, Atef Fayez/0000-0001-8193-6975
dc.authorscopusid 36909456400
dc.authorscopusid 6603962677
dc.authorwosid Qasrawi, Atef Fayez/R-4409-2019
dc.contributor.author AlGarni, Sabah E.
dc.contributor.author Qasrawi, A. F.
dc.contributor.other Department of Electrical & Electronics Engineering
dc.date.accessioned 2024-07-05T15:40:57Z
dc.date.available 2024-07-05T15:40:57Z
dc.date.issued 2020
dc.department Atılım University en_US
dc.department-temp [AlGarni, Sabah E.] King Abdulaziz Univ, Fac Sci Al Faisaliah, Dept Phys, Jeddah, Saudi Arabia; [AlGarni, Sabah E.] Univ Jeddah, Dept Phys, Fac Sci, Jeddah, Saudi Arabia; [Qasrawi, A. F.] Arab Amer Univ, Dept Phys, Jenin, Palestine; [Qasrawi, A. F.] Atilim Univ, Grp Phys, Fac Engn, Ankara, Turkey en_US
dc.description Qasrawi, Atef Fayez/0000-0001-8193-6975 en_US
dc.description.abstract In this study, the design and characterization of CdO/InSe thin film transistors (TFT) that are grown onto Au substrates are investigated. The devices are also subjected to a vacuum annealing process at 300 degrees C to enhance the structure and electrical performance. It was observed that the growth of polycrystalline monoclinic In6Se7 phase of InSe is preferred at this annealing temperature when coated onto Au/CdO substrates. Electrically, noisy negative capacitance effect accompanied with resonance-antiresonance phenomena is observed in the capacitance spectra of the as prepared TFT devices. The annealing of the TFT devices reduced the noise in the capacitance, conductance, impedance, and reflection coefficient and return loss spectral responses. The heat treated TFT devices displayed low bandpass, high bandpass and bandstop filter characteristics in the studied frequency domain (0.01-1.80 GHz) indicating the applicability of these devices as radio wave-microwave resonators. en_US
dc.description.sponsorship Deanship of Scientific Research (DSR) at King Abdulaziz University, Jeddah en_US
dc.description.sponsorship This article was funded by the Deanship of Scientific Research (DSR) at King Abdulaziz University, Jeddah. The authors, therefore, acknowledge with thanks DSR for technical and financial support. en_US
dc.identifier.citationcount 3
dc.identifier.doi 10.1590/1980-5373-MR-2020-0449
dc.identifier.issn 1516-1439
dc.identifier.issn 1980-5373
dc.identifier.issue 6 en_US
dc.identifier.scopus 2-s2.0-85097335577
dc.identifier.scopusquality Q3
dc.identifier.uri https://doi.org/10.1590/1980-5373-MR-2020-0449
dc.identifier.uri https://hdl.handle.net/20.500.14411/3401
dc.identifier.volume 23 en_US
dc.identifier.wos WOS:000605648600001
dc.identifier.wosquality Q4
dc.institutionauthor Qasrawı, Atef Fayez Hasan
dc.language.iso en en_US
dc.publisher Univ Fed Sao Carlos, dept Engenharia Materials en_US
dc.relation.publicationcategory Makale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanı en_US
dc.rights info:eu-repo/semantics/openAccess en_US
dc.scopus.citedbyCount 4
dc.subject CdO/InSe en_US
dc.subject annealing en_US
dc.subject thin film transistor en_US
dc.subject band filter en_US
dc.title Preparation and Characterization of Cdo/In<sub>6< Thin Film Transistors en_US
dc.type Article en_US
dc.wos.citedbyCount 3
dspace.entity.type Publication
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relation.isOrgUnitOfPublication.latestForDiscovery c3c9b34a-b165-4cd6-8959-dc25e91e206b

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