Fabrication and Characterization of To/Gase Au) Schottky Diodes

dc.contributor.author Qasrawi, AF
dc.contributor.other Department of Electrical & Electronics Engineering
dc.date.accessioned 2024-07-05T15:09:31Z
dc.date.available 2024-07-05T15:09:31Z
dc.date.issued 2006
dc.description Qasrawi, Atef Fayez/0000-0001-8193-6975 en_US
dc.description.abstract The optical properties of amorphous GaSe thin films deposited onto tin oxide (TO) coated glass substrates are presented for the purpose of using this material for the fabrication of metal-semiconductor devices. Specifically, the room temperature direct allowed and forbidden transition energy band gaps of glass/TO and glass/TO/GaSe films are estimated and found to exhibit values of 3.95 and 1.95 eV, respectively. The temperature dependence of the energy band gap of the glass/TO/GaSe is also studied in the temperature range of 295 - 450 K by means of optical transmittance and reflectance spectra. This study allowed the identification of the rate of change of the band gap with temperature as -5.0 x 10(-4) eV K-1 and the 0 K energy band gap as 2.1 eV. The above reported optical parameters of the glass/TO/GaSe structure seem to be suitable for semiconductor device production such as solar cell converters, metal - insulator - semiconductor (MIS), metal-oxide-semiconductor (MOS), MOSFET, etc devices. As an application, we have used the glass/TO/GaSe substrate for fabricating Schottky diodes using Ag and Au point contacts. The diodes are characterized by measuring the current (I) - voltage (V) characteristics at room temperature. The I - V curves exhibit rectifying properties. The I-V data analysis in the Schottky region (below 1.0 V) revealed barrier heights of 0.60 and 0.73 eV for Ag and Au point contacts, respectively. en_US
dc.identifier.doi 10.1088/0268-1242/21/6/015
dc.identifier.issn 0268-1242
dc.identifier.issn 1361-6641
dc.identifier.scopus 2-s2.0-33646759904
dc.identifier.uri https://doi.org/10.1088/0268-1242/21/6/015
dc.identifier.uri https://hdl.handle.net/20.500.14411/1196
dc.language.iso en en_US
dc.publisher Iop Publishing Ltd en_US
dc.relation.ispartof Semiconductor Science and Technology
dc.rights info:eu-repo/semantics/closedAccess en_US
dc.subject [No Keyword Available] en_US
dc.title Fabrication and Characterization of To/Gase Au) Schottky Diodes en_US
dc.type Article en_US
dspace.entity.type Publication
gdc.author.id Qasrawi, Atef Fayez/0000-0001-8193-6975
gdc.author.institutional Qasrawi, A.F. (6603962677)
gdc.author.scopusid 6603962677
gdc.author.wosid Qasrawi, Atef Fayez/R-4409-2019
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gdc.coar.access metadata only access
gdc.coar.type text::journal::journal article
gdc.collaboration.industrial false
gdc.description.department Atılım University en_US
gdc.description.departmenttemp Atilim Univ, Dept Elect & Elect Engn, TR-06836 Ankara, Turkey en_US
gdc.description.endpage 798 en_US
gdc.description.issue 6 en_US
gdc.description.publicationcategory Makale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanı en_US
gdc.description.scopusquality Q2
gdc.description.startpage 794 en_US
gdc.description.volume 21 en_US
gdc.description.woscitationindex Science Citation Index Expanded
gdc.description.wosquality Q3
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gdc.oaire.sciencefields 0103 physical sciences
gdc.oaire.sciencefields 02 engineering and technology
gdc.oaire.sciencefields 0210 nano-technology
gdc.oaire.sciencefields 01 natural sciences
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gdc.opencitations.count 13
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gdc.virtual.author Qasrawı, Atef Fayez Hasan
gdc.wos.citedcount 11
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