Qasrawı, Atef Fayez Hasan
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Qasrawi, Atef Fayez
Atef Fayez Hasan, Qasrawı
Qasrawı,A.F.H.
Qasrawi,A.F.H.
Q., Atef Fayez Hasan
Q.,Atef Fayez Hasan
Atef Fayez Hasan, Qasrawi
Qasrawi, Atef Fayez Hasan
A.F.H.Qasrawı
A.F.H.Qasrawi
A., Qasrawi
A.,Qasrawı
Qasrawı, Atef Fayez Hasan
Qasrawi, A. F.
Qasrawi,A.F.
Qasrawi, AF
Qasrawi, Atef F.
Qasrawi, Atef A.
Qasrawi, Atef Fayez
Qasrawi, Atef F.
Qasrawi, Atef A.
Qasrawi, Atef
Atef Fayez Hasan, Qasrawı
Qasrawı,A.F.H.
Qasrawi,A.F.H.
Q., Atef Fayez Hasan
Q.,Atef Fayez Hasan
Atef Fayez Hasan, Qasrawi
Qasrawi, Atef Fayez Hasan
A.F.H.Qasrawı
A.F.H.Qasrawi
A., Qasrawi
A.,Qasrawı
Qasrawı, Atef Fayez Hasan
Qasrawi, A. F.
Qasrawi,A.F.
Qasrawi, AF
Qasrawi, Atef F.
Qasrawi, Atef A.
Qasrawi, Atef Fayez
Qasrawi, Atef F.
Qasrawi, Atef A.
Qasrawi, Atef
Job Title
Doçent Doktor
Email Address
atef.qasrawi@atilim.edu.tr
Main Affiliation
Department of Electrical & Electronics Engineering
Status
Former Staff
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WoS Researcher ID
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4QUALITY EDUCATION
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5GENDER EQUALITY
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6CLEAN WATER AND SANITATION
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7AFFORDABLE AND CLEAN ENERGY
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8DECENT WORK AND ECONOMIC GROWTH
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9INDUSTRY, INNOVATION AND INFRASTRUCTURE
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Scholarly Output
226
Articles
222
Views / Downloads
87/0
Supervised MSc Theses
0
Supervised PhD Theses
0
WoS Citation Count
1984
Scopus Citation Count
2000
Patents
0
Projects
0
WoS Citations per Publication
8.78
Scopus Citations per Publication
8.85
Open Access Source
17
Supervised Theses
0
| Journal | Count |
|---|---|
| Crystal Research and Technology | 16 |
| Journal of Electronic Materials | 15 |
| physica status solidi (a) | 12 |
| Materials Science in Semiconductor Processing | 11 |
| Journal of Alloys and Compounds | 11 |
Current Page: 1 / 11
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20 results
Scholarly Output Search Results
Now showing 1 - 10 of 20
Article Citation - WoS: 7Citation - Scopus: 7Plasmon-Electron Dynamics at the Au/Inse and Y/Inse Interfaces Designed as Dual Gigahertz-Terahertz Filters(Elsevier Gmbh, Urban & Fischer verlag, 2017) Alharbi, S. R.; Qasrawi, A. F.In this work, the X-ray diffraction, the Scanning electron microscopy, the energy dispersive X-ray, the Raman, The UV-vis light and the impedance spectral techniques are employed to explore the structural, vibrational, optical and electrical properties of the Au/InSe and Y/InSe thin film interfaces. It was shown that with its amorphous nature of crystallization, the InSe thin films exhibited n-type conductivity due to the 3% excess selenium. For this form of InSe, the only active Raman spectral line is 121 (cm(-1)). In addition to the design of the energy band diagram, the analysis the dielectric spectra and the optical conductivities were possible in the frequency range of 270-1000 THz. The modeling of the optical conductivities of the Au, Y, Au/InSe and Y/InSe with the help of Lorentz approach for optical conduction, assured that the conduction is dominated by the resonant plasmon-electron interactions at the metals and metals/semiconductors interfaces. It also allowed tabulating the necessary parameters for possible applications in terahertz technology: These parameters are the electron effective masses, the free electron densities, the electron bounded plasmon frequencies, the electron scattering times, the reduced resonant frequencies and the drift mobilities. On the other hand, the impedance spectral analysis of the Y/InSe/Au interfaces in the frequency range of 0.01-1.80 GHz, revealed negative capacitance effect associated with band filter features that exhibit maximum transition line at 1.17 GHz. This value nominates the interface as a member of filter classes in the gigahertz technology. (C) 2017 Elsevier GmbH. All rights reserved.Article Citation - WoS: 16Citation - Scopus: 17Dielectric Dispersion in Ga2s3< Thin Films(Springer, 2017) Alharbi, S. R.; Qasrawi, A. F.In this work, the structural, compositional, optical, and dielectric properties of Ga2S3 thin films are investigated by means of X-ray diffraction, scanning electron microscopy, energy dispersion X-ray analysis, and ultraviolet-visible light spectrophotometry. The Ga2S3 thin films which exhibited amorphous nature in its as grown form are observed to be generally composed of 40.7 % Ga and 59.3 % S atomic content. The direct allowed transitions optical energy bandgap is found to be 2.96 eV. On the other hand, the modeling of the dielectric spectra in the frequency range of 270-1,000 THz, using the modified Drude-Lorentz model for electron-plasmon interactions revealed the electrons scattering time as 1.8 (fs), the electron bounded plasma frequency as similar to 0.76-0.94 (GHz) and the reduced resonant frequency as 2.20-4.60 x10(15) (Hz) in the range of 270-753 THz. The corresponding drift mobility of electrons to the terahertz oscillating incident electric field is found to be 7.91 (cm (2)/Vs). The values are promising as they nominate the Ga2S3 thin films as effective candidates in thin-film transistor and gas sensing technologies.Article Citation - WoS: 7Citation - Scopus: 7Design of the Zns/Ge pn Interfaces as Plasmonic, Photovoltaic and Microwave Band Stop Filters(Elsevier Science Bv, 2017) Alharbi, S. R.; Qasrawi, A. F.In the current work, we report and discuss the features of the design of a ZnS (300 nm)/Ge (300 nm)/GaSe (300 nm) thin film device. The device is characterized by the X-ray diffraction, electron microscopy, energy dispersive X-ray spectroscopy (EDS), optical spectroscopy, microwave power spectroscopy and light power dependent photoconductivity. While the X-ray diffraction technique revealed a polycrystalline ZnS coated with two amorphous layers of Ge and GaSe, the hot probe tests revealed the formation of pn interface. The optical spectra which were employed to reveal the conduction and valence band offsets at the ZnS/Ge and Ge/GaSe interface indicated information about the dielectric dispersion at the interface. The dielectric spectra of the ZnS/Ge/GaSe heterojunction which was modeled assuming the domination of surface plasmon interactions through the films revealed a pronounced increase in the drift mobility of free carriers in the three layers compared to the single and double layers. In the scope of the fitting parameters, a wave trap that exhibit filtering properties at notch frequency of 2.30 GHz was designed and tested. The ac signals power spectrum absorption reached similar to 99%. In addition, the photocurrent analysis on the ZnS/Ge/GaSe interface has shown it is suitability for photovoltaic and photosensing applications. (C) 2017 The Authors. Published by Elsevier B.V. This is an open access article under the CC BY-NC-ND licenseArticle Citation - WoS: 9Citation - Scopus: 9Effect of Ytterbium, Gold and Aluminum Transparent Metallic Substrates on the Performance of the Ga2s3< Thin Film Devices(Elsevier Science Bv, 2017) Alharbi, S. R.; Qasrawi, A. F.In the current work, the structural, optical, dielectric and electrical properties of the Ga2S3 thin films which are deposited onto transparent thin Al, Yb and Au metal substrates are characterized by means of transmittance electron microscopy, X-ray diffraction, ultraviolet visible light spectroscopy and impedance spectroscopy techniques. The effects of the metallic substrates on the crystalline nature, energy band gap and dielectric spectra are also investigated. The modeling of the dielectric spectra allowed determining the effect of the Al, Yb and Au thin layers on the electron scattering time, the plasmon frequency, free electron density and drift mobility. In addition, a Yb/Ga2S3/Au Schottky barrier and All Ga2S3/Au back to back Schottky barrier devices (metal-semiconductor-metal (MSM) device) are fabricated and characterized by means of capacitance-voltage characteristics and capacitance and conductance spectra in the frequency range of 10-1800 MHz. While the Schottky barrier device displayed three distinct positions of resonance-antiresonance phenomena, the MSM device displayed one peak with narrow bandwidth of 10 MHz. The MSM devices exhibited an inversion, depletion and accumulation modes within a voltage range of 0.25 V width at 250 MHz. The study indicates the applicability of these device as smart capacitive switches, as Plasmon devices and as wavetraps. (C) 2017 Elsevier B.V. All rights reserved.Article Citation - WoS: 9Citation - Scopus: 9Transient and Steady State Photoelectronic Analysis in Tlinse2 Crystals(Pergamon-elsevier Science Ltd, 2011) Qasrawi, A. F.; Gasanly, N. M.The temperature and illumination effects on the transient and steady state photoconductivities of TlInSe2 crystals have been studied. Namely, two recombination centres located at 234 and at 94 meV and one trap center located at 173 meV were determined from the temperature-dependent steady state and transient photoconductivities, respectively. The illumination dependence of photoconductivity indicated the domination of sublinear and supralinear recombination mechanisms above and below 160 K, respectively. The change in the recombination mechanism is attributed to the exchange of roles between the linear recombination at the surface and trapping centres in the crystal, which become dominant as temperature decreases. The transient photoconductivity measurement allowed the determination of the capture coefficient of traps for holes as 3.11 x 10(-22) cm(-2). (C) 2011 Elsevier Ltd. All rights reserved.Article Citation - WoS: 18Citation - Scopus: 21Engineering the Optical and Dielectric Properties of the Ga2s3< Nanosandwiches Via Indium Layer Thickness(Springer, 2018) Nazzal, Eman O.; Qasrawi, A. F.; Alharbi, S. R.In this study, the effect of the nanosandwiched indium slab thickness (20-200 nm) on the performance of the Ga2S3/In/Ga2S3 interfaces is explored by means of X-ray diffraction, Raman spectroscopy, and optical spectroscopy techniques. The indium slab thickness which was varied in the range of 20-200 nm is observed to enhance the visible light absorbability of the Ga2S3 by 54.6 times, engineered the energy band gap in the range of 3.7-1.4 eV and increases the dielectric constant without, significantly, altering the structure of the Ga2S3. The broad range of the band gap tunability and the increased absorbability nominate the Ga2S3 thin films for photovoltaic applications. In addition, the dielectric spectral analysis and modeling have shown that a wide variety in the plasmon resonant frequency could be established within the Ga2S3/In/Ga2S3 trilayers. The plasmon frequency engineering in the range of 0.56-2.08 GHz which is associated with drift mobility of 12.58-5.76 cm(2)/Vs and electron scattering time at femtosecond level are promising for the production of broad band high frequency microwave filters.Article Citation - WoS: 2Citation - Scopus: 2Mgo/Gase0.5< Heterojunction as Photodiodes and Microwave Resonators(Ieee-inst Electrical Electronics Engineers inc, 2016) Qasrawi, Atef F.; Khanfar, Hazem K.; Gasanly, N. M.In this paper, a multifunctional operating optoelectronic device that suits visible light (VLC) and microwave communication systems is designed and characterized. The device which is composed of p-type MgO and n-type GaSe0.5S0.5 heterojunction is characterized by means of optical absorbance in the incident light energy (E) region of 3.5-1.1 eV, dark and illuminated current (I)-voltage (V) characteristics, and impedance spectra in the frequency range of 1M-1.8 GHz. Four types of lasers which generate light of wavelengths 406, 632, 850, and 1550 nm are used to excite the active region of the device. The device was also illuminated by non-monochromatic light. The incident light power was varied in the range of 1.12-10.17 mu W. It was observed that the heterojunction exhibits an optical energy bandgap (E-g) of 1.85 eV. For laser excitation with E > Eg, the photosensitivity (S) exceeds 67 while it is less than unity for excitations with E < Eg. These behaviors are assigned to the intrinsic and extrinsic nature of absorption, respectively. In addition, S increases as a result of energy barrier height lowering with increasing light power. On the other hand, when the device was excited with ac signal, the capacitance and impedance of the device displayed a resonance-antiresonance property associated with negative differential resistance and very high signal quality factor (10(3)) above 1.37 GHz. The bandwidth of the two resonance-antiresonance peaks is 319 and 12.6 MHz at 1.475 and 1.649 GHz, respectively. These results are attractive for using the heterojunction in VLC and microwave communication technologies.Article Citation - WoS: 5Citation - Scopus: 4Properties of Se/Inse Thin-Film Interface(Springer, 2016) Qasrawi, A. F.; Qasrawı, Atef Fayez Hasan; Kayed, T. S.; Elsayed, Khaled A.; Kayed, Tarek Said; Qasrawı, Atef Fayez Hasan; Kayed, Tarek Said; Department of Electrical & Electronics Engineering; Department of Electrical & Electronics EngineeringSe, InSe, and Se/InSe thin films have been prepared by the physical vapor deposition technique at pressure of similar to 10(-5) torr. The structural, optical, and electrical properties of the films and Se/InSe interface were investigated by means of x-ray diffraction (XRD) analysis, ultraviolet-visible spectroscopy, and current-voltage (I-V) characteristics. XRD analysis indicated that the prepared InSe films were amorphous while the Se films were polycrystalline having hexagonal structure with unit cell parameters of a = 4.3544 and c = 4.9494 . Spectral reflectance and transmittance analysis showed that both Se and InSe films exhibited indirect allowed transitions with energy bandgaps of 1.92 eV and 1.34 eV, respectively. The Se/InSe interface exhibited two energy bandgaps of 0.98 eV and 1.73 eV above and below 2.2 eV, respectively. Dielectric constant values were also calculated from reflectance spectra for the three layers in the frequency range of 500 THz to 272 THz. The dielectric constant exhibited a promising feature suggesting use of the Se/InSe interface as an optical resonator. Moreover, the Au/Se/InSe/Ag heterojunction showed some rectifying properties that could be used in standard optoelectronic devices. The ideality factor and height of the energy barrier to charge carrier motion in this device were found to be 1.72 and 0.66 eV, respectively.Article Citation - WoS: 4Citation - Scopus: 4Effect of Au/Ge Substrate on the Properties of Gase(Elsevier Gmbh, 2018) Qasrawi, A. F.; Abdallah, Maisam M. A.In this work, the effect of glass/Ge and Au/Ge substrate on the structural, optical and electrical properties of the GaSe thin films is investigated by means of X-ray diffraction, ultraviolet-visible light spectrophotometry and impedance spectroscopy techniques, respectively. While the glass/Ge, glass/GaSe and glass/Ge/GaSe are observed to exhibit amorphous nature of structure, the Au/Ge, and Au/Ge/GaSe are of polycrystalline nature. The formation of the Ge/GaSe interface exhibited high conduction band offset of value of 0.90 eV and enhanced the light absorbability of GaSe at 1.47 eV by 80 times. In addition, the modeling of the dielectric spectra for the Ge/GaSe interface revealed optical conductivity parameters presented by scattering time at femtosecond level and improvement of the drift mobility. Moreover, the impedance spectroscopy measurements have shown that with the increasing frequency, the Au/Ge/GaSe/Yb interface exhibit increasing trend of variation in the resistance causing high impedance mode associated with negative capacitance values below 1300 MHz. The effect is completely reversed in the higher range of frequency. These features of the Ge/GaSe interface nominate it as plasmonic interface, microwave cavities and as voltage amplifiers in low power nanoscale devices. (C) 2018 Elsevier GmbH. All rights reserved.Article Citation - WoS: 11Citation - Scopus: 11Post Annealing Effects on the Structural, Compositional, Optical and Dielectric Properties of Cd Doped Gase Thin Films(Elsevier Science Sa, 2015) Al Garni, S. E.; Qasrawi, A. F.In this work, the heat treatment effects at temperatures (T-a) of 200, 300 and 400 degrees C on the compositional, structural, optical and dielectric properties of Cd doped GaSe are explored by means of energy dispersive X-ray spectroscopy, X-ray diffraction and UV-VIS spectrophotometry. The annealing process of the Cd doped GaSe thin films revealed a highly oriented orthorhombic structure type that exhibit a systematic increase in the grain size. While the strain, degree of orientation and dislocation density of the annealed films are weakly affected by the annealing process. The optical energy band gap of the doped films decreased from 1.23 to 0.90 eV and the exponential energy band tails rose from 0.16 to 0.23 eV when the annealing temperature is raised from 300 to 400 degrees C. In addition, the analysis of the dielectric spectral curves which were studied in the frequency range of 270-1500 THz, allowed to investigate the oscillator and dispersion energies and the static (epsilon(s)) and lattice (epsilon(l)) dielectric constants. The annealing process on the doped samples decreased the dispersion and oscillator energies as well as es. Oppositely, el values increased from 12.52 to 24.45 as a result of larger grain size and less defect density associated with annealing process when T-a is raised from 200 to 400 degrees C, respectively. (C) 2015 Elsevier B.V. All rights reserved.

