Browsing by Author "Güllü, Hasan Hüseyin"

Now showing 1 - 20 of 53

Citation Count: 6
Analysis of Double Gaussian Distribution on Barrier Inhomogeneity in a Au/n-4H SiC Schottky Diode
(Springer, 2021) Gullu, H. H.; Sirin, D. Seme; Yildiz, D. E.; Department of Electrical & Electronics Engineering
A n-4H SiC based diode is fabricated by an Au front metal contact to provide rectification at the metal-semiconductor (MS) junction, and a back ohmic contact is also obtained using Au metal with post-thermal heating. MS diode characteristics are investigated by current-voltage (I - V) measurements with a wide range of temperature from 80 K to 300 K. At each temperature, rectifying behavior is achieved and it is improved with an increase in temperature. Barrier height and ideality factor are calculated according to the thermionic emission (TE) model from linearity in the forward bias region of the ln(I) versus V plot. The experimental zero-bias barrier height (Phi(b0)) values are in a good agreement with literature, and at around room temperature the ideality factor (n) reaches unity. At saturation regions in I - V curves, parasitic resistance values are derived by Ohm's law and the series resistance values are also reevaluated by Cheung's relation. Detailed I - V analysis is performed by modifying the TE model with an approximation of low barrier patches embedded in the main barrier height. Two linear relations in the characteristic plots of Phi(b0) and n indicate that double Gaussian distribution is a suitable current conduction model via localized barrier patches at low temperatures. Additionally, reverse bias current flow is analyzed under the dominant effect of Poole-Frenkel emission associated with the interfacial traps. According to the characteristic electric field-dependent current density plot, emission barrier height and relative dielectric constant for n-4H SiC are calculated.
Citation Count: 32
Analysis of forward and reverse biased current-voltage characteristics of Al/Al₂O₃/n-Si Schottky diode with atomic layer deposited Al₂O₃ thin film interlayer
(Springer, 2019) Gullu, H. H.; Yildiz, D. E.; Department of Electrical & Electronics Engineering
The dark current-voltage (I-V) characteristics of Al/Al2O3/n-Si Schottky diode are investigated in a wide temperature range of 260-360 K. The diode shows four orders of magnitude rectification. In forward and reverse bias regions, the temperature-dependent I-Vcharacteristics are detailed in terms of diode parameters and dominant conduction mechanisms. Due to the existence of Al2O3 film layer and series resistance in the diode structure, current flow under the forward bias is observed in a deviation from pure exponential characteristics. The diode parameters are estimated from thermionic emission model with non-unity ideality factor, and this non-ideal behavior is resulted in the ideality factors greater than two. In addition to these values, zero-bias barrier height is found to be strongly temperature dependent, and this variation indicates a presence of inhomogeneties in the barrier according to Gaussian distribution (GD) approximation. This fact is investigated plotting characteristic plot of this model and by extracting mean barrier height with its standard deviation. In order to complete the work on the forward I-V region, the carrier transport characteristics of the diode are explained on the basis of thermionic emission mechanism with a GD of the harrier heights. In accordance with this approximation, the conventional Richardson plot exhibits non-linearity behavior and modified current relation based on GD model is used to calculate mean barrier height and Richardson constant. In addition, the values of parasitic resistances are determined using Ohm's law as a function of temperature for all bias voltage spectra. In the reverse bias region, Poole-Frenkel effect is found to be dominant on the conduction associated with the barrier lowering, and barrier height in the emission process from the trapped states, and high-frequency dielectric constant of Al2O3 film layer is calculated.
Citation Count: 9
Analysis of temperature-dependent forward and leakage conduction mechanisms in organic thin film heterojunction diode with fluorine-based PCBM blend
(Springer, 2020) Yildiz, D. E.; Gullu, H. H.; Toppare, L.; Cirpan, A.; Department of Electrical & Electronics Engineering
The forward and reversed biased current-voltage behaviors of the organic diode were detailed in a wide range of temperatures. In this diode, a donor-acceptor-conjugated copolymer system was constructed with poly((9,9-dioctylfluorene)-2,7-diyl-(2-dodecyl-benzo[1,2,3]triazole)) as a partner of [6,6]-phenyl-C61-butyric acid methyl ester (PCBM). Two-order of magnitude rectification ratio was achieved, and the temperature-dependent values of saturation current, zero-bias barrier height, and ideality factor were extracted according to the thermionic emission model. The temperature responses of these diode parameters showed an existence of inhomogeneity in the barrier height formation. As a result, the observed non-ideal behavior was explained by Gaussian distribution of barrier height where low-barrier regions are effective in the forward biased conduction mechanism at low temperatures. Together with this analysis, series resistances were evaluated using Cheung's functions and also density of interface states were investigated. On the other hand, reverse biased current flow was found under the dominant effect of Poole-Frenkel effects associated with these interfacial traps. The reverse current conduction mechanism was detailed by calculating characteristic field-lowering coefficients and barrier height values in the emission process from the trapped state in the range of temperatures of interest.
Citation Count: 2
Analysis of temperature-dependent transmittance spectra of Zn_0.5In_0.5Se (ZIS) thin films
(Springer, 2019) Isik, M.; Gullu, H. H.; Delice, S.; Gasanly, N. M.; Parlak, M.; Department of Electrical & Electronics Engineering
Temperature-dependent transmission experiments of ZnInSe thin films deposited by thermal evaporation method were performed in the spectral range of 550-950nm and in temperature range of 10-300K. Transmission spectra shifted towards higher wavelengths (lower energies) with increasing temperature. Transmission data were analyzed using Tauc relation and derivative spectroscopy. Analysis with Tauc relation was resulted in three different energy levels for the room temperature band gap values of material as 1.594, 1.735 and 1.830eV. The spectrum of first wavelength derivative of transmittance exhibited two maxima positions at 1.632 and 1.814eV and one minima around 1.741eV. The determined energies from both methods were in good agreement with each other. The presence of three band gap energy levels were associated to valence band splitting due to crystal-field and spin-orbit splitting. Temperature dependence of the band gap energies were also analyzed using Varshni relation and gap energy value at absolute zero and the rate of change of gap energy with temperature were determined.
Citation Count: 0
Annealing Effect on Dark Electrical Conductivity and Photoconductivity of Ga-In-Se Thin Films
(Polish Acad Sciences inst Physics, 2018) Isik, M.; Gullu, H. H.; Department of Electrical & Electronics Engineering
Dark-conductivity and photoconductivity properties of thermally evaporated Ga-In-Se (GIS) thin films were investigated in the temperature range of 80-430 K. All measurements were performed on as-grown and annealed GIS thin films at 300 and 400 degrees C to get information about the effect of the annealing temperature on the conductivity properties. Room temperature conductivity was obtained as 1.8 x 10(-8) Omega(-1) cm(-1) for as-grown films and increased to 3.6 x 10(-4) Omega(-1) cm(-1) for annealed films at 400 degrees C. Analysis of the dark-conductivity data of as-grown films revealed nearly intrinsic type of conductivity with 1.70 eV band gap energy. Temperature dependent dark conductivity curves exhibited two regions in the 260-360 and 370-430 K for both of annealed GIS films. Conductivity activation energies were found as 0.05, 0.16 and 0.05, 0.56 eV for films annealed at temperatures of 300 and 400 degrees C, respectively. The dependence of photoconductivity on illumination intensity was also studied in the range from 17 to 113 mW/cm(2).
Citation Count: 26
Capacitance, conductance, and dielectric characteristics of Al/TiO₂/Si diode
(Springer, 2021) Gullu, H. H.; Yildiz, D. E.; Department of Electrical & Electronics Engineering
In this study, electrical properties of the Al/TiO2/p-Si diode structure with an atomic layer deposited TiO2 interface layer are investigated by current-voltage (I-V), capacitance-voltage (C - V), and conductance-voltage (G - V) measurements. It shows a rectifying behavior with about four order of rectification factor, and barrier height and ideality factor are calculated from the rectification curve. Dielectric parameters are determined from frequency-dependent C - V and G - V relations. The experimental results show that both of these curves are in a strong response to the frequency and bias voltage. They are found in decreasing behavior with increasing frequency, and both of them increase with increase in bias voltage although there are different increasing trends. At reversed bias voltage region, barrier potential, Fermi level energy, and interface charge carrier contribution are evaluated by using 1/C-2 - V plot. Series resistance values are also calculated under the variation of frequency and voltage. Thus, the capacitive characteristics of the diode are corrected by eliminating series resistance contribution together with the possible effect on interface charge carriers. Detailed information is obtained by determining electronic parameters affected by interface states over a wide frequency range (1 kHz to 1 MHz). At this point, strong response to the frequency is observed for the dielectric constant. Under the effect of interfacial polarization at low-frequency region, interface charge contribution to the capacitive response of the diode is obtained. Further analysis is performed on electrical modulus and impedance values derived from experimental dielectric data. Existence of interfacial layer capacitance is detailed by extracting distribution of interface charges from capacitance and conductance profiles of the diode under the effect of frequency.
Citation Count: 51
CaXH₃ (X = Mn, Fe, Co) perovskite-type hydrides for hydrogen storage applications
(Wiley, 2020) Surucu, Gokhan; Gencer, Aysenur; Candan, Abdullah; Gullu, Hasan H.; Isik, Mehmet; Department of Electrical & Electronics Engineering
Hydrogen storage is one of the attractive research interests in recent years due to the advantages of hydrogen to be used as energy source. The studies on hydrogen storage applications focus mainly on investigation of hydrogen storage capabilities of newly introduced compounds. The present paper aims at characterization of CaXH3 (X: Mn, Fe, or Co) perovskite-type hydrides for the first time to understand their potential contribution to the hydrogen storage applications. CaXH3 compounds have been investigated by density functional theory studies to reveal their various characteristics and hydrogen storage properties. CaXH3 compounds have been optimized in cubic crystal structure and the lattice constants of studied compounds have been obtained as 3.60, 3.50, and 3.48 angstrom for X: Mn, Fe, and Co compounds, respectively. The optimized structures have negative formation enthalpies pointing out that studied compounds are thermodynamically stable and could be synthesized experimentally. The gravimetric hydrogen storage densities of X: Mn, Fe, and Co compounds were found in as 3.09, 3.06, and 2.97 wt%, respectively. The revealed values for hydrogen storage densities indicate that CaXH3 compounds may be potential candidates for hydrogen storage applications. Moreover, various mechanical parameters of interest compounds like elastic constants, bulk modulus, and Poisson's ratio have been reported throughout the study. These compounds were found mechanically stable with satisfying Born stability criteria. Further analyses based on Cauchy pressure and Pugh criterion, showed that they have brittleness nature and relatively hard materials. In addition, the electronic characteristics, band structures, and associated partial density of states of CaXH3 hydrides have been revealed. The dynamic stability behavior of them was verified based on the phonon dispersion curves.
Citation Count: 6
Construction of self-assembled vertical nanoflakes on CZTSSe thin films
(Iop Publishing Ltd, 2019) Terlemezoglu, M.; Surucu, O. Bayrakli; Colakoglu, T.; Abak, M. K.; Gullu, H. H.; Ercelebi, C.; Parlak, M.; Electrical-Electronics Engineering; Department of Electrical & Electronics Engineering
Cu2ZnSn(S, Se)(4) (CZTSSe) is a promising alternative absorber material to achieve high power conversion efficiencies, besides its property of involving low-cost and earth-abundant elements when compared to Cu(In, Ga) Se-2 (CIGS) and cadmium telluride (CdTe), to be used in solar cell technology. In this study, a novel fabrication technique was developed by utilizing RF sputtering deposition of CZTSSe thin films having a surface decorated with self-assembled nanoflakes. The formation of nanoflakes was investigated by detailed spectroscopic method of analysis in the effect of each stacked layer deposition in an optimized sequence and the size of nanoflakes by an accurate control of sputtering process including film thickness. Moreover, the effects of substrate temperature on the formation of nanoflakes on the film surface were discussed at a fixed deposition route. One of the main advantages arising from the film surface with self-assembled nanoflakes is the efficient light trapping which decreases the surface reflectance. As a result of the detailed production and characterization studies, it was observed that there was a possibility of repeatable and controllable fabrication sequence for the preparation of CZTSSe thin films with self-textured surfaces yielding low surface reflectance.
Citation Count: 0
$CuInSe_2$ ve $CuGaSe_2$ İnce Filmlerin Özellikleri Üzerine Karşılaştırmalı Çalışma
(2019) Candan, İdris; Güllü, Hasan Hüseyin; Department of Electrical & Electronics Engineering
Cu(In1-xGax)Se2 (CIGS) yarıiletken ince filmlerin iki kenar noktası olan x=0 ($CuInSe_2$) ve x=1 ($CuGaSe_2$) ince filmleri, Cu, InSe ve GaSe hedeflerden saçtırma yöntemi ile 250 oC sıcaklıkta soda lime cam alttaşlar üzerine kaplandı. In ve Ga oranı ve üretim sonrası ısıl işlemin CuInSe2 (CIS) ve CuGaSe2 (CGS) ince filmlerin özellikleri üzerine etkileri araştırıldı. Üretilmiş filmlerin yapısal özelliklerini incelemek için X-ışını kırınımı (XRD) ve örneklerin bileşenleri enerji dağılımlı X-ışını kırınımı analizi (EDXA) yöntemi kullanılarak analiz edildi. İnce film örneklerinin Raman aktif modlarının tayini için oda sıcaklığında Raman spektroskopi ölçümleri yapıldı. 400 oC sıcaklıkta ısıl işlem uygulanmış CIS ve CGS ince film örneklerinin en aktif modları (A1 modu) en yoğun çizgilerin sırayla 178 cm^{-1} ve 185 $cm^{-1}$ olduğu gözlendi. Bu mod kalkopirit yapıların Raman spektroskopisinde gözlemlenen en güçlü moddur. Isıl işlem uygulanmamış ve 350 oC’ta ısıl işlem uygulanmış CGS örneklerinde 486 $cm^{-1}$ çizgisi gözlenmiş olmasına rağmen bu çizginin yoğunluğu artan ısıl işlem sıcaklığı ile ters orantılı olarak azaldığı ve 400 oC uygulanan ısıl işlem sonrası tamamen yok olduğu gözlenmiştir. Üretilen CIS ve CGS ince filmlerin optik geçirgenlik ölçümleri sonucunda ısıl işlem uygulanmayan filmler ve at 400 oC sıcaklıkta ısıl işlem uygulanan filmler için optik bant aralıklarındaki değişim değerleri CIS için 1.28 eV ile 1.45 eV, CGS için 1.68 eV ile 1.75 eV aralıklarında değiştiği hesaplandı. Numunelerin oda sıcaklığındaki elektriksel iletkenlikleri ısıl işlem öncesi ve 400 oC ısıl işlem sonrasında n-CIS için sırayla 8.6x$10^{-3}$ ve 13.6x$10^{-2}$ $\\;{(Ω.cm)}^{-1}$ , p-CGS için sırayla 1.6 and 1.9 $\\;{(Ω.cm)}^{-1}$ olarak ölçüldü.
Citation Count: 9
CZTSSe thin films fabricated by single step deposition for superstrate solar cell applications
(Springer, 2019) Terlemezoglu, M.; Surucu, O. Bayrakli; Dogru, C.; Gullu, H. H.; Ciftpinar, E. H.; Ercelebi, C.; Parlak, M.; Electrical-Electronics Engineering; Department of Electrical & Electronics Engineering
The focus of this study is the characterization of Cu2ZnSn(S,Se)(4) (CZTSSe) thin films and fabrication of CZTSSe solar cell in superstrate configuration. In this work, superstrate-type configuration of glass/ITO/CdS/CZTSSe/Au was entirely fabricated by totally vacuum-based process. CZTSSe absorber layers were grown by RF magnetron sputtering technique using stacked layer procedure. SnS, CuSe and ZnSe solid targets were used as precursors and no additional step like the selenization process was applied. The structural and morphological properties of deposited CZTSSe layers were analyzed using X-ray diffraction (XRD), Raman scattering, scanning electron microscopy (SEM) and energy dispersive X-ray spectroscopy analysis (EDS) measurements. The optical and electrical properties of the CZTSSe thin films were investigated by UV-Vis spectroscopy, Hall-Effect and photoconductivity measurements. In addition, the device performance of the fabricated superstrate solar cell was examined.
Citation Count: 28
Dark and illuminated electrical characteristics of Si-based photodiode interlayered with CuCo₅S₈ nanocrystals
(Springer, 2020) Yildiz, D. E.; Gullu, H. H.; Sarilmaz, A.; Ozel, F.; Kocyigit, A.; Yildirim, M.; Department of Electrical & Electronics Engineering
Derived from the traditional dichalcogenide CuS structure, ternary transition metal chalcogenide nanoparticles in the form of CuCo5S8 are investigated under the aim of photodiode application. In addition to the detailed analysis on material characteristics of CuCo5S8 thin-film layer, the work is focused on the electrical characteristics of Au/CuCo5S8/Si diode to investigate its current-voltage, capacitance-voltage, and conductance-voltage characteristics under dark and illuminated conditions. CuCo5S8 nanocrystals with an average size of 5 nm are obtained using hot-injection method, and they are used to form thin-film interfacial layer between metal (Au) and semiconductor (Si). Under dark conditions, the diodes show about four orders in magnitude rectification rate and diode illumination results in efficient rectification with increase in intensity. The analysis of current-voltage curve results in non-ideal diode characteristics according to the thermionic emission model due to the existence of series resistances and interface states with interface layer. The measured current-voltage values are used to extract the main diode parameters under dark and illumination conditions. Under illumination, photogenerated carriers contribute to the current flow and linear photoconductivity behavior in photocurrent measurements with illumination shows the possible use of CuCo5S8 layer in Si-based photodiodes. This characteristic is also observed from the typical on/off illumination switching behavior for the photodiodes in transient photocurrent, photocapacitance, and photoconductance measurements with a quick response to the illumination. The deviations from ideality are also discussed by means of distribution of interface states and series resistance depending on the applied frequency and bias voltage.
Citation Count: 0
Deposition and Characterization of ZnSnSe2 Thin-Films Deposited by Using Sintered Stoichiometric Powder
(2019) Sürücü, Özge Bayraklı; Güllü, Hasan Hüseyin; Department of Electrical & Electronics Engineering
In this work, ZnSnSe2 (ZTSe) thin films were deposited using crystalline powder grown by vertical Bridgman-Stockbarger technique. The deposition process was carried out by means of e-beam evaporation on the well-cleaned soda lime glass substrates and keeping them at the substrate temperature of 200°C. The structural, optical and electrical properties of ternary ZTSe thin films were investigated depending on the annealing temperature at 250 and 300°C. X-ray diffraction analysis showed that as-grown films were in amorphous structure, however annealing at 250°C triggered the crystallization on the preferred ternary structure and annealing at 300°C resulted in the changes from amorphous to the polycrystalline structure. Using the compositional analysis, the detail information about the stoichiometry and the segregation mechanisms of the constituent elements in the structure were determined for both as-grown and annealed samples. In addition, they were morphologically characterized using scanning electron microscopy technique. The electrical properties were analyzed using temperature dependent dark- and photo-conductivity measurements. From the variation of electrical conductivity as a function of the ambient temperature, the current transport mechanisms and corresponding activation energies at specific temperature intervals for each sample were determined. The optical properties for the ZTSe thin films were studied depending on the structural changes with annealing.
Citation Count: 1
Deposition and Characterization of ZnSnSe₂ Thin-Films Deposited by Using Sintered Stoichiometric Powder
(Gazi Univ, 2019) Bayrakli Surucu, Ozge; Gullu, Hasan Huseyin; Electrical-Electronics Engineering; Department of Electrical & Electronics Engineering
In this work, ZnSnSe2 (ZTSe) thin films were deposited using crystalline powder grown by vertical Bridgman-Stockbarger technique. The deposition process was carried out by means of e-beam evaporation on the well-cleaned soda lime glass substrates and keeping them at the substrate temperature of 200 degrees C. The structural, optical and electrical properties of ternary ZTSe thin films were investigated depending on the annealing temperature at 250 and 300 degrees C. X-ray diffraction analysis showed that as-grown films were in amorphous structure, however annealing at 250 degrees C triggered the crystallization on the preferred ternary structure and annealing at 300 degrees C resulted in the changes from amorphous to the polycrystalline structure. Using the compositional analysis, the detail information about the stoichiometry and the segregation mechanisms of the constituent elements in the structure were determined for both as-grown and annealed samples. In addition, they were morphologically characterized using scanning electron microscopy technique. The electrical properties were analyzed using temperature dependent dark- and photo-conductivity measurements. From the variation of electrical conductivity as a function of the ambient temperature, the current transport mechanisms and corresponding activation energies at specific temperature intervals for each sample were determined. The optical properties for the ZTSe thin films were studied depending on the structural changes with annealing.
Citation Count: 21
Determination of current transport characteristics in Au-Cu/CuO/n-Si Schottky diodes
(Elsevier, 2019) Surucu, O. Bayrakli; Gullu, H. H.; Terlemezoglu, M.; Yildiz, D. E.; Parlak, M.; Electrical-Electronics Engineering; Department of Electrical & Electronics Engineering
In this study, the material properties of CuO thin films fabricated by sputtering technique and electrical properties of CuO/n-Si structure were reported. Temperature-dependent current-voltage (I-V) measurement was carried out to determine the detail electrical characteristics of this structure. The anomaly in thermionic emission (TE) model related to barrier height inhomogeneity at the interface was obtained from the forward bias I-V analysis. The current transport mechanism at the junction was determined under the assumption of TE with Gaussian distribution of barrier height. In this analysis, standard deviation and mean zero bias barrier height were evaluated as 0.176 and 1.48 eV, respectively. Depending on the change in the diode parameters with temperature, Richardson constant was recalculated as 110.20 Acm(-2)K(-2) with the help of modified Richardson plot. In addition, density of states at the interface were determined by using the forward bias I-V results.
Citation Count: 5
Effect of TiO₂ Thin Film with Different Dopants in Bringing Au-Metal into a Contact with n-Si
(Springer, 2022) Yildiz, D. E.; Gullu, H. H.; Cavus, H. Kanbur; Department of Electrical & Electronics Engineering
In this work, effects of TiO2 contribution together with two different doping as graphene oxide (GO) and rubidium fluoride (RbF) are investigated at the interface of Au/n-Si metal-semiconductor (MS) diode. Diode characteristics are mainly evaluated from current-voltage measurements and values of barrier height and ideality factor are compared to the diodes with and without doping in interface layer. Although existence of interface layer increases these values, there is a decrease with adapting GO and RbF to the TiO2 structure. In addition, series and shunt resistance values are calculated with interface layer, and resistance effect is also discussed by Norde's and Cheung's functions. Forward biased carrier transport mechanism is evaluated under the presence of interface states by thermionic emission model and density of interface trap states is also discussed. At the reverse biased region, field effected thermionic emission model is found to be dominant flow mechanism, and leakage current behavior is explained by Schottky effect. Solar simulator with different illumination intensities is used to investigate photo-generated carrier contribution and photo-response of the diodes.
Citation Count: 7
Effects of Si nanowire on the device properties of n-ZnSe/p-Si heterostructure
(Springer, 2019) Coskun, E.; Gullu, H. H.; Colakoglu, T.; Emir, C.; Bozdogan, E.; Parlak, M.; Department of Electrical & Electronics Engineering
The semiconductor nanowire (NW) technology has raised attention owing to its one-dimensional geometry as a solution for lattice mismatch in the fabricated heterostructures. Although, SiNWs have been investigated for various device technologies, there is no published work on the p-n junction formed by deposition of ZnSe thin film on these NW structures, in which this film layer has significant optical and electrical properties in optoelectronics applications. The aim of this study is determining the device properties of n-ZnSe/SiNW heterojunction and obtaining the enhancement in the device application of the NW structure on Si surface with comparing to planar surface. SiNW was produced by metal assisted etching method as a cost-efficient process, and the ZnSe film was deposited on SiNW and planar Si substrates by thermal evaporation of elemental sources. The optical band gap of the deposited ZnSe film was determined as 2.7eV which is in a good agreement with literature. The ideality factor and series resistance values of the ZnSe/SiNW and ZnSe/Si heterojunctions were calculated as 3.12, 461 , and 4.52, 7.26x103, respectively. As a result of utilizing SiNW structure, a spectacular improvement in terms of the physical parameters related to device properties was achieved.
Citation Count: 14
Electrical characteristics of organic heterojunction with an alternating benzotriazole and fluorene containing copolymer
(Springer, 2020) Gullu, H. H.; Yildiz, D. E.; Toppare, L.; Cirpan, A.; Department of Electrical & Electronics Engineering
The current-voltage (I - V) and capacitance-voltage (C - V) characteristics of the organic heterojunction diode were investigated in a wide temperature range from 80 to 320 K and frequency range from 10 kHz to 1 MHz, respectively. Alternative to the copolymer partner poly(3-hexylthiophene) (P3HT) to [6,6]phenyl-C61-butyric acid methyl ester (PCBM), poly((9,9-dioctylfluorene)-2,7diyl-(4,7-bis(thien-2-yl)-2-dodecyl-benzo[1,2,3]triazole)) (named as copolymer in this work) was adapted to the bulk-heterojunction layer in the organic diode. Together with the use of Lif/Al bilayer electrode, the diode was fabricated as in the form of Al/LiF/copolymer:PCBM/PEDOT:PSS/ITO/glass. Under the applied bias voltage, this organic-based diode shows two- orders of magnitude rectifying behavior. According to thermionic emission (TE) model, the diode parameters such as saturation current, barrier height and ideality factor were determined and parasitic resistances were also extracted from the conventional ohmic relation. As to the temperature dependency of the diode parameters and their response to the temperature variation, barrier inhomogeneity, surface state and series resistance effects were found in dominant behavior on the current flow. The conduction mechanism was modeled by assuming low-barrier patches around the main barrier that supports TE at low temperatures and their distribution was expressed by a Gaussian function. In addition, series resistance values were detailed depending on temperature using Cheung's model. C - V analysis was performed to evaluate the distribution of surface states at the interface as a function of frequency. Based on the C - V plots, the effects of charges at these traps were observed especially at low frequencies. Additionally, from these results, Fermi level, surface potential and donor concentration values were evaluated in a wide frequency range.
Citation Count: 10
Electrical characterization of CdZnTe/Si diode structure
(Springer Heidelberg, 2020) Balbasi, C. Dogru; Terlemezoglu, M.; Gullu, H. H.; Yildiz, D. E.; Parlak, M.; Department of Electrical & Electronics Engineering
Temperature-dependent current-voltage (I - V), and frequency dependent capacitance-voltage (C - V) and conductance-voltage (G - V) measurements were performed in order to analyze characteristics of CdZnTe/Si structure. Obtained profiles enable us to understand the different characteristics of the diode structure such as the carrier conduction mechanism and the nature of the interfacial layer. Over the temperature range between 220 and 340 K, taking consideration of the disparity in the forward-biased current, the diode parameters such as saturation current (I-0), zero-bias barrier height (Phi(B0)) and ideality factor (n) have been obtained. The barrier height increased (0.53 to 0.80 eV) while the ideality factor decreased (4.63 to 2.79) with increasing temperature from 220 to 340 K, indicating an improvement in the junction characteristics at high temperatures. Due to the inhomogeneity in barrier height, the conduction mechanism was investigated by Gaussian distribution analysis. Hence, the mean zero-bias barrier height ((Phi) over bar (B0)) and zero-bias standard deviation (sigma(0)) were calculated as 1.31 eV and 0.18, respectively. Moreover, for holes in p-type Si, Richardson constant was found to be 32.09 A cm(-2) K-2 via modified Richardson plot. Using the capacitance-voltage (C - V) and conductance-voltage (G - V) characteristics, series resistance (R-s) and density of interfacial traps (D-it) have been also investigated in detail. A decreasing trend for R-s and D-it profiles with increasing frequency was observed due to the impurities at the CdZnTe/Si interface and interfacial layer between the front metal contact and CdZnTe film.
Citation Count: 2
Electrical Characterization of ZnInSe₂/Cu_0.5Ag_0.5InSe₂ Thin-Film Heterojunction
(Springer, 2019) Gullu, H. H.; Parlak, M.; Department of Electrical & Electronics Engineering
ZnInSe2/Cu0.5Ag0.5InSe2 diode structures have been fabricated by thermal evaporation of stacked layers on indium tin oxide-coated glass substrates. Temperature-dependent dark current-voltage measurements were carried out to extract the diode parameters and to determine the dominant conduction mechanisms in the forward- and reverse-bias regions. The heterostructure showed three order of magnitude rectifying behavior with a barrier height of 0.72 eV and ideality factor of 2.16 at room temperature. In the high forward-bias region, the series and shunt resistances were calculated with the help of parasitic resistance relations, yielding room-temperature values of 9.54 x 10(2) Omega cm(2) and 1.23 x 10(3) Omega cm(2), respectively. According to the analysis of the current flow in the forward-bias region, abnormal thermionic emission due to the variation of the ideality factor with temperature and space-charge-limited current processes were determined to be the dominant conduction mechanisms in this heterostructure. In the reverse-bias region, the tunneling mechanism was found to be effective in the leakage current flow with trap density of 10(6) cm(-3). Spectral photocurrent measurements were carried out to investigate the spectral working range of the device structure. The main photocurrent peaks observed in the spectrum corresponded to the band-edge values of the active thin-film layers.
Citation Count: 62
Electrical properties of Al/PCBM:ZnO/p-Si heterojunction for photodiode application
(Elsevier Science Sa, 2020) Gullu, H. H.; Yildiz, D. E.; Kocyigit, A.; Yildirim, M.; Department of Electrical & Electronics Engineering
In this paper, the electrical characteristics of spin-coated PCBM:ZnO interlayered Al/PCBM:ZnO/Si diode are investigated under the aim of photodiode application. Under dark condition, the diode shows about four orders in magnitude rectification rate and diode illumination results in efficient rectification with increase in intensity. The analysis of current-voltage curve results a non-ideal diode characteristics according to the thermionic emission model due to the existence of parasitic resistances and interface states. The measured current-voltage values are used to extract the barrier height and ideality factor under dark and illumination conditions. Under illumination, photo-generated carriers contribute to the current flow and linear photo-conductivity behavior in photo-current measurements with illumination shows the possible use of hybrid PCBM:ZnO layer in Si-based photodiodes. In addition, change in the series and shunt resistance values under illumination is found to be effective in this light-sensing behavior of the diode. This characteristic is also observed from the typical on/off illumination switching behavior for the photodiodes in transient photo-current, photo-capacitance and photo-conductance measurements with the quick response to the illumination. The deviations from ideality are also discussed by means of distribution of interface states and series resistance depending on the applied frequency and bias voltage. (C) 2020 Elsevier B.V. All rights reserved.