Moo İnce Filmlerin Üretimi ve Karakterizasyonu
Loading...
Date
2020
Authors
Journal Title
Journal ISSN
Volume Title
Publisher
Open Access Color
OpenAIRE Downloads
OpenAIRE Views
Abstract
Bu tezde, deneysel çalışmalar MoO ince filmlerinin üretimi ve karakterizasyonu üzerine yoğunlaştı. Bu nedenle, kompozisyon stokiyometrisini sağlayan ince film örnekleri DC magnetron saçtırma metodu kullanarak üretildi. Saçtırma sürelerine bağlı olarak iki farklı örnek seti hazırlandı. DC gücü 100 W olarak sabitlenerek üretimde birikme oranı kontrol altına alındı ve üretim süresi 30 ve 60 dakika olarak belirlendi. Ayrıca, alttaş sıcaklığının etkileri de araştırıldı. Her örnek seti için, üretim sırasında oda sıcaklığı ile 300°C arasında farklı alttaş sıcaklıkları uygulanarak dört faklı örnek elde edildi. Böylece, üretim zamanı ve altaş sıcaklığı farklılıklarına bağlı olarak, örneklerin yapısal, yüzey, optik ve elektriksel karakteristikleri değerlendirildi.
In this thesis, the experimental work was focused on growth and characterization of MoO thin films. Therefore, thin film samples in the compositional stoichiometry were deposited using DC magnetron sputtering method. Two sets of samples depending on their sputtering times were obtained. Keeping DC power at 100 W that allows to get a fixed deposition ratio, timing was arranged as 30 and 60 minutes. In addition, the effects of substrate temperature were investigated. For each set, four different samples due to their substrate temperatures, in between the room temperature and 300°C, during the sputtering process were prepared. Thus, structural, surface, optical and electrical characteristics of these samples depending on deposition time and the variation in substrate temperature were evaluated.
In this thesis, the experimental work was focused on growth and characterization of MoO thin films. Therefore, thin film samples in the compositional stoichiometry were deposited using DC magnetron sputtering method. Two sets of samples depending on their sputtering times were obtained. Keeping DC power at 100 W that allows to get a fixed deposition ratio, timing was arranged as 30 and 60 minutes. In addition, the effects of substrate temperature were investigated. For each set, four different samples due to their substrate temperatures, in between the room temperature and 300°C, during the sputtering process were prepared. Thus, structural, surface, optical and electrical characteristics of these samples depending on deposition time and the variation in substrate temperature were evaluated.
Description
Keywords
Fizik ve Fizik Mühendisliği, Physics and Physics Engineering, Yarı iletken ince filmler, Semiconductor thin films
Turkish CoHE Thesis Center URL
Fields of Science
Citation
WoS Q
Scopus Q
Source
Volume
Issue
Start Page
0
End Page
55