Ronganakis, Rengin Peköz

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Profile URL
https://hdl.handle.net/20.500.14411/8342
Name Variants
R.,Rengin Peköz
R.P.Ronganakis
R., Ronganakis
R.,Rengin Pekoz
R.,Ronganakis
Ronganakis, Rengin Peköz
Ronganakis,R.P.
R., Rengin Pekoz
Rengin Pekoz, Ronganakis
Ronganakis, Rengin Pekoz
Rengin Peköz, Ronganakis
Pekoz, Rengin
Pekoz, R.
Job Title
Doçent Doktor
Email Address
rengin.pekoz@atilim.edu.tr
Main Affiliation
Department of Electrical & Electronics Engineering
Status
Former Staff
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ORCID ID
Scopus Author ID
Turkish CoHE Profile ID
Google Scholar ID
WoS Researcher ID

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Scholarly Output

7

Articles

7

Views / Downloads

1/0

Supervised MSc Theses

0

Supervised PhD Theses

0

WoS Citation Count

134

Scopus Citation Count

37

WoS h-index

4

Scopus h-index

2

Patents

0

Projects

0

WoS Citations per Publication

19.14

Scopus Citations per Publication

5.29

Open Access Source

4

Supervised Theses

0

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JournalCount
ACS Omega1
Computational Materials Science1
International Journal of Modern Physics B1
Physical Chemistry Chemical Physics1
Surface Science1
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2017 - 20182
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Author: Durgun, Engin

Scholarly Output Search Results

Now showing 1 - 2 of 2
  • Thumbnail Image
    Article
    Citation - WoS: 58
    Two-Dimensional Fluorinated Boron Sheets: Mechanical, Electronic, and Thermal Properties
    (Amer Chemical Soc, 2018) Pekoz, Rengin; Konuk, Mine; Kilic, M. Emin; Durgun, Engin
    The synthesis of atomically thin boron sheets on a silver substrate opened a new area in the field of two-dimensional systems. Similar to hydrogenated and halogenated graphene, the uniform coating of borophene with fluorine atoms can lead to new derivatives of borophene with novel properties. In this respect, we explore the possible structures of fluorinated borophene for varying levels of coverage (BnF) by using first-principles methods. Following the structural optimizations, phonon spectrum analysis and ab initio molecular dynamics simulations are performed to reveal the stability of the obtained structures. Our results indicate that while fully fluorinated borophene (BF) cannot be obtained, stable configurations with lower coverage levels (B4F and B2F) can be attained. Unveiling the stable structures, we explore the mechanical, electronic, and thermal properties of (BnF). Fluorination significantly alters the mechanical properties of the system, and remarkable results, including direction-dependent variation of Young's modulus and a switch from a negative to positive Poisson's ratio, are obtained. However, the metallic character is preserved for low coverage levels, and metal to semiconductor transition is obtained for B2F. The heat capacity at a low temperature increases with an increasing F atom amount but converges to the same limiting value at high temperatures. The enhanced stability and unique properties of fluorinated borophene make it a promising material for various high-technology applications in reduced dimensions.
  • Thumbnail Image
    Article
    Citation - WoS: 32
    Citation - Scopus: 33
    The Interaction of Halogen Atoms and Molecules With Borophene
    (Royal Soc Chemistry, 2017) Khanifaev, Jamoliddin; Pekoz, Rengin; Konuk, Mine; Durgun, Engin
    The realization of buckled monolayer sheets of boron (i.e., borophene) and its other polymorphs has attracted significant interest in the field of two-dimensional systems. Motivated by borophene's tendency to donate electrons, we analyzed the interaction of single halogen atoms (F, Cl, Br, I) with borophene. The possible adsorption sites are tested and the top of the boron atom is found as the ground state configuration. The nature of bonding and strong chemical interaction is revealed by using projected density of states and charge difference analysis. The migration of single halogen atoms on the surface of borophene is analyzed and high diffusion barriers that decrease with atomic size are obtained. The metallicity of borophene is preserved upon adsorption but anisotropy in electrical conductivity is altered. The variation of adsorption and formation energy, interatomic distance, charge transfer, diffusion barriers, and bonding character with the type of halogen atom are explored and trends are revealed. Lastly, the adsorption of halogen molecules (F-2, Cl-2, Br-2, I-2), including the possibility of dissociation, is studied. The obtained results are not only substantial for fundamental understanding of halogenated derivatives of borophene, but also are useful for near future technological applications.