Structural and Electrical Performance of Moo<sub>3</Sub> Films Designed as Microwave Resonators

dc.contributor.author Al Garni, S. E.
dc.contributor.author Qasrawi, A. F.
dc.contributor.author Alharbi, S. R.
dc.contributor.other Department of Electrical & Electronics Engineering
dc.contributor.other Department of Electrical & Electronics Engineering
dc.contributor.other 15. Graduate School of Natural and Applied Sciences
dc.contributor.other 01. Atılım University
dc.date.accessioned 2024-10-06T10:58:37Z
dc.date.available 2024-10-06T10:58:37Z
dc.date.issued 2020
dc.description Qasrawi, A. F./0000-0001-8193-6975 en_US
dc.description.abstract In this work, the effect of the insertion of lithium slabs of thicknesses of 50 nm between stacked layers of MoO3 is considered. Stacked layers of MoO3 comprising lithium slabs are prepared by the thermal evaporation technique onto Au substrates under vacuum pressure of 10(-5) mbar. The effects of Li slabs are explored by the X-ray diffraction, scanning electron microscopy, current-voltage characteristics and impedance spectroscopy techniques in the frequency domain of 0.01-1.80 GHz. While the presence of Li slabs did not alter the amorphous nature of structure, it forced the growth of rod-like grains of diameters of 100-160 nm and lengths of 1.5 mu m. Electrically, the presence of Li in the samples enhanced the rectifying properties of the devices and force reverse to forward current ratios larger than 60 times. Li slabs also controlled the negative capacitance effect and resonance -antiresonance regions in the Au/MoO3/MoO3/C stacked layers. While the Au/MoO3/MoO3/C devices displayed high conductance and low impedance values in the studied frequency domain, the Au/MoO3/Li/MOO3/C devices exhibited low conductance and high impedance mode in the frequency domain of 0.01-0.59 GHz. It is also found that the presence of Li slabs improved the performance of the devices through driving it to exhibit lower reflection coefficient and high return loss values near 0.80 GHz. The features of the devices nominate them for use as RF-Microwave traps or resonators. en_US
dc.description.sponsorship University of Jeddah, Saudi Arabia [UJ-02-092-DR] en_US
dc.description.sponsorship This work was funded by the University of Jeddah, Saudi Arabia, under grant No. ((UJ-02-092-DR). The authors, therefore, acknowledge with thanks the University technical and financial support. en_US
dc.identifier.issn 1842-3582
dc.identifier.scopus 2-s2.0-85083961398
dc.identifier.uri https://hdl.handle.net/20.500.14411/8924
dc.language.iso en en_US
dc.publisher inst Materials Physics en_US
dc.relation.ispartof Digest Journal of Nanomaterials and Biostructures en_US
dc.rights info:eu-repo/semantics/closedAccess en_US
dc.subject Au/MoO3/Li/MoO3/C en_US
dc.subject X-ray diffraction en_US
dc.subject Negative capacitance en_US
dc.subject Return loss factor en_US
dc.title Structural and Electrical Performance of Moo<sub>3</Sub> Films Designed as Microwave Resonators en_US
dc.type Article en_US
dspace.entity.type Publication
gdc.author.id Qasrawi, A. F./0000-0001-8193-6975
gdc.author.institutional Qasrawı, Atef Fayez Hasan
gdc.author.institutional Qasrawı, Atef Fayez Hasan
gdc.author.scopusid 36909456400
gdc.author.scopusid 6603962677
gdc.author.scopusid 55735276400
gdc.author.wosid Qasrawi, Atef/R-4409-2019
gdc.coar.access metadata only access
gdc.coar.type text::journal::journal article
gdc.description.department Atılım University en_US
gdc.description.departmenttemp [Al Garni, S. E.; Alharbi, S. R.] Univ Jeddah, Fac Sci, Dept Phys, Jeddah, Saudi Arabia; [Qasrawi, A. F.] Arab Amer Univ, Dept Phys, Jenin, Palestine; [Qasrawi, A. F.] Atilim Univ, Fac Engn, Grp Phys, TR-06836 Ankara, Turkey en_US
gdc.description.endpage 374 en_US
gdc.description.issue 2 en_US
gdc.description.publicationcategory Makale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanı en_US
gdc.description.scopusquality Q4
gdc.description.startpage 367 en_US
gdc.description.volume 15 en_US
gdc.description.woscitationindex Science Citation Index Expanded
gdc.description.wosquality Q4
gdc.identifier.wos WOS:000549202800010
gdc.scopus.citedcount 1
gdc.wos.citedcount 0
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