Qasrawı, Atef Fayez Hasan

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https://hdl.handle.net/20.500.14411/7716
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Qasrawi, Atef Fayez
Atef Fayez Hasan, Qasrawı
Qasrawı,A.F.H.
Qasrawi,A.F.H.
Q., Atef Fayez Hasan
Q.,Atef Fayez Hasan
Atef Fayez Hasan, Qasrawi
Qasrawi, Atef Fayez Hasan
A.F.H.Qasrawı
A.F.H.Qasrawi
A., Qasrawi
A.,Qasrawı
Qasrawı, Atef Fayez Hasan
Qasrawi, A. F.
Qasrawi,A.F.
Qasrawi, AF
Qasrawi, Atef F.
Qasrawi, Atef A.
Qasrawi, Atef Fayez
Qasrawi, Atef F.
Qasrawi, Atef A.
Qasrawi, Atef
Job Title
Doçent Doktor
Email Address
atef.qasrawi@atilim.edu.tr
Main Affiliation
Department of Electrical & Electronics Engineering
Status
Former Staff
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NO POVERTY1
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ZERO HUNGER2
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GOOD HEALTH AND WELL-BEING3
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QUALITY EDUCATION4
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GENDER EQUALITY5
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CLEAN WATER AND SANITATION6
CLEAN WATER AND SANITATION
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AFFORDABLE AND CLEAN ENERGY7
AFFORDABLE AND CLEAN ENERGY
17
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DECENT WORK AND ECONOMIC GROWTH8
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INDUSTRY, INNOVATION AND INFRASTRUCTURE9
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LIFE ON LAND15
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Scholarly Output

226

Articles

222

Views / Downloads

721/0

Supervised MSc Theses

0

Supervised PhD Theses

0

WoS Citation Count

1970

Scopus Citation Count

2000

Patents

0

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0

WoS Citations per Publication

8.72

Scopus Citations per Publication

8.85

Open Access Source

17

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0

JournalCount
Crystal Research and Technology16
Journal of Electronic Materials15
physica status solidi (a)12
Materials Science in Semiconductor Processing11
Journal of Alloys and Compounds11
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Author: Al Garni, S. E.Subject: Coating

Scholarly Output Search Results

Now showing 1 - 2 of 2
  • Thumbnail Image
    Article
    Citation - WoS: 3
    Citation - Scopus: 3
    Optical Analysis of Ge/Mgo and Ge/Bn Thin Layers Designed for Terahertz Applications
    (Elsevier Sci Ltd, 2015) Al Garni, S. E.; Qasrawi, A. F.
    In this work, a 200 nm Ge thin film is used as a substrate to design Ge/MgO and Ge/BN layers. The optical dynamics in these devices are investigated by means of the reflectivity and the transmissivity measurements. Particularly, the details of the dielectric spectra and the values of the energy band gaps (E-g) are investigated. Below 350 THz, the construction of Ge/MgO and Ge/BN interfaces decreased the effective dielectric constant of Ge by 39% and by 76%, respectively. It also increased the quality factor of the Ge optical device from 150 to 1400 and to 940 at 300 THz. All the dispersive optical parameters are also evaluated. In addition, the direct/indirect E-g value of Ge which was determined as 1.15/0.72 eV is observed to shift down by a 0.13/0.42 and by a 023/0.54 eV for the Ge/MgO and Ge/BN devices, respectively. The sharp increase in the dielectric constant with decreasing frequency in the range of 353 273 THz, the dispersive optical parameters and the energy band gap attenuations of the optical structures are promising as they indicate the applicability of the Ge, Ge/MgO and Gel BN layers in terahertz sensing. The latter technology has a wide range of applications like medical and telecommunication devices. (C) 2014 Elsevier Ltd. All rights reserved.
  • Thumbnail Image
    Article
    Citation - WoS: 11
    Citation - Scopus: 11
    Post Annealing Effects on the Structural, Compositional, Optical and Dielectric Properties of Cd Doped Gase Thin Films
    (Elsevier Science Sa, 2015) Al Garni, S. E.; Qasrawi, A. F.
    In this work, the heat treatment effects at temperatures (T-a) of 200, 300 and 400 degrees C on the compositional, structural, optical and dielectric properties of Cd doped GaSe are explored by means of energy dispersive X-ray spectroscopy, X-ray diffraction and UV-VIS spectrophotometry. The annealing process of the Cd doped GaSe thin films revealed a highly oriented orthorhombic structure type that exhibit a systematic increase in the grain size. While the strain, degree of orientation and dislocation density of the annealed films are weakly affected by the annealing process. The optical energy band gap of the doped films decreased from 1.23 to 0.90 eV and the exponential energy band tails rose from 0.16 to 0.23 eV when the annealing temperature is raised from 300 to 400 degrees C. In addition, the analysis of the dielectric spectral curves which were studied in the frequency range of 270-1500 THz, allowed to investigate the oscillator and dispersion energies and the static (epsilon(s)) and lattice (epsilon(l)) dielectric constants. The annealing process on the doped samples decreased the dispersion and oscillator energies as well as es. Oppositely, el values increased from 12.52 to 24.45 as a result of larger grain size and less defect density associated with annealing process when T-a is raised from 200 to 400 degrees C, respectively. (C) 2015 Elsevier B.V. All rights reserved.