Influence of layer on the electrical properties of Au/n-4H SiC diodes

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Date

2018

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indian Acad Sciences

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Department of Electrical & Electronics Engineering
Department of Electrical and Electronics Engineering (EE) offers solid graduate education and research program. Our Department is known for its student-centered and practice-oriented education. We are devoted to provide an exceptional educational experience to our students and prepare them for the highest personal and professional accomplishments. The advanced teaching and research laboratories are designed to educate the future workforce and meet the challenges of current technologies. The faculty's research activities are high voltage, electrical machinery, power systems, signal and image processing and photonics. Our students have exciting opportunities to participate in our department's research projects as well as in various activities sponsored by TUBİTAK, and other professional societies. European Remote Radio Laboratory project, which provides internet-access to our laboratories, has been accomplished under the leadership of our department with contributions from several European institutions.

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Abstract

In this study, the effect of insulator layer on the electrical characteristics of Au/n-4H SiC diode was investigated. The current-voltage (), capacitance-voltage () and conductance-voltage () measurements were carried out at room temperature condition. Under thermionic emission model, electrical parameters as zero-bias barrier height (), ideality factor (n), interface states (), and series () and shunt () resistances were estimated from forward bias analyses. The values of n and were about 1.305 and 0.796 eV for metal-semiconductor (MS) rectifying diode, and 3.142 and 0.713 eV for metal-insulator-semiconductor (MIS) diode with the insertion of layer, respectively. Since the values of n were greater than the unity, the fabricated diodes showed non-ideal behaviour. The energy distribution profile of of the diodes was calculated by taking into account of the bias dependence of the effective barrier height () and . The obtained values with are almost one order of magnitude lower than those without for two diodes. According to Cheung's model, were calculated and these values were found in increasing behaviour with the contribution of insulator layer. In addition, the plot behaviours with linear dependence between ln() vs. indicated that the dominant conduction mechanism in the reverse bias region was Schottky effect for both MS and MIS diodes. In the room temperature measurements, different from the results of MIS diode, the values of C for MS diode was observed in decreasing behaviour from ideality with crossing the certain forward bias voltage point ( ). The decrease in the negative capacitance corresponds to the increase of G / w.

Description

Yıldız, Dilber Esra/0000-0003-2212-199X;

Keywords

MS, MIS, insulator layer, interface states, Si3N4 layer, conduction mechanism

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5

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41

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3

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