Activation Energy of Metastable Amorphous Ge<sub>2</Sub>sb<sub>2< From Room Temperature To Melt

Abstract

Resistivity of metastable amorphous Ge2Sb2Te5 (GST) measured at device level show an exponential decline with temperature matching with the steady-state thin-film resistivity measured at 858 K (melting temperature). This suggests that the free carrier activation mechanisms form a continuum in a large temperature scale (300 K - 858 K) and the metastable amorphous phase can be treated as a supercooled liquid. The effective activation energy calculated using the resistivity versus temperature data follow a parabolic behavior, with a room temperature value of 333 meV, peaking to similar to 377 meV at similar to 465 K and reaching zero at similar to 930 K, using a reference activation energy of 111 meV (3k(B)T/2) at melt. Amorphous GST is expected to behave as a p-type semiconductor at T-melt similar to 858 K and transitions from the semiconducting-liquid phase to the metallic-liquid phase at similar to 930 K at equilibrium. The simultaneous Seebeck (S) and resistivity versus temperature measurements of amorphous-fcc mixed-phase GST thin-films show linear S-T trends that meet S = 0 at 0 K, consistent with degenerate semiconductors, and the dS/dT and room temperature activation energy show a linear correlation. The single-crystal fcc is calculated to have dS/dT = 0.153 mu V/K-2 for an activation energy of zero and a Fermi level 0.16 eV below the valance band edge. (C) 2018 Author(s).